Abstract: A semiconductor system according to the present disclosure includes: an input receiving unit that receives comparison process requesting information; a processing unit that acquires a plurality of pieces of process related information related to a semiconductor process performed by a semiconductor manufacturing apparatus, based on the comparison process requesting information received by the input receiving unit; a screen creation unit that creates a comparison screen for comparing the plurality of pieces of process related information acquired by the processing unit; and a display unit that displays the comparison screen created by the screen creation unit.

Abstract: A semiconductor system according to the present disclosure includes: an input receiving unit that receives comparison process requesting information; a processing unit that acquires a plurality of pieces of process related information related to a semiconductor process performed by a semiconductor manufacturing apparatus, based on the comparison process requesting information received by the input receiving unit; a screen creation unit that creates a comparison screen for comparing the plurality of pieces of process related information acquired by the processing unit; and a display unit that displays the comparison screen created by the screen creation unit.

Abstract: In a conditioning method conditions interiors of a plurality of process chambers of a substrate processing apparatus, conditioning of the interior of the first process chamber is performed if a first integrated value set in connection with the process of the substrate reaches a set value N1. The second process chamber is set in a standby state when the conditioning of the first process chamber starts and the series of processes is stopped. By determining whether a second integrated value set in connection with process of the substrate in the second process chamber is equal to or greater than a set value N2, count of a third integrated value in the second process chamber is started if the second integrated value is equal to or greater than the set value N2. A conditioning of the second process chamber is performed if the third integrated value exceeds a set value N3.

Abstract: In a conditioning method conditions interiors of a plurality of process chambers of a substrate processing apparatus, conditioning of the interior of the first process chamber is performed if a first integrated value set in connection with the process of the substrate reaches a set value N1. The second process chamber is set in a standby state when the conditioning of the first process chamber starts and the series of processes is stopped. By determining whether a second integrated value set in connection with process of the substrate in the second process chamber is equal to or greater than a set value N2, count of a third integrated value in the second process chamber is started if the second integrated value is equal to or greater than the set value N2. A conditioning of the second process chamber is performed if the third integrated value exceeds a set value N3.