Patents by Inventor Yoko Ando

Yoko Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250370257
    Abstract: To provide a polishing sheet in which a hard material such as a metal product can be efficiently polished to form a smooth surface with low convexities and concavities, and to form a uniform smooth surface even when repeated polishing is performed on the same polishing surface. A polishing sheet includes a substrate, a plurality of three-dimensional elements that includes diamond abrasive particles and a bonding material, and forms a polishing surface, and an intermediate layer that is provided between the substrate and the three-dimensional element and bonds the substrate and the three-dimensional element together, wherein a ratio C2/C1 of a content of the diamond abrasive particles C2 to a content of the bonding material C1 is 0.05 to 1.5 in terms of mass ratio.
    Type: Application
    Filed: August 15, 2025
    Publication date: December 4, 2025
    Inventors: Yoko Nakamura, Yoko Ando, Yoshihiko Tasaka
  • Publication number: 20240316725
    Abstract: An abrading operation monitoring system is presented that includes a particle tracking system that receives, from a particle position retriever, a position of an abrasive particle on an abrasive article surface. The system also includes an abrasive operation parameter retriever that retrieves, using a communication component, a current set of operation parameters for an abrading machine. The system also includes an abrasive volume calculator that calculates an abrading volume for a worksurface contacted by the abrasive article surface based on a path of the tracked abrasive particle and the current set of operation parameters. The system also includes an abrasive parameters adjuster that provides a new set of operation parameters for the abrading system based on the calculated abrading volume. The abrading system implements the new set of operation parameters.
    Type: Application
    Filed: July 25, 2022
    Publication date: September 26, 2024
    Inventors: Yoko Nakamura, Ryogo Kawai, Yoko Ando, Taiji Yamasaki
  • Publication number: 20230104686
    Abstract: [Problem] To provide a polishing sheet in which a hard material such as a metal product can be efficiently polished to form a smooth surface with low convexities and concavities, and to form a uniform smooth surface even when repeated polishing is performed on the same polishing surface. [Resolution Means] A polishing sheet includes a substrate, a plurality of three-dimensional elements that includes diamond abrasive particles and a bonding material, and forms a polishing surface, and an intermediate layer that is provided between the substrate and the three-dimensional element and bonds the substrate and the three-dimensional element N together, wherein a ratio C2/C1 of a content of the diamond abrasive particles C2 to a content of the bonding material C1 is 0.05 to 1.5 in terms of mass ratio.
    Type: Application
    Filed: December 18, 2020
    Publication date: April 6, 2023
    Inventors: Yoko Nakamura, Yoko Ando, Yoshihiko Tasaka
  • Patent number: 7361263
    Abstract: A water treatment apparatus includes a storage unit storing water to be treated including a pharmaceutical drug, an apply unit applying the water to be treated to the storage unit, an addition unit adding into the water to be treated metal salt generating halide ions when dissolved in the water to be treated, and an energizing unit applying a current to a pair of electrodes immersed in the water to be treated in the storage unit. The pharmacological activity of the pharmaceutical drug is eliminated or reduced by decomposing or altering at least a portion of the chemical structure of the pharmaceutical drug included in the water to be treated through electrolysis.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: April 22, 2008
    Assignees: Sanyo Electric Co., Ltd., School Legal Corporation, Osaka Medical College
    Inventors: Jun Hirose, Fumitake Kondo, Naoki Hiro, Kouichi Sano, Takashi Nakano, Hiroshi Takenaka, Yoko Ando, Toyohide Kobayashi
  • Publication number: 20040154995
    Abstract: A water treatment apparatus includes a storage unit storing water to be treated including a pharmaceutical drug, an apply unit applying the water to be treated to the storage unit, an addition unit adding into the water to be treated metal salt generating halide ions when dissolved in the water to be treated, and an energizing unit applying a current to a pair of electrodes immersed in the water to be treated in the storage unit. The pharmacological activity of the pharmaceutical drug is eliminated or reduced by decomposing or altering at least a portion of the chemical structure of the pharmaceutical drug included in the water to be treated through electrolysis.
    Type: Application
    Filed: December 2, 2003
    Publication date: August 12, 2004
    Applicants: Sanyo Electric Co., Ltd, Osaka Medical College
    Inventors: Jun Hirose, Fumitake Kondo, Naoki Hiro, Kouichi Sano, Takashi Nakano, Hiroshi Takenaka, Yoko Ando, Toyohide Kobayashi