Patents by Inventor Yoko Hanada

Yoko Hanada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230172836
    Abstract: A method for makeup including (A) applying to skin a composition X including components (A1) and (A2). (A1) includes a polymer containing a norbornane moiety and/or a silicone-modified Pullulan and (A2) includes a volatile oil. The method further includes (B) applying to the skin a composition Y including a component (B1), other than the composition X, where (B1) includes one or more selected from the group consisting of polyols and liquid oils.
    Type: Application
    Filed: March 22, 2021
    Publication date: June 8, 2023
    Applicant: KAO CORPORATION
    Inventors: Masayuki IIDA, Motoaki ITO, Yoko HANADA, Yukihiro MIYAZAKI
  • Patent number: 9034555
    Abstract: A method for producing a liquid developer containing toner particles containing a resin containing a polyester and a pigment, and an insulating liquid, wherein the toner particles are dispersed in the insulating liquid, including: step 1: melt-kneading the resin and the pigment, and pulverizing a melt-kneaded mixture to provide toner particles; step 2: dispersing the toner particles obtained in the step 1 in the insulating liquid in the presence of a basic dispersant to provide a dispersion of toner particles; and step 3: wet-milling the dispersion of toner particles obtained in the step 2 to provide a liquid developer, wherein the basic dispersant is an amide compound obtained by a reaction between a polyethyleneimine and a polyester (D) obtained by self-condensation of 12-hydroxystearic acid.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: May 19, 2015
    Assignee: Kao Corporation
    Inventors: Tatsuya Yamada, Hiromi Ito, Yoko Hanada
  • Publication number: 20140186764
    Abstract: A method for producing a liquid developer containing toner particles containing a resin containing a polyester and a pigment, and an insulating liquid, wherein the toner particles are dispersed in the insulating liquid, including: step 1: melt-kneading the resin and the pigment, and pulverizing a melt-kneaded mixture to provide toner particles; step 2: dispersing the toner particles obtained in the step 1 in the insulating liquid in the presence of a basic dispersant to provide a dispersion of toner particles; and step 3: wet-milling the dispersion of toner particles obtained in the step 2 to provide a liquid developer, wherein the basic dispersant is an amide compound obtained by a reaction between a polyethyleneimine and a polyester (D) obtained by self-condensation of 12-hydroxystearic acid.
    Type: Application
    Filed: December 26, 2013
    Publication date: July 3, 2014
    Applicant: Kao Corporation
    Inventors: Tatsuya YAMADA, Hiromi Ito, Yoko Hanada
  • Patent number: 7964179
    Abstract: The invention provides hair cosmetics which can suppress a frictional feeling of hair in running water during rinsing to improve softness and smoothness thereby preventing the hair from being damaged by twisting during rinsing, and comprises organopolysiloxane having an amino-modified organopolysiloxane chain and a polyoxyalkylene chain, and at least one cationic surfactant selected from compounds represented by formula (1) or (2): wherein at least one of R1, R2, R3 and R4 represents e.g. an alkyl group containing 8 to 35 carbon atoms in total, and the remainder represents a C1 to C5 alkyl group, hydroxyalkyl group etc., X? represents a halogen ion or an organic anion, R5 represents e.g. an alkyl group containing 8 to 35 carbon atoms in total, and R6 represents a C1 to C22 alkyl group etc.
    Type: Grant
    Filed: June 13, 2002
    Date of Patent: June 21, 2011
    Assignee: Kao Corporation
    Inventors: Yoko Hanada, Nakako Sato
  • Publication number: 20050255074
    Abstract: The invention provides hair cosmetics which can suppress a frictional feeling of hair in running water during rinsing to improve softness and smoothness thereby preventing the hair from being damaged by twisting during rinsing, and comprises organopolysiloxane having an amino-modified organopolysiloxane chain and a polyoxyalkylene chain, and at least one cationic surfactant selected from compounds represented by formula (1) or (2): wherein at least one of R1, R2, R3 and R4 represents e.g. an alkyl group containing 8 to 35 carbon atoms in total, and the remainder represents a C1 to C5 alkyl group, hydroxyalkyl group etc., X? represents a halogen ion or an organic anion, R5 represents e.g. an alkyl group containing 8 to 35 carbon atoms in total, and R6 represents a C1 to C22 alkyl group etc.
    Type: Application
    Filed: June 13, 2002
    Publication date: November 17, 2005
    Inventors: Yoko Hanada, Nakako Sato
  • Patent number: 6703451
    Abstract: A superabsorbent resin composition comprising the following components components (A) and (D), wherein (A) is a superabsorbent resin, and (D) a coordination compound in which a chelating agent is coordinated with metal A.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: March 9, 2004
    Assignee: Kao Corporation
    Inventors: Yasunori Hosokawa, Tadashi Igarashi, Isao Tsuru, Yoko Hanada
  • Patent number: 6448320
    Abstract: The superabsorbent resin composition of the present invention comprises (A) a superabsorbent resin and (B) a metal compound obtained by mixing a hydroxy acid or a salt thereof and a polyvalent metal salt or polyvalent metal alkoxide having at least one metal selected from the group consisting of titanium and zirconium. The method for producing a superabsorbent resin composition comprises mixing the components (A) and (B).
    Type: Grant
    Filed: January 30, 1998
    Date of Patent: September 10, 2002
    Assignee: Kao Corporation
    Inventors: Tadashi Igarashi, Yoko Hanada, Hisakazu Furugaki
  • Patent number: 6335398
    Abstract: A super absorbent polymer composition comprising a chelating compound (A) which has a site capable of forming a chelate with a copper ion and whose copper salt has a solubility in physiological saline at 25° C. of 0.01% by weight or less and a super absorbent polymer (B), wherein the chelating compound (A) is present in an amount of from 0.0001 to 30 parts by weight per 100 parts by weight of said super absorbent polymer (B).
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: January 1, 2002
    Assignee: Kao Corporation
    Inventors: Takayuki Amiya, Seiichi Miyanaga, Yoko Hanada
  • Publication number: 20010053826
    Abstract: A superabsorbent resin composition comprising the following components
    Type: Application
    Filed: July 3, 2001
    Publication date: December 20, 2001
    Applicant: Kao Corporation
    Inventors: Yasunori Hosokawa, Tadashi Igarashi, Isao Tsuru, Yoko Hanada
  • Patent number: 6313231
    Abstract: A superabsorbent resin composition comprising the following components (A), (B) and (C), wherein (A) is a superabsorbent resin, (B) is a metal compound containing at least one metal A selected from the group consisting of titanium and zirconium and (C) is a chelating agent.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: November 6, 2001
    Assignee: Kao Corporation
    Inventors: Yasunori Hosokawa, Tadashi Igarashi, Isao Tsuru, Yoko Hanada
  • Patent number: 5773542
    Abstract: A process for producing polymer particles comprising polymerizing a water-soluble polymerizable monomer in a system comprising a hydrophobic organic solvent inert to the polymerization and an aqueous solution of the water-soluble polymerizable monomer, the process being characterized in that the polymerization is carried out in the presence of, as a dispersant, an anionic surface active agent represented by formula (I): ##STR1## wherein R.sup.1 represents a straight-chain or branched alkyl, alkenyl or 2-hydroxyalkyl group having 5 to 29 carbon atoms; M.sup.1 and M.sup.2, which may be the same or different, each represent an alkali metal ion, an ammonium ion or a hydrogen atom; and n represents 1 or 2.
    Type: Grant
    Filed: March 22, 1996
    Date of Patent: June 30, 1998
    Assignee: Kao Corporation
    Inventors: Takashi Koudate, Yasunori Hosokawa, Yoko Hanada