Patents by Inventor Yoko Hasegawa

Yoko Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230043774
    Abstract: The present invention aims to improve the separation selectivity for light gases such as hydrogen and helium. The gas separation membrane according to the present invention includes a porous support layer and a separation functional layer containing a cross-linked polyamide and laid on the porous support layer, wherein: the separation functional layer has a protuberance structure containing a plurality of protrusions and recesses; randomly selected 20 of the protrusions on the surface of the separation functional layer indented under a load of 3 nN and observed in pure water at 25° C. by atomic force microscopy give an average deformation of 5.0 nm or more and 10.0 nm or less; and they give a standard deviation of the deformation of 5.0 nm or less.
    Type: Application
    Filed: December 22, 2020
    Publication date: February 9, 2023
    Applicant: Toray Industries, Inc.
    Inventors: Takahiro Tokuyama, Rina Iizuka, Yoko Hasegawa, Hiroho Hirozawa, Hiroyuki Yamada
  • Publication number: 20220280896
    Abstract: A gas separation membrane module includes a center pipe; a plurality of separation membranes each having a feed surface and a permeate surface, the separation membranes arranged such that the feed surfaces face each other and the permeate surfaces face each other; a feed channel material arranged between the feed surfaces; and a permeate channel material arranged between the permeate surfaces, wherein the separation membranes, the feed channel material, and the permeate channel material are wound around the center pipe, an average pore size on a front surface and an average pore size on a back surface of the feed channel material are each 0.95 mm or less, and an average pore size on a front surface and an averaged pore size on a back surface of the permeate channel material are each 0.95 mm or less.
    Type: Application
    Filed: June 16, 2020
    Publication date: September 8, 2022
    Inventors: Hiroho Hirozawa, Rina Iizuka, Takahiro Tokuyama, Yoko Hasegawa, Yosuke Mizuno
  • Patent number: 8415357
    Abstract: Novel substituted azole diones are provided that kill cells, suppress cell proliferation, suppress cell growth, abrogate the cell cycle G2 checkpoint and/or cause adaptation to G2 cell cycle arrest. Methods of making and using the invention compounds are provided. The invention provides substituted azole diones to treat cell proliferation disorders. The invention includes the use of substituted azole diones to selectively kill or suppress cancer cells without additional anti-cancer treatment. The invention includes the use of cell cycle G2-checkpoint-abrogating substituted azole diones to selectively sensitize cancer cells to DNA damaging reagents, treatments and/or other types of anti-cancer reagents.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: April 9, 2013
    Assignee: Canbas Co., Ltd.
    Inventors: Takumi Kawabe, Machiyo Ishigaki, Takuji Sato, Sayaka Yamamoto, Yoko Hasegawa
  • Patent number: 8084454
    Abstract: Novel substituted azole diones are provided that kill cells, suppress cell proliferation, suppress cell growth, abrogate the cell cycle G2 checkpoint and/or cause adaptation to G2 cell cycle arrest. Methods of making and using the invention compounds are provided. The invention provides substituted azole diones to treat cell proliferation disorders. The invention includes the use of substituted azole diones to selectively kill or suppress cancer cells without additional anti-cancer treatment. The invention includes the use of cell cycle G2-checkpoint-abrogating substituted azole diones to selectively sensitize cancer cells to DNA damaging reagents, treatments and/or other types of anti-cancer reagents.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: December 27, 2011
    Assignee: Canbas Co., Ltd.
    Inventors: Takumi Kawabe, Machiyo Ishigaki, Takuji Sato, Sayaka Yamamoto, Yoko Hasegawa
  • Publication number: 20110092514
    Abstract: Novel substituted azole diones are provided that kill cells, suppress cell proliferation, suppress cell growth, abrogate the cell cycle G2 checkpoint and/or cause adaptation to G2 cell cycle arrest. Methods of making and using the invention compounds are provided. The invention provides substituted azole diones to treat cell proliferation disorders. The invention includes the use of substituted azole diones to selectively kill or suppress cancer cells without additional anti-cancer treatment. The invention includes the use of cell cycle G2-checkpoint-abrogating substituted azole diones to selectively sensitize cancer cells to DNA damaging reagents, treatments and/or other types of anti-cancer reagents.
    Type: Application
    Filed: November 19, 2010
    Publication date: April 21, 2011
    Applicant: CanBas Co., Ltd.
    Inventors: TAKUMI KAWABE, Machiyo Ishigaki, Takuji Sato, Sayaka Yamamoto, Yoko Hasegawa
  • Publication number: 20080275057
    Abstract: Novel substituted azole diones are provided that kill cells, suppress cell proliferation, suppress cell growth, abrogate the cell cycle G2 checkpoint and/or cause adaptation to G2 cell cycle arrest. Methods of making and using the invention compounds are provided. The invention provides substituted azole diones to treat cell proliferation disorders. The invention includes the use of substituted azole diones to selectively kill or suppress cancer cells without additional anti-cancer treatment. The invention includes the use of cell cycle G2-checkpoint-abrogating substituted azole diones to selectively sensitize cancer cells to DNA damaging reagents, treatments and/or other types of anti-cancer reagents.
    Type: Application
    Filed: April 11, 2008
    Publication date: November 6, 2008
    Applicant: CanBas Co., Ltd.
    Inventors: Takumi Kawabe, Machiyo Ishigaki, Takuji Sato, Sayaka Yamamoto, Yoko Hasegawa
  • Patent number: 6350346
    Abstract: A polishing apparatus for polishing a workpiece such as a semiconductor wafer has a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring for holding a workpiece and pressing the workpiece against the abrasive cloth under a first pressing force to polish the workpiece. The top ring has a recess defined therein for accommodating the workpiece therein. A presser ring is vertically movably disposed around the top ring, and pressed against the abrasive cloth under a variable second pressing force. The first and second pressing forces are variable independently of each other, and the second pressing force is determined based on the first pressing force.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: February 26, 2002
    Assignee: Ebara Corporation
    Inventors: Masamichi Nakashiba, Norio Kimura, Isamu Watanabe, Yoko Hasegawa
  • Patent number: 5916412
    Abstract: A polishing apparatus for polishing a workpiece such as a semiconductor wafer has a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring for holding a workpiece and pressing the workpiece against the abrasive cloth under a first pressing force to polish the workpiece. The top ring has a recess defined therein for accommodating the workpiece therein. A presser ring is vertically movably disposed around the top ring, and pressed against the abrasive cloth under a variable second pressing force. The first and second pressing forces are variable independently of each other, and the second pressing force is determined based on the first pressing force.
    Type: Grant
    Filed: October 9, 1996
    Date of Patent: June 29, 1999
    Assignee: Ebara Corporation
    Inventors: Masamichi Nakashiba, Norio Kimura, Isamu Watanabe, Yoko Hasegawa