Patents by Inventor Yoko Ishikawa

Yoko Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11940729
    Abstract: The present invention provides a photosensitive composition which can suppress the generation of a development residue on the surface of an electrode and the corrosion of the electrode to form a black pixel division layer, and also can suppress the generation of off-pixel in an organic EL display device comprising the pixel division layer. Disclosed is a photosensitive composition comprising (a) a pigment, (b) a resin having two or more tertiary amino groups in the molecule, and (c) a photosensitive agent, wherein the component (b) contains a resin having a structure represented by the general formula (1).
    Type: Grant
    Filed: November 17, 2020
    Date of Patent: March 26, 2024
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Akihiro Ishikawa, Takashi Honma, Yoko Momiyama
  • Patent number: 9574280
    Abstract: A composition for making a contact includes a nickel-cobalt alloy containing 1% by weight or more to less than 20% by weight of cobalt, and 0.002 part by weight or more to 0.1 part by weight or less of sulfur with respect to 100 parts by weight of the nickel-cobalt alloy. The composition has an average particle size of 0.07 ?m or larger to 0.35 ?m or smaller.
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: February 21, 2017
    Assignee: OMRON Corporation
    Inventors: Yoko Ishikawa, Kuniyoshi Maezawa
  • Publication number: 20140329418
    Abstract: A composition for making a contact includes a nickel-cobalt alloy containing 1% by weight or more to less than 20% by weight of cobalt, and 0.002 part by weight or more to 0.1 part by weight or less of sulfur with respect to 100 parts by weight of the nickel-cobalt alloy. The composition has an average particle size of 0.07 ?m or larger to 0.35 ?m or smaller.
    Type: Application
    Filed: March 13, 2012
    Publication date: November 6, 2014
    Applicant: OMRON CORPORATION
    Inventors: Yoko Ishikawa, Kuniyoshi Maezawa
  • Patent number: 8785035
    Abstract: A composition for making a contact contains predetermined amounts of cobalt and sulfur and has a predetermined average particle size. The composition for making the contact includes a nickel-cobalt alloy containing 20% by weight to 55% by weight of cobalt, and 0.002 part by weight to 0.02 part by weight of sulfur with respect to 100 parts by weight of the nickel-cobalt alloy, the composition having an average particle size of 0.10 ?m to 0.35 ?m. The contact made with the composition may be included in a connector.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: July 22, 2014
    Assignee: OMRON Corporation
    Inventors: Kuniyoshi Maezawa, Yoko Ishikawa
  • Publication number: 20120077069
    Abstract: A composition for making a contact contains predetermined amounts of cobalt and sulfur and has a predetermined average particle size. The composition for making the contact includes a nickel-cobalt alloy containing 20% by weight to 55% by weight of cobalt, and 0.002 part by weight to 0.02 part by weight of sulfur with respect to 100 parts by weight of the nickel-cobalt alloy, the composition having an average particle size of 0.10 ?m to 0.35 ?m. The contact made with the composition may be included in a connector.
    Type: Application
    Filed: March 4, 2011
    Publication date: March 29, 2012
    Applicant: OMRON CORPORATION
    Inventors: Kuniyoshi Maezawa, Yoko Ishikawa