Abstract: A plasma-based processing system and a corresponding operation method are proposed. One or more absorbers are positioned between a plasma generation volume inside the plasma chamber and a support structure configured to support the workpiece, and then a portion of plasma delivered from the plasma generation volume to the support structure (or the workpiece) is absorbed by the absorber(s). Further, the absorber(s) are made of electrical conductive material(s), and the structure of at least one absorber and/or the relative geometric relation between at least two absorbers is adjustable. Hence, the position(s) of the electric conductor(s) overlap(s) with the delivered plasma may be adjusted, and then the ion current distribution on the cross section of the delivered plasma may be modified correspondingly.

Abstract: A loaded blumlein structure is described. At one end, the blumlein can be used to generate an electromagnetic pulse. At the other end, the top and bottom conductive connected by a resistive (or more generally a lossy) connection. This allows for subsequent pulses after the initial pulse to be dampened, maintaining the amplitude of the primary pulse, while reducing the stress on the system from the later ringing of the pulse. A number of geometries are described. In other examples, a pulse dampening section connected between the top and bottom conductive strips to provide the dampening effect.