Patents by Inventor Yoko Takebe
Yoko Takebe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9223200Abstract: To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted photomask using it, and an exposure treatment method. A pellicle for lithography having a multilayer pellicle membrane including a membrane made of a fluoropolymer (A) which contains, as the main component, repeating units obtained by cyclopolymerization of a pertluorodiene having one etheric oxygen atom, and a membrane made of a fluoropolymer (B) which has fluorinated alicyclic ring structures each containing, in the ring structure, two or three etheric oxygen atoms not being adjacent to one another, wherein the total thickness of the membrane made of the fluoropolymer (B) is at most 40% of the total thickness of the membrane made of the fluoropolymer (A).Type: GrantFiled: January 29, 2014Date of Patent: December 29, 2015Assignee: Asahi Glass Company, LimitedInventor: Yoko Takebe
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Patent number: 8236901Abstract: Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula —C(O)OZ; Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a C1-20 monovalent organic group.Type: GrantFiled: August 18, 2010Date of Patent: August 7, 2012Assignee: Asahi Glass Company, LimitedInventors: Koichi Murata, Naoko Shirota, Osamu Yokokoji, Yoko Takebe
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Patent number: 8178983Abstract: It is an object of the present invention to provide a water repellant composition for a substrate to be exposed which inhibits the back side of a substrate to be exposed from being contaminated by an immersion liquid, can improve adhesion between a film to be processed and an organic film directly overlying that film to inhibit film peeling, and has excellent workability, a method for forming a resist pattern, an electronic device produced by the formation method, a treatment method for imparting water repellency to a substrate to be exposed, a water repellent set for a substrate to be exposed, and a treatment method for imparting water repellency to a substrate to be exposed using the same. A water repellent composition for a substrate to be exposed including at least an organosilicon compound represented by the following general formula (1) and a solvent is used.Type: GrantFiled: February 20, 2009Date of Patent: May 15, 2012Assignees: Renesas Electronics Corporation, Asahi Glass Company, LimitedInventors: Takeo Ishibashi, Miwako Ishibashi, legal representative, Mamoru Terai, Takuya Hagiwara, Osamu Yokokoji, Yoko Takebe
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Patent number: 8134033Abstract: To provide a novel polymerizable fluorocompound having a highly fluorinated norbornane structure, and a polymer obtained from the compound. Further, their production processes and a novel intermediate useful for the processes. A novel compound (1) such as a compound (11) or a compound (12), and its polymer. A compound (2) such as a compound (21) or (22), and a compound (3) such as a compound (31) or (32M), which are useful as an intermediate for the production of the compound (1), and its production process. However, each of ZA to ZE represents such as —CH(—OC(O)C(CH3)?CH2)— or —CF2, Each of WA and WB represents such as F, each of YA to YE represents such as —CH(—OH)— or —CF(CH2OH), and each of XA to XE represents such as —C(O)— or —CF2—.Type: GrantFiled: January 12, 2009Date of Patent: March 13, 2012Assignee: Asahi Glass Company, LimitedInventors: Yasuhisa Matsukawa, Daisuke Shirakawa, Eisuke Murotani, Naoko Shirota, Yoko Takebe
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Publication number: 20110221077Abstract: It is an object of the present invention to provide a water repellant composition for a substrate to be exposed which inhibits the back side of a substrate to be exposed from being contaminated by an immersion liquid, can improve adhesion between a film to be processed and an organic film directly overlying that film to inhibit film peeling, and has excellent workability, a method for forming a resist pattern, an electronic device produced by the formation method, a treatment method for imparting water repellency to a substrate to be exposed, a water repellent set for a substrate to be exposed, and a treatment method for imparting water repellency to a substrate to be exposed using the same. A water repellent composition for a substrate to be exposed including at least an organosilicon compound represented by the following general formula (1) and a solvent is used.Type: ApplicationFiled: February 20, 2009Publication date: September 15, 2011Inventors: Takeo Ishibashi, Miwako Ishibashi, Mamoru Terai, Takuya Hagiwara, Osamu Yokokoji, Yoko Takebe
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Patent number: 7825275Abstract: To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound. A compound represented by the formula CF2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C1-20 monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.Type: GrantFiled: September 28, 2009Date of Patent: November 2, 2010Assignee: Asahi Glass Company, LimitedInventors: Koichi Murata, Naoko Shirota, Osamu Yokokoji, Yoko Takebe
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Publication number: 20100016532Abstract: To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound. A compound represented by the formula CF2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C1-20 monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.Type: ApplicationFiled: September 28, 2009Publication date: January 21, 2010Applicant: Asahi Glass Company, LimitedInventors: Koichi Murata, Naoko Shirota, Osamu Yokokoji, Yoko Takebe
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Publication number: 20090221845Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.Type: ApplicationFiled: April 17, 2009Publication date: September 3, 2009Applicant: Asahi Glass Company, LimitedInventors: Yoko Takebe, Isamu Kaneko
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Patent number: 7550545Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.Type: GrantFiled: May 9, 2007Date of Patent: June 23, 2009Assignee: Asahi Glass Company, LimitedInventors: Yoko Takebe, Isamu Kaneko
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Publication number: 20090061360Abstract: To provide a resist protective film material for immersion lithography. An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (FU) formed by polymerizing a polymerizable compound (fm) having a fluorine-containing bridged cyclic structure. For example, repeating units (FU) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (RF represents H, F, a C1-3 alkyl group or a C1-3 fluoroalkyl group, and XF represents F, OH or CH2OH.Type: ApplicationFiled: October 20, 2008Publication date: March 5, 2009Applicant: Asahi Glass Company, LimitedInventors: Yoko Takebe, Shu-zhong Wang, Osamu Yokokoji, Naoko Shirota, Yasuhisa Matsukawa, Daisuke Shirakawa
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Patent number: 7498393Abstract: A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2?CFCF2C(CF3)(OR1)—(CH2)nCR2?CHR3??(1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.Type: GrantFiled: January 25, 2007Date of Patent: March 3, 2009Assignee: Asahi Glass Company, LimitedInventors: Yoko Takebe, Masataka Eda, Osamu Yokokoji, Takashi Sasaki
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Patent number: 7244545Abstract: The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process for its production. The present invention provides a fluorinated diene represented by the following formula (1): CF2?CFCH2CH(C(R1)(R2)(OH))CH2CH?CH2??(1) wherein each of R1 and R2 which are independent of each other, is a fluorine atom or a fluoroalkyl group having at most 5 carbon atoms.Type: GrantFiled: April 27, 2006Date of Patent: July 17, 2007Assignee: Asahi Glass Company, LimitedInventors: Yoko Takebe, Osamu Yokokoji
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Publication number: 20070083021Abstract: A fluorocopolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene and units derived from a monomer unit formed by cyclopolymerization of a functional group-containing fluorinated diene having a specific structure or a monomer unit formed by polymerization of an acrylic monomer having a specific structure, a method for its production, and a resist composition.Type: ApplicationFiled: November 7, 2006Publication date: April 12, 2007Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Masataka Eda, Yoko Takebe, Osamu Yokokoji
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Publication number: 20060188816Abstract: The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process for its production. The present invention provides a fluorinated diene represented by the following formula (1): CF2?CFCH2CH(C(R1)(R2)(OH))CH2CH?CH2??(1) wherein each of R1 and R2 which are independent of each other, is a fluorine atom or a fluoroalkyl group having at most 5 carbon atoms.Type: ApplicationFiled: April 27, 2006Publication date: August 24, 2006Applicant: Asahi Glass Company, LimitedInventors: Yoko Takebe, Osamu Yokokoji
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Patent number: 7091294Abstract: A fluoropolymer (A) having units derived from monomer units formed by cyclopolymerization of at least one fluorinated diene selected from a fluorinated diene represented by the formula (1) and a fluorinated diene represented by the formula (2), and units derived from monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (3): CF2?CFCF2—C(CF3)(OR1)—CH2CH?CH2??(1) CF2?CFCH2—CH((CH2)nC(CF3)2(OR1))—CH2CH?CH2??(2) CF2?CFCH2—CH(COOR2)—CH2CH?CH2??(3) wherein R1 represents a hydrogen atom, a blocked group of a hydroxyl group capable of being converted into a hydrogen atom by an acid, or a blocked carboxyl group-containing organic group capable of being converted into a carboxyl group-containing organic group by an acid, R2 represents a hydrocarbon group having at most 20 carbon atoms, and n represents 0 or 1.Type: GrantFiled: April 7, 2005Date of Patent: August 15, 2006Assignee: Asahi Glass Company, LimitedInventors: Yoko Takebe, Masataka Eda, Osamu Yokokoji
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Publication number: 20060135663Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluorinated copolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH(CH2C(CF3)2(OR1))CH2CH?CH2 ??(1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R2 (wherein R2 is an alkoxycarbonyl group having at most 6 carbon atoms), and units derived from a monomer unit formed by cyclopolymerization of another monomer or units derived from a monomer unit formed by polymerization of an acrylic monomer, and a resist composition having such a fluorinated copolymer as a base polymer.Type: ApplicationFiled: February 14, 2006Publication date: June 22, 2006Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Yoko Takebe, Masataka Eda, Osamu Yokokoji
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Publication number: 20060122348Abstract: To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1): CF2?CFCH2CH-Q-CH2CH?CH2 ??(1) wherein Q is (CH2)aC(CF3)2OR4 (wherein a is an integer of from 0 to 3, R4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.Type: ApplicationFiled: January 23, 2006Publication date: June 8, 2006Applicant: Asahi Glass Company, LimitedInventors: Yoko Takebe, Isamu Kaneko
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Patent number: 7026416Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2?CFCF2—C(CF3)(R5)—CH2CH?CH2??(3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.Type: GrantFiled: May 9, 2005Date of Patent: April 11, 2006Assignee: Asahi Glass Company, LimitedInventors: Yasuhide Kawaguchi, Shinji Okada, Yoko Takebe, Osamu Yokokoji, Isamu Kaneko
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Patent number: 7015366Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2—Q—CR3?CHR4 ??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.Type: GrantFiled: September 6, 2005Date of Patent: March 21, 2006Assignee: Asahi Glass Company, LimitedInventors: Shun-ichi Kodama, Isamu Kaneko, Osamu Yokokoji, Shinji Okada, Yoko Takebe, Yasuhide Kawaguchi
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Patent number: 6984704Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.Type: GrantFiled: February 17, 2005Date of Patent: January 10, 2006Assignee: Asahi Glass Company, LimitedInventors: Shun-ichi Kodama, Isamu Kaneko, Osamu Yokokoji, Shinji Okada, Yoko Takebe, Yasuhide Kawaguchi