Patents by Inventor Yoneichi Hirata

Yoneichi Hirata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phosphorescent phosphor and method of manufacturing thereof
    Patent number: 7427365
    Abstract: A phosphorescent phosphor having excellent afterglow luminance characteristics, even under low illumination intensity of radiation conditions, compared to conventional strontium aluminate phosphorescent phosphors of the same type, and particularly a phosphorescent phosphor having excellent initial afterglow luminance characteristics, with following requirements: 0.015<Eu/(Sr+Eu+Dy)?0.05, 0.4?Dy/Eu?2, and 2.02?Al/(Sr+Eu+Dy)?2.4.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: September 23, 2008
    Assignee: Nemoto & Co., Ltd.
    Inventors: Yoneichi Hirata, Tomoya Sakaguchi, Nobuyoshi Takeuchi
  • Phosphorescent phosphor and method of manufacturing thereof
    Patent number: 7422704
    Abstract: A phosphorescent phosphor having excellent afterglow luminance characteristics, even under low illumination intensity of radiation conditions, compared to conventional strontium aluminate phosphorescent phosphors of the same type, and particularly a phosphorescent phosphor having excellent initial afterglow luminance characteristics and excellent afterglow luminance characteristics at 60 and 90 minutes after cessation of the excitation, with following requirements: 0.015<Eu/(Sr+Ba+Eu+Dy)?0.05, 0.3?Dy/Eu?2, 0.03?Ba/(Sr+Ba)?0.2 and 2.1?Al/(Sr+Ba+Eu+Dy)?2.9.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: September 9, 2008
    Assignee: Nemoto & Co., Ltd.
    Inventors: Yoneichi Hirata, Tomoya Sakaguchi, Nobuyoshi Takeuchi
  • Phosphorescent phosphor and method of manufacturing thereof
    Publication number: 20070131907
    Abstract: A phosphorescent phosphor having excellent afterglow luminance characteristics, even under low illumination intensity of radiation conditions, compared to conventional strontium aluminate phosphorescent phosphors of the same type, and particularly a phosphorescent phosphor having excellent initial afterglow luminance characteristics, with following requirements: 0.015<Eu/(Sr+Eu+Dy)?0.05, 0.4?Dy/Eu?2, and 2.02?Al/(Sr+Eu+Dy)?2.4.
    Type: Application
    Filed: November 5, 2004
    Publication date: June 14, 2007
    Inventors: Yoneichi Hirata, Tomoya Sakaguchi, Nobuyoshi Takeuchi
  • Phosphorescent phosphor and method of manufacturing thereof
    Publication number: 20070096058
    Abstract: A phosphorescent phosphor having excellent afterglow luminance characteristics, even under low illumination intensity of radiation conditions, compared to conventional strontium aluminate phosphorescent phosphors of the same type, and particularly a phosphorescent phosphor having excellent initial afterglow luminance characteristics and excellent afterglow luminance characteristics at 60 and 90 minutes after cessation of the excitation, with following requirements: 0.015<Eu/(Sr+Ba+Eu+Dy)?0.05, 0.3?Dy/Eu?2, 0.03?Ba/(Sr+Ba)?0.2 and 2.1?Al/(Sr+Ba+Eu+Dy)?2.9.
    Type: Application
    Filed: November 5, 2004
    Publication date: May 3, 2007
    Applicant: NEMOTO & CO., LTD.
    Inventors: Yoneichi Hirata, Tomoya Sakaguchi, Nobuyoshi Takeuchi