Abstract: Provided herein is an apparatus, including a magnetically soft underlayer (SUL); an interlayer stack overlying the SUL, wherein the interlayer stack comprises a seed layer of an fcc material; and a perpendicular magnetic recording layer overlying the interlayer stack, wherein a thickness of the SUL in combination with a distance of the SUL from the perpendicular recording layer is sufficient to orient a total magnetic field corresponding to a magnetic transducer head at an angle of about 45°.

Abstract: Provided herein is an apparatus, including a magnetically soft underlayer (SUL); an interlayer stack overlying the SUL, wherein the interlayer stack comprises a seed layer of an fcc material; and a perpendicular magnetic recording layer overlying the interlayer stack, wherein a thickness of the SUL in combination with a distance of the SUL from the perpendicular recording layer is sufficient to orient a total magnetic field corresponding to a magnetic transducer head at an angle of about 45°.

Abstract: A perpendicular magnetic recording system, comprises: a perpendicular magnetic recording medium including a non-magnetic substrate having a surface and a stacked plurality of thin film layers forming a layer stack overlying the substrate surface and including a magnetically soft underlayer (SUL) beneath at least one perpendicular magnetic recording layer, wherein the SUL has a saturation magnetization (Ms)—thickness (t) product (Mst) less than about 4 memu/cm2, and a ring-type magnetic transducer head is positioned in spaced adjacency to an upper surface of the layer stack.

Abstract: A method for forming a magnetic transducer structure. There is first provided a substrate. There is then formed over the substrate a lower magnetic pole layer. There is then formed upon the lower magnetic pole layer a gap filling dielectric layer. There is then formed at least in part upon the gap filling dielectric layer a patterned positive photoresist layer employed in defining through a plating method an upper magnetic pole layer formed at least in part upon the gap filling dielectric layer. The patterned photoresist layer has a first region defining a pole tip of the upper magnetic pole layer and a second region defining a magnetic coil region of the upper magnetic pole layer. The first region of the patterned positive photoresist layer is photoexposed either before or after forming through the plating method the upper magnetic pole layer defined by the patterned positive photoresist layer.

Abstract: A method for trimming a pole used in a read-write head comprises the step of depositing a metallic layer on a layer of pole material, patterning the metallic layer so that it can serve as a mask, and ion beam etching the pole material with nitrogen ions. Of importance, a thin nitride layer forms on the metallic layer so that the etch rate of the metallic layer during ion beam etching is slowed. Alternatively, in lieu of the metallic layer, a nitride layer can be used.