Abstract: A method for the manufacture of an array of M.times.N thin film actuated mirrors for use in an optical projection system is disclosed. The method includes the steps of: providing an active matrix; depositing a thin film sacrificial layer; creating an array of empty cavities in the thin film sacrificial layer; forming an array of actuating structures on top of the thin film sacrificial layer including the empty cavities, each of the actuating structures including a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode and an elastic member; forming a thin film protection layer completely covering each of the actuating structures; removing the thin film sacrificial layer by using an etchant; rinsing away the etchant by using a rinse which is DI water or hydrophilic and volatile; removing the rinse by a spin drying method followed by a heat treatment; and removing the thin film protection layer, thereby forming the array of thin film actuated mirrors.

Abstract: An array of M.times.N thin film actuated mirrors includes an active matrix, an array of actuating structures, each of the actuating structures including an elastic member, a second thin film electrode, a thin film electrodisplacive member and a first thin film electrode, and M.times.N number of multilayer stacks of thin film dielectric members. In addition to providing a protection against chemical or physical attacks on the first thin film electrode which also acts as a mirror for reflecting a light beam, the multilayer stack of thin film dielectric members placed on top of each of the actuating structures provides the maximum reflectance in each of the thin film actuated mirrors to thereby ensure an optimum optical efficiency of the array.