Abstract: Disclosed are methods and related systems for forming a structure. Embodiments of presently described methods comprise employing a sacrificial gap filling fluid for selectively forming a first layer on one or more first surfaces in a lower part of a gap, and forming a second layer on one or more second surfaces in an upper part of a gap.

Abstract: The present invention relates to an anti-alpha-synuclein antibody preferentially recognizing alpha-synuclein aggregates and a use of detection, diagnosis, and/or treatment or prevention of various diseases caused by accumulation of alpha-synuclein aggregates, or their related symptom diseases by using the anti-alpha-synuclein antibody.

Abstract: A substrate processing method capable of performing a stable plasma process includes: supplying a source gas under a first plasma atmosphere using a substrate processing apparatus including a power generation unit, a first reactor, and a matching network between the power generation unit and the first reactor; purging the source gas; supplying a reaction gas under a second plasma atmosphere; and purging the reaction gas, wherein setting a variable capacitor included in the matching network to a first value is performed during the purging of the source gas, and setting the variable capacitor to a second value is performed during the purging of the reaction gas.

Abstract: The disclosure discloses anti ?-Syn antibodies preferentially recognizing ?-Syn aggregates. The antibodies of the present invention bind to ?-Syn aggregates with high affinity and specificity and inhibit accumulation or intercellular transfer of ?-Syn aggregates, and thus can be used for detection, diagnosis and/or treatment or prevention of various diseases caused by the accumulation of ?-Syn aggregates.

Abstract: The disclosure relates to the manufacture of semiconductor devices, especially to methods and processing assemblies for forming a patterned structure on a substrate. The methods comprise providing the substrate comprising a first structure into a reaction chamber, wherein a surface of the first structure comprises a first material and the substrate comprises a second material, and selectively depositing a conformal passivation layer on the first material relative to the second material to cover the first structure, and selectively depositing an etch-stop layer on the second material relative to the passivation layer. In some embodiments, a multiple patterning or a tone reversal of a pattern may be performed using the methods and deposition assemblies of the disclosure.

Abstract: The present disclosure relates to methods and apparatuses for selectively depositing silicon and oxygen-comprising material on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process, the method comprising providing a substrate in a reaction chamber; providing a metal or metalloid catalyst to the reaction chamber in a vapor phase; providing a silicon precursor comprising an alkoxy silane compound into the reaction chamber in a vapor phase; and providing an oxygen precursor comprising oxygen and hydrogen into the reaction chamber in vapor phase to form silicon and oxygen-comprising material on the first surface. The disclosure further relates to vapor deposition assemblies.

Abstract: Methods and vapor deposition assemblies of selectively depositing material comprising silicon and oxygen on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process are disclosed. The methods comprise providing a substrate into a reaction chamber, providing a metal or metalloid catalyst into the reaction chamber in a vapor phase, providing a silicon precursor comprising an alkoxy silane compound into the reaction chamber in a vapor phase and providing a plasma into the reaction chamber to form a reactive species for forming a material comprising silicon and oxygen on the first surface. The methods may comprise subcycles for, for example, adjusting the proportions of material components.

Abstract: The present disclosure relates to methods and apparatuses for the manufacture of semiconductor devices. More particularly, the disclosure relates to methods and apparatuses for depositing an organic layer selectively on a substrate comprising at least two different surfaces. The process comprises providing a substrate in a reaction chamber, providing a first vapor-phase precursor in the reaction chamber, and providing a second vapor-phase precursor in the reaction chamber. In the method, the first and second vapor-phase precursors form the organic material selectively on the first surface relative to the second surface, and the first vapor-phase precursor comprises a diamine compound comprising at least five carbon atoms and the amine groups being attached to non-adjacent carbon atoms.

Abstract: The present disclosure provides isolated binding proteins such as humanized antibodies and antigen-binding fragments thereof that target alpha-synuclein, including multispecific isolated binding proteins that target both alpha-synuclein and insulin-like growth factor 1 receptor. Also provided are methods of using the binding proteins to treat alpha-synucleinopathies.

Abstract: Provided are a metal-ligand complex, a catalyst composition for ethylene-based polymerization including the same, and a method for preparing an ethylene-based polymer using the same. Since the metal-ligand complex of the present invention in which a certain functional group is introduced to a certain position has high solubility and catalytic activity, the catalyst composition comprising the same for ethylene-based polymerization including the same may produce an ethylene-based polymer having excellent physical properties.

Abstract: A substrate support unit for thin film deposition on a substrate including a pattern structure and a thin film deposition apparatus including the substrate support unit includes a heater; an RF electrode; a first rod connected to the heater; a second rod connected to the RF electrode; and an RF shield spaced apart from the second rod, disposed to surround the second rod, and extending in an extension direction of the second rod.

Abstract: The present invention relates to a wind power generator for street light comprising: a post member installed vertically; a central fixed shaft member installed horizontally on an upper portion of the post member; a first blade member rotatably installed around the central fixed shaft member and including a first blade rotated by wind on one side thereof; a second blade member rotatably installed around the first blade member and including a second blade rotated by wind on one side thereof; a cone member having an inclined shape at a specific angle so that wind smoothly moves toward the first blade member and the second blade member, and a power generation module rotated by the first blade member and the second blade member to generate power.

Abstract: A substrate support unit for thin film deposition on a substrate including a pattern structure and a thin film deposition apparatus including the substrate support unit includes a heater; an RF electrode; a first rod connected to the heater; a second rod connected to the RF electrode; and an RF shield spaced apart from the second rod, disposed to surround the second rod, and extending in an extension direction of the second rod.

Abstract: A system for controlling a variable oil pump is provided. The system includes a variable oil pump that varies a discharge pressure of oil and an actuator that is operated to vary the discharge pressure of the oil of the variable oil pump. A controller turns the actuator on or off based a relationship between an outdoor temperature and a cooling water temperature of an engine.

Abstract: Provided are a novel transition metal compound based on a cyclopenta[a]naphthalene group, a transition metal catalyst composition having high catalytic activity for preparing an ethylene homopolymer or a copolymer of ethylene and at least one ?-olefin including the same, a method for preparing an ethylene homopolymer or a copolymer of ethylene and ?-olefin using the same, and the ethylene homopolymer or the copolymer of ethylene and ?-olefin prepared above. The metallocene compound according to the present invention and the catalyst composition including the same may provide a high thermal stability of the catalyst to maintain high catalytic activity even at a high temperature, have good copolymerization reactivity with other olefins, and prepare a high molecular weight polymer at a high yield.

Abstract: Provided are a metal-ligand complex, a catalyst composition for ethylene-based polymerization including the same, and a method for preparing an ethylene-based polymer using the same. Since the metal-ligand complex of the present invention in which a certain functional group is introduced to a certain position has high solubility and catalytic activity, the catalyst composition comprising the same for ethylene-based polymerization including the same may produce an ethylene-based polymer having excellent physical properties.

Abstract: A thin film deposition method with respect to a substrate including a pattern structure includes supplying RF power through a component disposed below a substrate, forming a potential on an exposed surface of the substrate exposed to a reaction space, moving the active species to the exposed surface in the reaction space using the potential, and forming a thin film including active species component on the exposed surface of the substrate.

Abstract: A substrate processing apparatus capable of removing signal interference between reactors includes: a first reactor, a second reactor adjacent to the first reactor, and a power generator configured to supply first power to the first reactor and supply second power to the second reactor, wherein the power generator is further configured to synchronize phases of the first power and the second power.

Abstract: Provided are a novel transition metal compound based on a cyclopenta[a]naphthalene group, a transition metal catalyst composition having high catalytic activity for preparing an ethylene homopolymer or a copolymer of ethylene and at least one ?-olefin including the same, a method for preparing an ethylene homopolymer or a copolymer of ethylene and ?-olefin using the same, and the ethylene homopolymer or the copolymer of ethylene and ?-olefin prepared above. The metallocene compound according to the present invention and the catalyst composition including the same may provide a high thermal stability of the catalyst to maintain high catalytic activity even at a high temperature, have good copolymerization reactivity with other olefins, and prepare a high molecular weight polymer at a high yield.

Abstract: A control method for a cooling system includes determining, by the controller, whether the output signal of the ambient temperature sensor satisfies a predetermined an ambient low temperature driving condition, determining, by the controller, whether the output signal of the first coolant temperature sensor satisfies a predetermined first low temperature driving condition when the output signal of the ambient temperature sensor satisfies the predetermined the ambient low temperature driving condition and controlling, by the controller, the operation of the coolant control valve unit to open the first coolant passage and the third coolant passage and to close the second coolant passage when the output signal of the first coolant temperature sensor satisfies the predetermined first low temperature driving condition.