Abstract: Provided is a ceiling storage system capable of correcting a working position and constantly checking stability of a structure by detecting an amount of change in a facility. According to the ceiling storage system, a transport vehicle moves to an upper portion of a first storage area of a plurality of storage areas in a state of gripping an article, and the transport vehicle measures a first distance value between the transport vehicle and the first storage area using a distance sensor and measures a relative position value between the transport vehicle and the first storage area using a vision sensor, before unloading the article from the first storage area.

Abstract: An apparatus and method of removing common mode noise in the case of measuring a biosignal using a capacitive coupling active electrode (CCE) is provided. A frequency band of a common mode signal may interact with a shield voltage and thus, a frequency band of a biosignal may be compensated for.

Abstract: A bioelectrode including a plate, a first electrode disposed on a first side of the plate, and a second electrode disposed on the first side of the plate and separate from the first electrode. The bioelectrode further includes a first guard portion disposed on a second side of the plate, a second guard portion disposed on the second side of the plate and separate from the first guard portion, and a preamplifier configured to output a voltage signal based on a biosignal measured between the first electrode and the second electrode.

Abstract: Disclosed are a biosignal measurement device and a capacitively-coupled active electrode. The capacitively-coupled active electrode includes an electrode face configured to form capacitive coupling with a subject in a non-contact manner to detect a biosignal, and a pre-amplifier disposed on a rear side of the electrode face and embedded in a porous insulator.

Abstract: A bioelectrode including a plate, a first electrode disposed on a first side of the plate, and a second electrode disposed on the first side of the plate and separate from the first electrode. The bioelectrode further includes a first guard portion disposed on a second side of the plate, a second guard portion disposed on the second side of the plate and separate from the first guard portion, and a preamplifier configured to output a voltage signal based on a biosignal measured between the first electrode and the second electrode.

Abstract: Disclosed are a biosignal measurement device and a capacitively-coupled active electrode. The capacitively-coupled active electrode includes an electrode face configured to form capacitive coupling with a subject in a non-contact manner to detect a biosignal, and a pre-amplifier disposed on a rear side of the electrode face and embedded in a porous insulator.

Abstract: An apparatus and method of removing common mode noise in the case of measuring a biosignal using a capacitive coupling active electrode (CCE) is provided. A frequency band of a common mode signal may interact with a shield voltage and thus, a frequency band of a biosignal may be compensated for.

Abstract: According to example embodiments, there is provided a method of cleaning a semiconductor device manufacturing apparatus. In the method, a fluorine-containing gas is provided into a chamber to clean a byproduct formed on a surface of a chamber during formation of a layer structure therein. A material is provided into the chamber to chemisorb the material on the surface of the chamber. The material is substantially similar to or the same as a source gas for forming the layer structure. A plasma is generated in the chamber, and the chamber is purged.

Abstract: Disclosed herein is a semiconductor device with a deep trench structure for effectively isolating heavily doped wells of neighboring elements from each other at a high operating voltage.

Abstract: Disclosed herein is a semiconductor device with a deep trench structure for effectively isolating heavily doped wells of neighboring elements from each other at a high operating voltage.

Abstract: Provided are an apparatus for depositing a thin film using plasma which can prevent impurities from being formed by inhibiting plasma from being diffused into a nozzle pipe and sustained in the nozzle pipe and improve thickness uniformity of the deposited thin film and a method of depositing the same. The apparatus for depositing a thin film includes a chamber having a substrate holder and an inner space defined by an inner wall; and a nozzle pipe comprising a first end fixed to the inner wall of the chamber; a second end extending into the inner space of the chamber; a flow path penetrating the nozzle pipe from the first end to the second end; and at least one slit which is disposed at the second end and opens the flow path into the inner space of the chamber.