Abstract: The present invention relates to a composition for viral RNA extraction and a viral RNA extraction method using the same, wherein various contaminants (e.g., fungi, bacteria, pollens, etc.) can be effectively removed from samples and thus the diagnosis of sample-derived viruses can be attained more sensitively, and more cheap reagents compared with existing compositions for RNA extraction are used and thus the scales of diagnosis tests of disease-mediated viruses and various monitoring programs can be further enlarged, thereby contributing to public health.

Abstract: The present invention relates to a composition for viral RNA extraction and a viral RNA extraction method using the same, wherein various contaminants (e.g., fungi, bacteria, pollens, etc.) can be effectively removed from samples and thus the diagnosis of sample-derived viruses can be attained more sensitively, and more cheap reagents compared with existing compositions for RNA extraction are used and thus the scales of diagnosis tests of disease-mediated viruses and various monitoring programs can be further enlarged, thereby contributing to public health.

Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.

Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.

Abstract: A deposition source capable of uniformly producing a deposition film. The deposition source includes a furnace, a first heating unit surrounding the furnace to heat the furnace and a second heating unit spaced-apart from the first heating unit by an interval and surrounding the furnace to heat the furnace, wherein the second heating unit comprises a plurality of separate sub-heating units that surround the furnace.

Abstract: A deposition source capable of uniformly producing a deposition film. The deposition source includes a furnace, a first heating unit surrounding the furnace to heat the furnace and a second heating unit spaced-apart from the first heating unit by an interval and surrounding the furnace to heat the furnace, wherein the second heating unit comprises a plurality of separate sub-heating units that surround the furnace.