Abstract: The present invention discloses an etching apparatus comprising an etching bath having an etchant; an etchant recycling part in the etching bath; a DI and undiluted etchant supply part for supplying a DI water and a undiluted etchant; an etchant mixing part for mixing the DI water and the undiluted etchant; and an etchant heating part for heating the mixed etchant.

Abstract: In an apparatus for etching a glass substrate according to the present invention, impurities that are attached to the surface of a glass substrate, which are formed by assembling a color filter substrate and a TFT substrate provided in the etching bath filled with etchant, are removed by using ultrasonic oscillation generated from an ultrasonic oscillator, by which a glass substrate having uniform thickness and surface is obtained.

Abstract: In an apparatus for etching a glass substrate according to the present invention, impurities that are attached to the surface of a glass substrate, which are formed by assembling a color filter substrate and a TFT substrate provided in the etching bath filled with etchant, are removed by using ultrasonic oscillation generated from an ultrasonic oscillator, by which a glass substrate having uniform thickness and surface is obtained.

Abstract: In an apparatus for etching a glass substrate according to the present invention, impurities that are attached to the surface of a glass substrate, which are formed by assembling a color filter substrate and a TFT substrate provided in the etching bath filled with etchant, are removed by using ultrasonic oscillation generated from an ultrasonic oscillator, by which a glass substrate having uniform thickness and surface is obtained.

Abstract: Disclosed is an improved apparatus for holding a bubble plate of an etching apparatus, in place with a cylinder, which is applicable to a glass substrate etching process, in order to facilitate changing and cleaning of the as bubble plate in a short period of time, as well as to prevent a low-quality etching and damage of the glass substrate caused by displacement of cassette guides in the etching apparatus. The etching apparatus according to the invention includes an etching bath having an etching solution, a plurality of cassette guides on a bottom surface of the etching bath, a cylinder on an external side of the etching bath, a plurality of plungers on the cylinder and the cassette guides, and a bubble plate fixed by the cassette guides.

Abstract: Disclosed is an improved apparatus for holding a bubble plate of an etching apparatus, in place with a cylinder, which is applicable to a glass substrate etching process, in order to facilitate changing and cleaning of the as bubble plate in a short period of time, as well as to prevent a low-quality etching and damage of the glass substrate caused by displacement of cassette guides in the etching apparatus. The etching apparatus according to the invention includes an etching bath having an etching solution, a plurality of cassette guides on a bottom surface of the etching bath, a cylinder on an external side of the etching bath, a plurality of plungers on the cylinder and the cassette guides, and a bubble plate fixed by the cassette guides.