Patents by Inventor Yong-Kwang Kim

Yong-Kwang Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11940725
    Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: March 26, 2024
    Assignee: S&S Tech Co., Ltd.
    Inventors: Cheol Shin, Yong-Dae Kim, Jong-Hwa Lee, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Patent number: 11927880
    Abstract: A blankmask for extreme ultraviolet lithography includes a substrate, a reflective layer formed on the substrate, and a phase shift layer formed on the reflective layer. The phase shift layer contains niobium (Nb), and is made of a material containing one of tantalum (Ta), chromium (Cr), and ruthenium (Ru). A phase shift layer containing Nb and Ta has a relative reflectance of 5 to 20%, a phase shift layer containing Nb and Cr has a relative reflectance of 9 to 15%, and a phase shift layer containing Nb and Ru has a relative reflectance of 20% or more. The phase shift layer has a phase shift amount of 170 to 230°, and has a surface roughness of 0.5 nmRMS or less. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: March 12, 2024
    Assignee: S&S TECH Co., Ltd.
    Inventors: Yong-Dae Kim, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20240070310
    Abstract: A method for protecting data based on a private set union (PSU) protocol includes: generating a Boolean vector for a first information set, based on whether or not each of a plurality of first groups that are groups of elements of the first information set stored in a first computing device is the same as each of a plurality of second groups that are groups of elements of a second information set stored in a second computing device, obtaining a random vector for the first information set as a result of shuffling performed by using the Boolean vector generated by the first computing device as an input and using order information and encryption information selected by the second computing device as inputs, and generating information on a union of the first information set and the second information set based on the random vector.
    Type: Application
    Filed: June 29, 2023
    Publication date: February 29, 2024
    Applicant: SAMSUNG SDS CO., LTD.
    Inventors: Yong Ha SON, Kyoo Hyung HAN, Seong Kwang KIM
  • Publication number: 20150248253
    Abstract: Disclosed is an intelligent distributed storage service system comprising: a web server configured to receive selection information including a virtual storage capacity necessary for a virtual storage service, the number of storage nodes, storage node types, and a distribution method from the terminal when the terminal requests the virtual storage service; at least one storage node configured to generate a virtual disk volume according to external control; a control center server configured to monitor available capacities and usage states of the storage nodes, determine a storage node corresponding to the selection information among the monitored storage nodes, and control the determined storage node to generate the virtual disk volume; and a database (DB) configured to store information of the storage node and virtual disk volume information of the user.
    Type: Application
    Filed: September 11, 2013
    Publication date: September 3, 2015
    Inventors: Tae Hoon Kim, Yong Kwang Kim
  • Publication number: 20150244803
    Abstract: Disclosed is a virtual storage service system comprising: a web server configured to receive selection information including a virtual storage capacity necessary for a virtual storage service, the number of storage nodes, storage node types, a distribution method, and a selected storage node from the terminal when the terminal requests the virtual storage service; a control center server configured to exert control with reference to the selection information so that a virtual disk volume is generated; at least one storage node configured to generate the virtual disk volume according to the control of the control center server; and a database (DB) configured to store information of the storage nodes and virtual disk volume information of the user.
    Type: Application
    Filed: September 11, 2013
    Publication date: August 27, 2015
    Inventors: Tae Hoon Kim, Yong Kwang Kim
  • Patent number: 5606451
    Abstract: An array of electrodisplacive actuators is prepared by first forming on an electrodisplacive ceramic wafer a plurality of regularly spaced vertically directional trenches running parallel to each other, followed by forming a first conductive metallic layer thereon. A multiplicity of regularly spaced horizontally directional trenches running parallel to each other and running normal to the plurality of vertically directional trenches is then formed on the thus prepared ceramic wafer. A ceramic block having a top and a bottom surfaces is then formed by bonding together two ceramic wafers, prepared using the above described procedures. The top and the bottom surfaces of the ceramic block are removed until the first conductive metallic layer is exposed, and then a series of regularly spaced vertically directional grooves is formed thereon. Finally, a second conductive metallic layer is deposited on a bottom and side surfaces of each of the grooves to thereby form the array of electrodisplacive actuators.
    Type: Grant
    Filed: March 23, 1994
    Date of Patent: February 25, 1997
    Assignee: Daewoo Electronics Co., Ltd.
    Inventors: Yong-Kwang Kim, Dong-Kuk Kim