Patents by Inventor Yong Kwang Lee

Yong Kwang Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162472
    Abstract: A bobbin installation unit includes a bobbin, a film supply unit configured to supply an electrode-connecting film to the bobbin, a transfer unit configured to transfer the electrode-connecting film installed in the film supply unit to the bobbin installation unit, an adhesive tape attaching unit installed above the bobbin installation unit and configured to attach an end portion of the electrode-connecting film drawn out to the transfer unit to the bobbin. It also includes a double-sided tape attaching unit configured to attach a double-sided tape to the electrode-connecting film wound on the bobbin, and a frame body on which the adhesive tape attaching unit and the double-sided tape attaching unit are movably installed.
    Type: Application
    Filed: February 8, 2023
    Publication date: May 16, 2024
    Applicant: LG Energy Solution, Ltd.
    Inventors: In Chan Choi, Sang Eun Jun, Jin Ki Han, Seung Jae Won, Yong Jin Kim, Jae Kwang Jung, Sae Eun Lee, Jun Kyu Park
  • Patent number: 11940725
    Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: March 26, 2024
    Assignee: S&S Tech Co., Ltd.
    Inventors: Cheol Shin, Yong-Dae Kim, Jong-Hwa Lee, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20120004389
    Abstract: A method for extracting propolis by using far infrared ray from pottery. The method for extracting propolis by using far infrared ray from pottery makes it possible to prohibit the growth of microorganism by way of far infrared ray by using pottery which emits far infrared ray and has a construction that inside and outside air can exchange while increasing a storage and seasoning effect. Aldehyde contained in alcohol is naturally radiated with the help of air circulation and preventing oxidation decay and shortening an extraction period of propolis.
    Type: Application
    Filed: May 14, 2010
    Publication date: January 5, 2012
    Inventor: Yong Kwang Lee