Patents by Inventor Yong Rim

Yong Rim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128930
    Abstract: The present disclosure relates to an offset elimination operation of an internal operational amplifier of a data driving circuit and relates to a technique that applies different offset elimination methods for each position of an operational amplifier.
    Type: Application
    Filed: October 13, 2023
    Publication date: April 18, 2024
    Applicant: LX SEMICON CO., LTD.
    Inventors: Yong Sung AHN, Ji Won KIM, Hyo Joong KIM, Kyung Min SHIN, Kyu Tae LEE, Ha Rim CHOI
  • Publication number: 20050247960
    Abstract: A method for fabricating a multi-layer film for vacuum packaging, comprises the steps of: supplying a gas-impermeable film to a cooling roll; supplying a sealing film to a nip roll having an embossed pattern; extruding a molten polymer material toward a gap between the gas-impermeable film and the sealing film, thereby forming a multi-layer preform having a structure of gas-impermeable film-polymer layer-sealing film; and squeezing the multi-layer preform by passing the multi-layer preform through a nip between the nip roll and the cooling roll, so that the gas-impermeable film, the sealing film, and the polymer material of the multi-layer preform are laminated on each other simultaneously while the sealing film and the polymer material are embossed by the nip roll and the cooling roll.
    Type: Application
    Filed: February 18, 2005
    Publication date: November 10, 2005
    Applicant: Barflex Corporation
    Inventors: Yong Rim, Yong Kwon, Won Choi
  • Publication number: 20030207651
    Abstract: A polishing endpoint detecting device of a polishing apparatus detects a polishing endpoint of a polishing process by measuring light reflected from a surface of a semiconductor substrate being polished. The apparatus also includes a polishing pad and a rotary plate each of a light-transmitting material. The light is directed onto the surface of the semiconductor substrate through the polishing pad and the rotary plate and is scanned across the surface of the semiconductor substrate along a horizontal line which passes through the centers of the polishing pad and the semiconductor substrate. A light-measuring instrument measures a characteristic of the light reflected from the surface of the semiconductor substrate, and a processor detects the polishing endpoint by analyzing signals produced by the light measuring instrument.
    Type: Application
    Filed: March 18, 2003
    Publication date: November 6, 2003
    Inventors: Seung-Kon Kim, Yong -Rim Ko