Patents by Inventor Yong-Sen Su

Yong-Sen Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS FOR UNIFORM THERMAL PROCESSING
    Publication number: 20110052159
    Abstract: An apparatus of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Application
    Filed: September 3, 2009
    Publication date: March 3, 2011
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Ming-June Lin, Yong-Sen Su
  • Apparatus and adjusting technology for uniform thermal processing
    Patent number: 7262390
    Abstract: An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: August 28, 2007
    Assignee: Chung Shan Institute of Science and Technology, Armaments Bureau, M.N.D.
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Jen-Chieh Tsao, Ming-June Lin, Yong-Sen Su, Yi-Hsiang Lai
  • Apparatus and adjusting technology for uniform thermal processing
    Publication number: 20060291823
    Abstract: An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Application
    Filed: November 9, 2005
    Publication date: December 28, 2006
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Jen-Chieh Tsao, Ming-June Lin, Yong-Sen Su, Yi-Hsiang Lai