Abstract: A method and a system thereof for producing a digital holographic screen based on multi-hogel printing are proposed. The system includes a light source unit including lasers, a dichroic mirror for RGB three color matching, mirrors, a beam splitter, and an optical shutter, an object beam unit including a spatial filter, a lens, and a mirror, a reference beam unit including a spatial filter, a lens, and a mirror, a diffuser fixing unit including a diffuser holder and a diffuser positioned between the object beam unit and a recording material and configured to scatter and diffuse the object beam, a photomask movement unit including a photomask holder, an XY-translation stage, and a photomask positioned between the reference beam unit and the recording medium and on which a grid-shaped on/off binary pattern is printed, and a controller configured to control the optical shutter and the XY-translation stage.

Abstract: The present disclosure relates to a spiropyran composite having improved mechano-sensitivity, a method for manufacturing the same, and a chromic article including the same. Particularly, the spiropyran composite is obtained by bonding spiropyran covalently to a polymer, an inorganic material or a mixture thereof to form spiropyran composite, and impregnating the spiropyran composite with a sensitivity-enhancing agent for a suitable time through a wet infiltration process to form non-polar environment at the inner part of the spiropyran composite, to cause pre-stretch and to increase a change in color or fluorescence in response to force, stress or strain, thereby providing significantly improved mechano-sensitivity. In addition, a wet filtration process is used and no expensive equipment is required to simplify the process. Further, the process can be performed rapidly within several minutes to reduce the processing time.

Abstract: An acryl-based copolymer composition is provided. The acryl-based copolymer composition includes an acryl-based copolymer, an aggregation inducing agent, and an aggregating agent, wherein the acryl-based copolymer includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit. The aggregation inducing agent includes a siloxane-based monomer-derived repeating unit and an ether-based monomer-derived repeating unit, and the aggregating agent includes a monovalent ionic metal salt.

Abstract: A latex composition for dip forming, and more particularly, to a latex composition for dip forming includes carboxylic acid-modified nitrile-based copolymer latex; and a phenolic emulsifier, wherein the phenolic emulsifier is included in an amount of 0.08 parts by weight to 6 parts by weight (based on a solid content) based on 100 parts by weight of the carboxylic acid-modified nitrile-based copolymer latex. A method for preparing the latex composition and a formed article produced using the latex composition are also provided.

Abstract: Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Abstract: Provided is a latex composition for dip molding. The latex composition for dip molding includes a carboxylic acid-modified nitrile-based copolymer latex and a hydrophobically modified alkali-soluble emulsion thickener, wherein the hydrophobically modified alkali-soluble emulsion thickener includes a copolymer including an associative portion and a non-associative portion, and the associative portion includes a monomer-derived repeating unit substituted by one or more first hydrophobic groups selected from the group consisting of alkyl, alkenyl, perfluoroalkyl, and carbosilyl having 8 to 15 carbon atoms, and aryl, arylalkyl, arylalkenyl, alicyclic alkyl, and polycyclic alkyl having 6 to 15 carbon atoms. A method of preparing the latex composition for dip molding, and a molded article manufactured therefrom are also provided.

Abstract: Provided is a carboxylic acid-modified nitrile-based copolymer latex, and more particularly, provided are a carboxylic acid-modified nitrile-based copolymer latex which includes a carboxylic acid-modified nitrile-based copolymer including a monomer-derived repeating unit; and a repeating unit derived from a monomer represented by Chemical Formula 1 below, the monomer-derived repeating unit including a conjugated diene-based monomer-derived repeating unit, an ethylenically unsaturated nitrile-based monomer-derived repeating unit, and an ethylenically unsaturated acid monomer-derived repeating unit (see description of the present invention), a method for preparing a carboxylic acid-modified nitrile-based copolymer latex, a latex composition for dip-forming including the copolymer latex, and an article formed by the composition.

Abstract: An acrylic copolymer is provided. The acrylic copolymer includes: a main monomer-derived repeating unit; and a chain transfer agent-derived part, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinking monomer-derived repeating unit, the chain transfer agent-derived part is derived from a chain transfer agent having a carbonothioylthio group, and the chain transfer agent-derived part is included in an amount of 0.03 parts by weight to 0.08 parts by weight with respect to 100 parts by weight of the main monomer-derived repeating unit. A method of preparing the same, and an acrylic copolymer composition including the same is also provided.

Abstract: Provided is an acryl-based copolymer, and more particularly, an acryl-based copolymer including a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit, the polyfunctional monomer includes a vinyl group or an allyl group, and the polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit.

Abstract: An acryl-based copolymer composition is provided. The acryl-based copolymer composition includes an acryl-based copolymer, an aggregation inducing agent, and an aggregating agent, wherein the acryl-based copolymer includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit. The aggregation inducing agent includes a siloxane-based monomer-derived repeating unit and an ether-based monomer-derived repeating unit, and the aggregating agent includes a monovalent ionic metal salt.

Abstract: Provided is a latex composition for dip molding. The latex composition for dip molding includes a carboxylic acid-modified nitrile-based copolymer latex and a hydrophobically modified alkali-soluble emulsion thickener, wherein the hydrophobically modified alkali-soluble emulsion thickener includes a copolymer including an associative portion and a non-associative portion, and the associative portion includes a monomer-derived repeating unit substituted by one or more first hydrophobic groups selected from the group consisting of alkyl, alkenyl, perfluoroalkyl, and carbosilyl having 8 to 15 carbon atoms, and aryl, arylalkyl, arylalkenyl, alicyclic alkyl, and polycyclic alkyl having 6 to 15 carbon atoms. A method of preparing the latex composition for dip molding, and a molded article manufactured therefrom are also provided.

Abstract: Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Abstract: A latex composition for dip forming, and more particularly, to a latex composition for dip forming includes carboxylic acid-modified nitrile-based copolymer latex; and a phenolic emulsifier, wherein the phenolic emulsifier is included in an amount of 0.08 parts by weight to 6 parts by weight (based on a solid content) based on 100 parts by weight of the carboxylic acid-modified nitrile-based copolymer latex. A method for preparing the latex composition and a formed article produced using the latex composition are also provided.

Abstract: An acrylic copolymer is provided. The acrylic copolymer includes: a main monomer-derived repeating unit; and a chain transfer agent-derived part, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinking monomer-derived repeating unit, the chain transfer agent-derived part is derived from a chain transfer agent having a carbonothioylthio group, and the chain transfer agent-derived part is included in an amount of 0.03 parts by weight to 0.08 parts by weight with respect to 100 parts by weight of the main monomer-derived repeating unit. A method of preparing the same, and an acrylic copolymer composition including the same is also provided.

Abstract: A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.

Abstract: Provided is a carboxylic acid-modified nitrile-based copolymer latex, and more particularly, provided are a carboxylic acid-modified nitrile-based copolymer latex which includes a carboxylic acid-modified nitrile-based copolymer including a main monomer-derived repeating unit; and a repeating unit derived from a monomer represented by Chemical Formula 1 below, the main monomer-derived repeating unit including a conjugated diene-based monomer-derived repeating unit, an ethylenically unsaturated nitrile-based monomer-derived repeating unit, and an ethylenically unsaturated acid monomer-derived repeating unit (see description of the present invention), a method for preparing a carboxylic acid-modified nitrile-based copolymer latex, a latex composition for dip-forming including the copolymer latex, and an article formed by the composition.

Abstract: A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Abstract: An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.