Abstract: Within a method for fabricating a microelectronic fabrication there is employed a patterned positive photoresist residue layer as a protective layer within an aperture when processing an upper region of a topographic microelectronic layer having formed therein the aperture. The patterned positive photoresist residue layer is formed employing an incomplete vertical, but complete horizontal, blanket photoexposure and development of a blanket positive photoresist layer formed upon the topographic microelectronic layer and filling the aperture. The method provides the microelectronic fabrication with enhanced reliability.

Abstract: Within a method for fabricating a microelectronic fabrication there is employed a patterned positive photoresist residue layer as a protective layer within an aperture when processing an upper region of a topographic microelectronic layer having formed therein the aperture. The patterned positive photoresist residue layer is formed employing an incomplete vertical, but complete horizontal, blanket photoexposure and development of a blanket positive photoresist layer formed upon the topographic microelectronic layer and filling the aperture. The method provides the microelectronic fabrication with enhanced reliability.

Abstract: An apparatus and a method for stepper exposure control by utilizing a shutter assembly formed of electro-optic crystal materials in a photolithographic process are disclosed. In the apparatus, a series of control panels are stacked together to form a shutter assembly. Each of the control panel is formed by depositing a multiplicity of parallel, spaced-apart lines of electro-optic crystal material on a polarizer sheet. Two of such polarizer sheets are then stacked together with the lines parallel to each other and the lines on the top panel overlapping the spacing on the bottom panel. Two bottom panels are formed similarly however, positioned with the lines perpendicular to the lines in the first and second control panel when assembled together in the shutter assembly. A suitable electro-optic crystal material used should withstand a high temperature environment. One of such suitable material is LiNbO3.