Patents by Inventor Yong Sun

Yong Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10910237
    Abstract: A wet etching system operating method includes providing an etching apparatus having an Nth etching solution, loading Nth batch substrates into the etching apparatus and performing an Nth etching process, discharging some of the Nth etching solution, refilling the etching apparatus with an (N+1)th etching solution supplied from a supply apparatus connected to the etching apparatus, and loading (N+1)th batch substrates into the etching apparatus and performing an (N+1)th etching process, wherein the (N+1)th etching solution has a temperature within or higher than a temperature management range of the (N+1)th etching process, and wherein the (N+1)th etching solution has a concentration within or higher than a concentration management range of the (N+1)th etching solution, N being a positive integer.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: February 2, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Hoon Jeong, Yong Sun Ko, Dong Ha Kim, Tae Heon Kim, Chang Sup Mun, Woo Gwan Shim, Jun Youl Yang, Se Ho Cha
  • Publication number: 20210013958
    Abstract: Provided is an apparatus and method for wideband short-range wireless communication using a directional antenna in a millimeter wave band, and the method for wideband short-range wireless communication according to an embodiment may determine a first time interval and a second time interval for a cooperated data frame transfer based on a packet transmission time at each transmission from a source node to a destination node, transmit a frame to a relay node through an antenna pattern directed towards the relay node at a start point of the first time interval, and transmit the frame to the destination node through an antenna pattern directed towards the destination node after a predetermined period of time from a start point of the second time interval.
    Type: Application
    Filed: September 15, 2020
    Publication date: January 14, 2021
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Kap Seok CHANG, Hyoung Jin KWON, Sung Geun JIN, Yong Sun KIM, Seung Eun HONG, Woo Yong LEE, Hyun Kyu CHUNG
  • Publication number: 20210009598
    Abstract: The present invention discloses phthalazine isoxazole alkoxy derivatives, a preparation method thereof, a pharmaceutical composition, and a use thereof. The present invention provides a compound represented by Formula I, cis-trans isomers thereof, enantiomers thereof, diastereoisomers thereof, racemates thereof, solvates thereof, hydrates thereof, and pharmaceutically acceptable salts or prodrugs thereof. The compound has an excellent inverse agonist effect with respect to ?5-GABAA.
    Type: Application
    Filed: March 12, 2019
    Publication date: January 14, 2021
    Inventors: Fei WANG, Jinhua WU, Yun JIN, Yong SUN, Shuai LI
  • Patent number: 10870541
    Abstract: The embodiments of the present disclosure provide a logistics trolley, including a carrier for carrying a material, a body for supporting the carrier, and wheels disposed below the bottom of the trolley body, wherein the carrier has an extension length in a horizontal direction greater than an extension length of the trolley body in a horizontal direction, the carrier includes a conveying mechanism for conveying the material.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: December 22, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Fan Peng, Wei Min, Haibin Liu, Fangqing Li, Yong Sun, Baoyong Nie, Zhiyu Qian
  • Publication number: 20200388483
    Abstract: A method of post-treating a silicon nitride (SiN)-based dielectric film formed on a surface of a substrate includes positioning a substrate having a silicon nitride (SiN)-based dielectric film formed thereon in a processing chamber, and exposing the silicon nitride (SiN)-based dielectric film to helium-containing high-energy low-dose plasma in the processing chamber. Energy of helium ions in the helium-containing high-energy low-dose plasma is between 1 eV and 3.01 eV, and flux density of the helium ions in the helium-containing high-energy low-dose plasma is between 5×1015 ions/cm2·sec and 1.37×1016 ions/cm2·sec.
    Type: Application
    Filed: June 4, 2020
    Publication date: December 10, 2020
    Inventors: Yong SUN, Jung Chan LEE, Shuchi Sunil OJHA, Praket Prakash JHA, Jingmei LIANG
  • Publication number: 20200383074
    Abstract: Disclosed are a method and an apparatus for transmitting and receiving a synchronization signal in a communication system. According to an exemplary embodiment of the present disclosure, a method of transmitting a first synchronization signal, performed by a base station in the communication system, may comprise generating a base sequence; generating a modified sequence by inverting polarity of the base sequence; mapping the base sequence and the modified sequence to a first frequency region having a frequency higher than a center subcarrier and a second frequency region having a frequency lower the center subcarrier, so that the base sequence and the modified sequence are symmetric centering the center subcarrier located at a center frequency of a frequency domain of the synchronization signal; and transmitting the synchronization signal comprising the base sequence and the modified sequence to a terminal. Therefore, performance of the communication system can be improved.
    Type: Application
    Filed: May 27, 2020
    Publication date: December 3, 2020
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Kap Seok CHANG, Young Jo KO, Yong Sun KIM, Sang Ho LEE
  • Publication number: 20200381248
    Abstract: A method of post-treating a dielectric film formed on a surface of a substrate includes positioning a substrate having a dielectric film formed thereon in a processing chamber and exposing the dielectric film to microwave radiation in the processing chamber at a frequency between 5 GHz and 7 GHz.
    Type: Application
    Filed: March 12, 2020
    Publication date: December 3, 2020
    Inventors: Yong SUN, Praket Prakash JHA, Jingmei LIANG, Martin Jay SEAMONS, DongQing LI, Shashank SHARMA, Abhilash J. MAYUR, Wolfgang R. ADERHOLD
  • Patent number: 10834732
    Abstract: Provided is an apparatus and method for transmitting and receiving data using multiple paths in a wireless communication system using a distributed Media Access Control (MAC). More particularly, provided is an apparatus and method for transmitting and receiving data that may select a path with a better channel status from multiple paths that include a direct path using a Line of Sight (LOS) and a relay path passing through a relay apparatus, in a wireless communication system that may transmit data via the LOS using a distributed MAC and a directional antenna.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: November 10, 2020
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Hyoung Jin Kwon, Jin Kyeong Kim, Yong Sun Kim, Kyeongpyo Kim, Seung Eun Hong, Woo Yong Lee
  • Patent number: 10818522
    Abstract: Disclosed are a supercritical process chamber and an apparatus having the same. The process chamber includes a body frame having a protrusion protruding in an upward vertical direction from a first surface of the body frame and a recess defined by the protrusion and the first surface of the body frame; a cover frame; a buffer chamber arranged between the body frame and the cover frame; and a connector. The buffer chamber includes an inner vessel detachably coupled to the body frame providing a chamber space in the recess and an inner cover detachably coupled to the cover frame. The inner cover is in contact with a first surface of the inner vessel enclosing the chamber space from surroundings. The connector couples the body frame and the cover frame having the buffer chamber arranged therebetween such that the enclosed chamber space is transformed into a process space in which the supercritical process is performed.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: October 27, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-Jine Park, Byung-Kwon Cho, Yong-Jhin Cho, Yong-Sun Ko, Yeon-Jin Gil, Kwang-Wook Lee
  • Patent number: 10812175
    Abstract: Provided is an apparatus and method for wideband short-range wireless communication using a directional antenna in a millimeter wave band, and the method for wideband short-range wireless communication according to an embodiment may determine a first time interval and a second time interval for a cooperated data frame transfer based on a packet transmission time at each transmission from a source node to a destination node, transmit a frame to a relay node through an antenna pattern directed towards the relay node at a start point of the first time interval, and transmit the frame to the destination node through an antenna pattern directed towards the destination node after a predetermined period of time from a start point of the second time interval.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: October 20, 2020
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Kap Seok Chang, Hyoung Jin Kwon, Sung Geun Jin, Yong Sun Kim, Seung Eun Hong, Woo Yong Lee, Hyun Kyu Chung
  • Patent number: 10811212
    Abstract: Disclosed embodiments include vacuum electronic devices and methods of fabricating a vacuum electronic device. In a non-limiting embodiment, a vacuum electronic device includes an electrode that defines discrete support structures therein. A first film layer is disposed on the electrode about a periphery of the electrode and on the support structures. A second film layer is disposed on the first film layer. The second film layer includes electrically conductive grid lines patterned therein that are supported by and suspended between the support structures.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: October 20, 2020
    Assignee: Modern Electron, LLC
    Inventors: Max N. Mankin, Chloe A. M. Fabien, Gary D. Foley, Andrew T. Koch, William Kokonaski, Andrew R. Lingley, Tony S. Pan, Yong Sun
  • Publication number: 20200321784
    Abstract: The present disclosure relates to a method, an apparatus and a storage medium for controlling a combined heat and power system, belonging to the field of power system technologies. The method discloses: establishing a decision model, the decision model including an objective function aiming to minimize a total cost of the first generators and the second generators, and constraints with respect to the first generators, the second generators and the heating exchange stations; solving the decision model to acquire operation states of the first generators, operation states of the second generators, and operations states of the heating exchange stations; and controlling the combined heat and power system, based on the operation states of the first generators, the operation states of the second generators, and the operations states of the heating exchange stations.
    Type: Application
    Filed: October 25, 2019
    Publication date: October 8, 2020
    Inventors: Wenchuan WU, Bin WANG, Yong SUN, Hongbin SUN, Qinglai GUO, Chenhui LIN
  • Patent number: 10795263
    Abstract: A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: October 6, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., DONGWOO FINE-CHEM
    Inventors: Jung-Min Oh, Mi-Hyun Park, Hyo-San Lee, Ji-Hoon Jeong, Yong-Sun Ko, In-Gi Kim, Na-Rim Kim, Sang-Tae Kim, Seong-Min Kim, Kyong-Ho Lee
  • Publication number: 20200305590
    Abstract: A magnetic bottle brush that has a handle with an upper portion and a lower portion and a brush head attached to the upper portion of the handle. A magnetic element is disposed in the lower portion of the handle that exerts a magnetic attraction force between the magnetic bottle brush and an accompanying magnetic base.
    Type: Application
    Filed: March 2, 2020
    Publication date: October 1, 2020
    Applicant: Munchkin, Inc.
    Inventors: Steven Bryan DUNN, Yong Sun Simon KANG, Thomas Edward BIRKERT, Mark Gerard TEBBE, Fangyi GAO, Nicholas TRUMBO, Sung Yun CHAN
  • Publication number: 20200303182
    Abstract: A substrate processing apparatus includes a chamber providing a space in which a substrate is processed, a first substrate support within the chamber and configured to support the substrate when the substrate is loaded into chamber, a second substrate support within the chamber and configured to support the substrate in a height greater than the height in which the first substrate supports the substrate, a first supply port through which a supercritical fluid is supplied to a first space under the substrate of a chamber space, a second supply port through which the supercritical fluid is supplied to a second space above the substrate of the chamber space, and an exhaust port through which the supercritical fluid is exhausted from the chamber.
    Type: Application
    Filed: June 4, 2020
    Publication date: September 24, 2020
    Applicants: Samsung Electronics Co., Ltd., SEMES CO., LTD.
    Inventors: Won-Ho JANG, Jeong-Yong BAE, Woo-Young KIM, Hyun-Jung LEE, Se-Jin PARK, Yong-Sun KO, Dong-Gyun HAN, Woo-Gwan SHIM, Boong KIM
  • Publication number: 20200286773
    Abstract: Embodiments disclosed herein relate to cluster tools for forming and filling trenches in a substrate with a flowable dielectric material. In one or more embodiments, a cluster tool for processing a substrate contains a load lock chamber, a first vacuum transfer chamber coupled to the load lock chamber, a second vacuum transfer chamber, a cooling station disposed between the first vacuum transfer chamber and the second vacuum transfer chamber, a factory interface coupled to the load lock chamber, a plurality of first processing chambers coupled to the first vacuum transfer chamber, wherein each of the first processing chambers is a deposition chamber capable of performing a flowable layer deposition, and a plurality of second processing chambers coupled to the second vacuum transfer chamber, wherein each of the second processing chambers is a plasma chamber capable of performing a plasma curing process.
    Type: Application
    Filed: May 26, 2020
    Publication date: September 10, 2020
    Inventors: Jingmei LIANG, Yong SUN, Jinrui GUO, Praket P. JHA, Jung Chan LEE, Tza-Jing GUNG, Mukund SRINIVASAN
  • Patent number: 10771798
    Abstract: The present disclosure discloses a multi-stream image processing method that includes steps outlined below. Image streams that include a main image stream and at least one sub image stream are generated by a former stage circuit, wherein a resolution of the main image stream is higher than the resolution of the sub image stream. Within an image frame processing time period, a N-th sub image frame is stored in a current sub image storage block in a memory module and a N-th main image frame is stored in a current main image storage block in the memory module by the former stage circuit. Within a first sub period of the image frame processing time period, a N?1-th sub image frame is read from a former sub image storage block in the memory module by a latter stage circuit to perform processing. Within a second sub period of the image frame processing time period, the N-th main image frame is read by the latter stage circuit to perform processing.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: September 8, 2020
    Assignee: XIAMEN SIGMASTAR TECHNOLOGY LTD.
    Inventors: Ming-Yong Sun, Hao Wang
  • Patent number: 10764790
    Abstract: Provided is a communication method of a coordinator in a wireless networks system that uses a reservation-based media access control (MAC). The communication method includes receiving, from a source device, a frame that requests a reservation resource for a relay device, to enable a frame that the source device transmits to a destination device to be relayed via the relay device, and allocating the reservation resource for the relay device, in response to the request.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: September 1, 2020
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Hyoung Jin Kwon, Yong Sun Kim, Kap Seok Chang, Seung Eun Hong, Sung Geun Jin, Woo Yong Lee, Hyun Kyu Chung
  • Publication number: 20200231388
    Abstract: The embodiments of the present disclosure provide a logistics trolley, including a carrier for carrying a material, a body for supporting the carrier, and wheels disposed below the bottom of the trolley body, wherein the carrier has an extension length in a horizontal direction greater than an extension length of the trolley body in a horizontal direction, the carrier includes a conveying mechanism for conveying the material.
    Type: Application
    Filed: August 16, 2017
    Publication date: July 23, 2020
    Inventors: Fan PENG, Wei MIN, Haibin LIU, Fangqing LI, Yong SUN, Baoyong NIE, Zhiyu QIAN
  • Patent number: 10720297
    Abstract: Disclosed embodiments include vacuum electronics devices and methods of fabricating a vacuum electronics device. In a non-limiting embodiment, a vacuum electronics device includes: an electrode; a first film layer disposed on the electrode about a periphery of the electrode; and a second film layer disposed on the first film layer, the second film layer including a plurality of electrically conductive grid lines patterned therein that are supported only at the periphery of the electrode by the first film layer.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: July 21, 2020
    Assignee: Modern Electron, Inc.
    Inventors: Yong Sun, Andrew T. Koch, Andrew R. Lingley, Chloe A. M. Fabien, Max N. Mankin, Tony S. Pan