Abstract: A device for concentrating chemical substances for use during the fabrication of a semiconductor device uses a sample container for holding chemical substances. A feed tube in gas flow communication with the sample container introduces a carrier gas. A vapor outlet in gas flow communication with the sample container discharges a mixture of a vapor and the carrier gas. A sample heater, disposed above and apart from the sample container, heats the chemical substances to a first predetermined temperature. A gas source supplies the carrier gas, and a gas heater, in gas flow communication with both the gas source and the feed tube, heats the carrier gas to a second predetermined temperature. A condenser in flow communication with the vapor outlet produces a liquid from the vapor, and a collecting container collects the liquid.

Abstract: A method of concentrating chemicals for semiconductor devices, which includes the steps of heating a sample container by using a high-energy light source, vaporizing the chemicals by injecting a high-temperature gas into the sample container through an injection opening in the sample container and discharging the vaporized chemicals by the pressure of the gas through a gas outlet formed on the sample container. An apparatus of concentrating chemicals for semiconductor devices includes a sample container having a sample-supply window, a gas-injection opening and a gas outlet. A high-energy light source heats the sample container and a gas-supply source supplies the gas through a gas-injection opening in the sample container. A gas-heating device located between the sample container and the gas-supply source heats the gas provided by the gas-supply source.