Abstract: A solar cell includes a first electrode on a substrate; a plurality of pillars on the first electrode; a semiconductor layer on the first electrode, wherein a surface area of the semiconductor layer is greater than a surface area of the first electrode; and a second electrode over the semiconductor layer.

Abstract: In a method for transmitting service information between network nodes in a wireless system providing one or more multimedia broadcast/multicast service (MBMS), when one terminal is moved from a first network node to a cell managed by a second network node, the first network node receives status information of the cell from the second network node, and when the specific terminal is moved into the cell, the first network node selectively transmits an MBMS connection request message to the second network node. In this case, the status information includes MBMS service area information of a neighboring cell with respect to the MBMS service for which the specific terminal has joined and/or information an MBMS function is supported.

Abstract: A molding heater includes a first metal plate having a recess formed on one side and a flat surface formed at the other side. A groove is formed at a lower portion of the recess and a wafer is placed on the flat surface. A hot wire is inserted into the groove. A ceramic is filled in a gap between the hot wire and the groove. A second metal plate coupled with the first metal plate fills the recess while contacting with the lower portion and lateral sides of the recess. Since the hot wire is surrounded only with a single layer of the ceramic, a resistance of the heat conduction can be minimized. Accordingly, a sufficient calorific power can be obtained through the metal plates using even a small power and a short of the hot wire due to an overload can be prevented.

Abstract: Provided is a high-speed electron beam lithography system including a transfer chamber; a plurality of electron beam lithography chambers, each of which is connected to the transfer chamber and includes a multicolumn portion; and input and output loadlock chambers, each of which is connected to the transfer chamber. Herein, the plurality of electron beam lithography chambers and the input and output loadlock chambers are connected to the transfer chamber, forming a cluster. Also, a plurality of wafers are respectively loaded into the plurality of electron beam lithography chambers so as to drive the electron beam lithography chambers at the same time.

Abstract: Disclosed is a molding heater including: a first metal plate having a recess formed on one side thereof and a groove elongatedly formed on a lower portion of the recess; a hot wire inserted into the groove; a ceramic filled in a gap between the hot wire and the groove; and a second metal plate coupled with the fist metal plate, the second metal plate filling the recess while closely contacting with the lower portion and lateral sides of the recess. Since the hot wire 120a is surrounded only with a single layer of the ceramic 120b, a resistance of the heat conduction can be minimized. Accordingly, a sufficient calorific power can be obtained through the metal plates 110a and 110b using even a small power and a short of the hot wire 120a due to an overload can be prevented. Further, since the metal tube 20c of the prior art is not used, it is unnecessary to perform the outgassing process, thereby simplifying a manufacturing process.

Abstract: An apparatus for fabricating a semiconductor device includes: a reactive chamber having an inlet and an outlet for a gas and being electrically grounded; a susceptor installed in the reactive chamber for mounting a wafer thereon and being electrically insulated with the reactive chamber; and an RF generator for applying an RF electric power to the susceptor. A method for cleaning the apparatus for fabricating a semiconductor device includes the steps of: injecting a plasma forming gas through the gas inlet; and moving the susceptor in the vertical direction of the face of the wafer while applying the RF electric power to the susceptor, to control the position and the density of the plasma. Since the plasma is formed even at the shadow area, such as the lower space of the susceptor within the reactive chamber where plasma could be hardly formed, there is no need to clean separately the lower space of the reactive chamber. Thus, the cleaning process is simplified.

Abstract: The present invention relates to a novel aryl benzoyl urea derivative represented by formula (I), in which X.sup.1 and X.sup.2 independently of one another represent hydrogen, fluoro, chloro or bromo, R.sup.1 represents chloro, bromo or trifluoromethyl, one of R.sup.2 and R.sup.4 is hydrogen and the other represents fluoro, chloro, bromo, cyano or trifluoromethyl, and R.sup.3 represents fluoro, chloro, bromo or cyano, which has a potent growth-retarding activity against pests.

Abstract: The present invention relates to a novel benzoyl urea derivative which exhibits potent growth-retarding activity against pests and which is represented by formula (I), ##STR1## in which A represents N or CH, and X.sup.1 and X.sup.2 independently of one another represent hydrogen, fluoro, chloro or bromo.