Abstract: A method of selecting plasma doping process parameters includes determining a recipe parameter database for achieving at least one plasma doping condition. The initial recipe parameters are determined from the recipe parameter database. In-situ measurements of at least one plasma doping condition are performed. The in-situ measurements of the at least one plasma doping condition are correlated to at least one plasma doping result. At least one recipe parameter is changed in response to the correlation so as to improve at least one plasma doping process performance metric.

Abstract: A volume diffractive composite is disclosed for providing illumination at a first output angle. The volume diffractive composite comprises a first plurality of grating elements that are mutually spaced from another in a first position with a first spacing period along a first plane, and an actuation unit for changing at least one of the position or the spacing period of the first plurality of grating elements to a second position or spacing period to provide illumination at a second output angle.

Abstract: A volume diffractive composite is disclosed for providing illumination at a first output angle. The volume diffractive composite comprises a first plurality of grating elements that are mutually spaced from another in a first position with a first spacing period along a first plane, and an actuation unit for changing at least one of the position or the spacing period of the first plurality of grating elements to a second position or spacing period to provide illumination at a second output angle.

Abstract: A method for the manufacturing of an array of M.times.N thin film actuated mirrors for use in an optical projection system, the inventive method includes the steps of: preparing an active matrix; depositing a passivation layer and an etchant stopping layer; depositing a thin film sacrificial layer; creating an array of M.times.N pairs of empty cavities and a continuous sacrificial area to thereby form a combination layer; forming an array of M.times.N actuated mirror structures, each of the actuated mirror structures including a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode, an elastic member; and removing the thin film sacrificial layer, thereby forming the array of M.times.N thin film actuated mirrors.

Abstract: An inventive array of thin film actuated mirrors is provided with an active matrix having an array of switching devices, an array of actuating structures and an array of mirrors, wherein each of the actuating structures is cantilevered on the active matrix, and each of the switching devices is positioned on the active matrix beside the position at which each of the actuating structures is cantilevered. In the array, during the operation of the array, since each of the mirrors is connected to the actuating structure through a recessed portion thereof, the mirror stays planar, allowing more accurate and effective reflection of the light beams, which will, in turn, enhance the overall optical efficiency of the array.

Abstract: An array of M.times.N electrodisplacive actuators is prepared by:(1) forming a multilayered ceramic structure having M layers of a first conductive metallization and M+1 layers of an electrodisplacive material;(2) obtaining a composite ceramic wafer by slicing the multilayered ceramic structure in a direction normal to the layers of the first conductive metallization;(3) providing a plurality of regularly spaced horizontally directional trenches running parallel to each other wherein each of the trenches is located at an equidistance from two adjacent layers of the first conductive metallization;(4) depositing a second conductive metallization;(5) preparing N-1 regularly spaced vertically directional cuts on the composite ceramic wafer prepared using steps (3) and (4) to thereby obtain the array of M.times.N electrodisplacive actuators.

Abstract: An array of M.times.N piezoelectric actuators is prepared by:(1) forming a multilayered ceramic structure having M layers of a first conductive metallization and M+1 layers of a piezoelectric material;(2) obtaining a composite ceramic wafer by slicing the multilayered ceramic structure in a direction normal to the layers of the first conductive metallization;(3) providing a plurality of regularly spaced horizontally directional trenches running parallel to each other wherein each of the trenches is located at an equidistance from two adjacent layers of the first conductive metallization;(4) depositing a first and second external electrode layers;(5) polarizing the pair of layers of the piezoelectric material located between the first and second external electrode layers;(6) forming N-1 regularly spaced vertically directional cuts on the poled composite ceramic wafer prepared using steps (3), (4) and (5) to thereby obtain the array of M.times.N piezoelectric actuators.

Abstract: An M.times.N actuated mirror array for use in an optical projection system, comprises:a substrate having an array of M.times.N openings therethrough and an array of connecting terminals, wherein each of the M.times.N openings is filled with a metallization and each of the connecting terminals is located on top of each of the M.times.N openings filled with the metallization;an array of M.times.N actuators, wherein each of the M.times.N actuators is provided with a top surface, a bottom surface and a pair of external sides, and is comprised of a pair of electrodisplacive members, a common signal electrode located between the pair of electrodisplacive members, and a pair of reference electrodes on the pair of external sides of the actuator, respectively; andan array of M.times.N mirrors, wherein each of the M.times.N mirrors is coupled with each of the M.times.N actuators and is located on the top surface thereof.

Abstract: An M.times.N actuated mirror array for use in an optical projection system, wherein M and N are integers, including: an array of M.times.N electrodisplacive actuators wherein each of the M.times.N electrodisplacive actuators is provided with a top surface, a bottom surface, a pair of external sides and has a bimorph structure having a pair of layers of an electrodisplacive material, a common signal electrode located between the pair of layers of the electrodisplacive material, and a pair of reference electrodes provided on the external sides thereof an array of M.times.N mirrors wherein each of M.times.N mirrors is coupled with each of the M.times.N electrodisplacive actuators and is mounted on the top surface of each of the M.times.N actuators an active matrix substrate comprising a substrate and an array of M.times.N second conductive type MOSFETs formed on the substrate; and an array of M.times.N connecting terminals wherein each of the M.times.

Abstract: An array of M.times.N electrodisplacive actuators is prepared by:(1) forming a multilayered ceramic structure having M layers of a first conductive metallization and M+1 layers of an electrodisplacive material;(2) obtaining a composite ceramic wafer by slicing the multilayered ceramic structure in a direction normal to the layers of the first conductive metallization;(3) providing a plurality of regularly spaced horizontally directional trenches running parallel to each other wherein each of the trenches is located at an equidistance from two adjacent layers of the first conductive metallization;(4) depositing a second conductive metallization;(5) preparing N-1 regularly spaced vertically directional cuts on the composite ceramic wafer prepared using steps (3) and (4) to thereby obtain the array of M.times.N electrodisplacive actuators.