Abstract: Disclosed are an intelligent power module and a manufacturing method thereof, which relate to the technical field of electronic devices. The intelligent power module includes a substrate, wherein a chip and a plurality of conductive pins are arranged on the substrate, one end of each of the conductive pins is connected to the chip, and a solder pin is formed at an end portion of the other end of the conductive pin; and an external pin frame, including a plurality of leads, and a connection structure is formed at an end portion of one end of each of the lead; and the connection structure includes a connection portion, and support portions, wherein an arrangement direction of the support portions is the same as that of the solder pins, an accommodation space is formed between the two support portions, and the solder pin is located between the two support portions.

Abstract: A nano-wall integrated circuit structure with high integration density is disclosed, which relates to the fields of microelectronic technology and integrated circuits (IC). Based on the different device physical principles with MOSFETs in traditional ICs, the nano-wall integrated circuit unit structure (Nano-Wall FET, referred to as NWaFET) with high integration density can improve the integration of the IC, significantly shorten the channel length, improve the flexibility of the device channel width-to-length ratio adjustment, and save chip area.

Abstract: A MOS integrated circuit basic unit includes: a drain semiconductor region; a lightly doped drain region; a channel semiconductor region; a source semiconductor region; a source electrode; a gate electrode; a gate dielectric layer; and a drain electrode. The drain semiconductor region is the bottom of the basic unit. The gate electrode has a ring structure, which surrounds the channel semiconductor region, the source semiconductor region and the lightly doped drain region. The upper surface of the gate electrode is aligned to the upper surface of the source semiconductor region; and a bottom surface of the gate electrode is lower than an interface of the lightly doped drain region and the drain semiconductor region. The gate dielectric layer is disposed between the gate electrode and the adjacent functional layer. The drain semiconductor region is connected to the drain electrode of the basic unit.

Abstract: A nano-wall integrated circuit structure with high integration density is disclosed, which relates to the fields of microelectronic technology and integrated circuits (IC). Based on the different device physical principles with MOSFETs in traditional ICs, the nano-wall integrated circuit unit structure (Nano-Wall FET, referred to as NWaFET) with high integration density can improve the integration of the IC, significantly shorten the channel length, improve the flexibility of the device channel width-to-length ratio adjustment, and save chip area.

Abstract: The methods of gate extraction and injection FET and channel carrier quantity control related to microelectronics technology and semiconductor technology. The gate extraction and injection FET of the invention is provided with a source, a drain, a gate and a channel semiconductor area on the insulating layer. A gate dielectric layer is arranged between the gate and the channel semiconductor region, wherein, the gate dielectric layer is a thin film material with resistance values of 103-1016? and the channel semiconductor region is a two-dimensional semiconductor or a three-dimensional semiconductor with two-dimensional semiconductor material characteristics (1-10 cellular crystal layers). The advantages of the invention are that the power consumptions of the devices and the integrated circuits can be greatly reduced by a few orders of magnitude.

Abstract: A MOS integrated circuit basic unit includes: a drain semiconductor region; a lightly doped drain region; a channel semiconductor region; a source semiconductor region; a source electrode; a gate electrode; a gate dielectric layer; and a drain electrode. The drain semiconductor region is the bottom of the basic unit. The gate electrode has a ring structure, which surrounds the channel semiconductor region, the source semiconductor region and the lightly doped drain region. The upper surface of the gate electrode is aligned to the upper surface of the source semiconductor region; and a bottom surface of the gate electrode is lower than an interface of the lightly doped drain region and the drain semiconductor region. The gate dielectric layer is disposed between the gate electrode and the adjacent functional layer. The drain semiconductor region is connected to the drain electrode of the basic unit.

Abstract: The methods of gate extraction and injection FET and channel carrier quantity control related to microelectronics technology and semiconductor technology. The gate extraction and injection FET of the invention is provided with a source, a drain, a gate and a channel semiconductor area on the insulating layer. A gate dielectric layer is arranged between the gate and the channel semiconductor region, wherein, the gate dielectric layer is a thin film material with resistance values of 103-1016? and the channel semiconductor region is a two-dimensional semiconductor or a three-dimensional semiconductor with two-dimensional semiconductor material characteristics (1-10 cellular crystal layers). The advantages of the invention are that the power consumptions of the devices and the integrated circuits can be greatly reduced by a few orders of magnitude.

Abstract: A hardware and software co-test method for FPGA comprises the following steps of: setting up a HW/SW co-test system comprising a PC, a software part, HW/SW communication modules, a hardware accelerator for testing a DUT FPGA which is mapped with a configuration file of DUT; predefining a table of test vectors for FPGA by software part in PC; generating configuration files based on the tables of test vector for I/O module, CLB and routing matrix, and then sending the configuration file into DUT FPGA to configure the FPGA; testing DUT FPGA in terms of the tables of test vector for lo I/O module, CLB and routing matrix, and returning results to the software part; and comparing the test results with expected data in the software part, generating a test report, and during the above steps, the error cells in the FPGA are capable of being automatically positioned.