Patents by Inventor Yonggoog KIM

Yonggoog KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for forming silica layer, manufacturing method for silica layer, and silica layer
    Patent number: 11518909
    Abstract: Provided is a composition for forming a silica layer, the composition containing a silicon-containing polymer and a solvent, wherein a silica layer formed of the composition for forming the silica layer satisfies Relation 1. The definition of Relation 1 is as described in the specification. The definition of Relation 1 is the same as described in the specification.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: December 6, 2022
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Kunbae Noh, Taeksoo Kwak, Junyoung Jang, Yoonyoung Koo, Yonggoog Kim, Jingyo Kim, Jin-Hee Bae, Jun Sakong, Jinwoo Seo, Sooyeon Sim, Huichan Yun, Jiho Lee, Kwen-Woo Han, Byeong Gyu Hwang
  • COMPOSITION FOR FORMING SILICA LAYER, MANUFACTURING METHOD FOR SILICA LAYER, AND SILICA LAYER
    Publication number: 20200369915
    Abstract: Provided is a composition for forming a silica layer, the composition containing a silicon-containing polymer and a solvent, wherein a silica layer formed of the composition for forming the silica layer satisfies Relation 1. The definition of Relation 1 is as described in the specification. The definition of Relation 1 is the same as described in the specification.
    Type: Application
    Filed: February 13, 2018
    Publication date: November 26, 2020
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Kunbae NOH, Taeksoo KWAK, Junyoung JANG, Yoonyoung KOO, Yonggoog KIM, Jingyo KIM, Jin-Hee BAE, Jun SAKONG, Jinwoo SEO, Sooyeon SIM, Huichan YUN, Jiho LEE, Kwen-Woo HAN, Byeong Gyu HWANG
  • Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer
    Patent number: 10017646
    Abstract: A composition for forming silica layer includes a silicon-containing polymer and a solvent, wherein a weight average molecular weight of the silicon-containing polymer ranges from about 2,000 to about 100,000 and a branching ratio (a) of the silicon-containing polymer calculated by Equation 1 ranges from about 0.25 to about 0.50. ?=k·Ma??[Equation 1] In Equation 1, ? is an intrinsic viscosity of a silicon-containing polymer, M is an absolute molecular weight of a silicon-containing polymer, a is a branching ratio, and k is an intrinsic constant.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: July 10, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sooyeon Sim, Jin-Hee Bae, TaekSoo Kwak, Yonggoog Kim, Jingyo Kim, Kunbae Noh, Huichan Yun, Jiho Lee, Byeong Gyu Hwang
  • COMPOSITION FOR FORMING SILICA LAYER, METHOD FOR MANUFACTURING SILICA LAYER, AND ELECTRIC DEVICE INCLUDING SILICA LAYER
    Publication number: 20180163055
    Abstract: A composition for forming silica layer includes a silicon-containing polymer and a solvent, wherein a weight average molecular weight of the silicon-containing polymer ranges from about 2,000 to about 100,000 and a branching ratio (a) of the silicon-containing polymer calculated by Equation 1 ranges from about 0.25 to about 0.50. ?=k·Ma??[Equation 1] In Equation 1, ? is an intrinsic viscosity of a silicon-containing polymer, M is an absolute molecular weight of a silicon-containing polymer, a is a branching ratio, and k is an intrinsic constant.
    Type: Application
    Filed: July 21, 2017
    Publication date: June 14, 2018
    Inventors: Sooyeon SIM, Jin-Hee BAE, TaekSoo KWAK, Yonggoog KIM, Jingyo KIM, Kunbae NOH, Huichan YUN, Jiho LEE, Byeong Gyu HWANG