Abstract: The present disclosure relates to a deposition prevention plate and a method for manufacturing the same, a method for recycling materials, and a thin film deposition apparatus. The deposition prevention plate includes a substrate, and a carrier layer on the substrate for carrying a plating material, wherein the carrier layer can be peeled off from the substrate. By forming a peelable carrier layer on the substrate, the cleaning process of the deposition prevention plate can be simplified, thereby saving the cleaning cost of the deposition prevention plate. In addition, by recycling and reusing the plating material in a method such as distillation, filtration or physical separation, the utilization of the plating material can be further improved.

Abstract: The present disclosure relates to a deposition prevention plate and a method for manufacturing the same, a method for recycling materials, and a thin film deposition apparatus. The deposition prevention plate includes a substrate, and a carrier layer on the substrate for carrying a plating material, wherein the carrier layer can be peeled off from the substrate. By forming a peelable carrier layer on the substrate, the cleaning process of the deposition prevention plate can be simplified, thereby saving the cleaning cost of the deposition prevention plate. In addition, by recycling and reusing the plating material in a method such as distillation, filtration or physical separation, the utilization of the plating material can be further improved.

Abstract: The mask includes a frame and a first mask strip disposed inside the frame; the frame includes an outer frame and an inner frame; the outer frame is disposed on the outer side and includes a first plane; the inner frame is disposed on the inner side and includes a second plane; the first plane is higher than the second plane, so as to form a step; the first mask strip is fixed on the outer frame through two ends and extended in the outer frame along one side of the frame; and an orthographic projection of the first mask strip on the second plane is at least partially overlapped with the inner frame on the one side.

Abstract: A mask and an evaporation device. The mask includes a frame and a first mask strip disposed inside the frame; the frame includes an outer frame and an inner frame; the outer frame is disposed on the outer side and includes a first plane the inner frame is disposed on the inner side and includes a second plane; the first plane is higher than the second plane, so as to form a step; the first mask strip is fixed on the outer frame through two ends and extended in the outer frame along one side of the frame; and an orthographic projection of the first mask strip on the second plane is at least partially overlapped with the inner frame on the one side.

Abstract: The present invention discloses an airflow control device and a method of adjusting the same, a substrate cleaning device. The airflow control device is provided in a cleaning chamber for cleaning a substrate, and includes a first cover, a second cover, a third cover and a fourth cover. The first cover and the third cover are provided face to face in the upper portion of the cleaning chamber, the second cover and the fourth cover are provided face to face in the lower portion of the cleaning chamber. The four covers form an airflow control space which accommodates a cleaning solution outlet. The space is used for keeping the strong airflow within the area under the outlet, such that shaking and deformation of the substrate due to the strong airflow are reduced to improve the efficiency of cleaning, and reduce the risk of fragmentation, and further lower the production cost.