Patents by Inventor Yongmi An

Yongmi An has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220348716
    Abstract: The present application relates to a compound of Formula 1, a binder resin, a negative-type photosensitive resin composition, and a display device comprising a black bank formed using same.
    Type: Application
    Filed: November 4, 2020
    Publication date: November 3, 2022
    Applicant: LG CHEM, LTD.
    Inventors: Junhyun AN, Eun Seok PARK, Yongmi KIM, Minyoung LIM, Sumin PARK
  • Patent number: 11467493
    Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.
    Type: Grant
    Filed: October 25, 2018
    Date of Patent: October 11, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Yongmi Kim, Ji Hye Kim
  • Publication number: 20220220220
    Abstract: The present invention provides novel antigen binding peptides, such as an antibody or antibody fragment, that specifically bind to selective FXIa inhibitors and/or dual inhibitors of FXIa, and plasma kallikrein. The present invention further relates to methods of reducing the antithrombotic effect of FXIa inhibitors by administering to a subject a pharmaceutically effective dose of the antigen binding peptides provided herein. In addition, the present invention provides detection reagents and methods for detecting the level of the inhibitors of FXIa in a biological sample.
    Type: Application
    Filed: January 7, 2022
    Publication date: July 14, 2022
    Inventors: Joseph M. Luettgen, Lumelle Schneeweis, Ginger Chao Rakestraw, Christina Terragni, Andrew Karl Dilger, Jason Robert Pinckney, Steven Sheriff, Kevin Kish, Yongmi An, William R. Ewing, Stanley Richard Krystek, JR., Aaron Paul Yamniuk
  • Patent number: 11042089
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: June 22, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Ji Hye Kim, Yongmi Kim
  • Patent number: 10990009
    Abstract: A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: April 27, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Yongsik Ahn, Yongmi Kim, Minyoung Lim
  • Publication number: 20200233302
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
    Type: Application
    Filed: September 14, 2018
    Publication date: July 23, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Ji Hye KIM, Yongmi KIM
  • Publication number: 20200033727
    Abstract: A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.
    Type: Application
    Filed: November 22, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Yongsik AHN, Yongmi KIM, Min Young LIM
  • Publication number: 20190384176
    Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.
    Type: Application
    Filed: October 25, 2018
    Publication date: December 19, 2019
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Yongmi KIM, Ji Hye KIM
  • Publication number: 20180296615
    Abstract: The present invention relates to a composition for preventing and treating metabolic disorders, containing a water extract of Pleurotus eryngii var. ferulea (Pf) as an active ingredient, wherein the water extract of Pleurotus eryngii var. ferulea (Pf) has a remarkable effect of being able to be used as a pharmaceutical composition or functional health food for preventing or treating obesity or diabetes by confirming the functionality whereby fat accumulation and blood glucose increase generated when taking a high fat diet can be inhibited.
    Type: Application
    Filed: May 9, 2016
    Publication date: October 18, 2018
    Applicants: KYONGSANGBUK-DO, POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Sung Ho RYU, Jaewang GHIM, Jong In KIM, Jaeyoon KIM, Yongmi KIM, Youngwoo CHOI, Kyung-Jin JO, Wook Dong KIM, Sang Kap SHIM, Woo Jae CHEON, Jong Hyeok NAM