Patents by Inventor Yongping Bao

Yongping Bao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12266513
    Abstract: A device and method for sputtering and depositing metal on the surface of magnetic powder materials utilizes a vacuum chamber, a vacuum pump set, a magnetron sputtering target, a cathode ion source, a water-cooled anode, and a sample holding component arranged in the vacuum chamber. The sample holding component is a sample roller, an axis of the sample roller is arranged in a horizontal direction, the sample roller can rotate around the axis thereof. Two ends of the sample roller are open, and the sample roller further comprises a power device capable of driving the sample roller to rotate. The cathode ion source and the magnetron sputtering target extend inwards into the sample roller from the opening in the same end of the sample roller. The water-cooled anode extends inwards into the sample roller from the opening in the other end of the sample roller.
    Type: Grant
    Filed: November 25, 2022
    Date of Patent: April 1, 2025
    Assignee: Lanzhou Institute of Chemical Physics, CAS
    Inventors: Bin Zhang, Ning Xia, Kaixiong Gao, Junyan Zhang, Zhongliang Chang, Yongping Bao, Haijun Jia
  • Publication number: 20230317429
    Abstract: A device and method for sputtering and depositing metal on the surface of magnetic powder materials utilizes a vacuum chamber, a vacuum pump set, a magnetron sputtering target, a cathode ion source, a water-cooled anode, and a sample holding component arranged in the vacuum chamber. The sample holding component is a sample roller, an axis of the sample roller is arranged in a horizontal direction, the sample roller can rotate around the axis thereof. Two ends of the sample roller are open, and the sample roller further comprises a power device capable of driving the sample roller to rotate. The cathode ion source and the magnetron sputtering target extend inwards into the sample roller from the opening in the same end of the sample roller. The water-cooled anode extends inwards into the sample roller from the opening in the other end of the sample roller.
    Type: Application
    Filed: November 25, 2022
    Publication date: October 5, 2023
    Inventors: Bin ZHANG, Ning XIA, Kaixiong GAO, Junyan ZHANG, Zhongliang CHANG, Yongping BAO, Haijun JIA
  • Patent number: D537369
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: February 27, 2007
    Inventor: Yongping Bao
  • Patent number: D551788
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: September 25, 2007
    Inventor: Yongping Bao
  • Patent number: D731875
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: June 16, 2015
    Inventor: Yongping Bao