Abstract: Involved is an isolated antigen binding protein, being capable of binding CCR8 derived from a primate animal. Further involved are a pharmaceutical composition comprising the antigen binding protein, and an application of the antigen binding protein and/or the pharmaceutical composition in the prevention and/or treatment of a tumor or a cancer.

Abstract: In accordance with implementations of the subject matter described herein, there provides a solution for multi-path RDMA transmission. In the solution, at least one packet is generated based on an RDMA message to be transmitted from a first device to a second device. The first device has an RDMA connection with the second device via a plurality of paths. A first packet in the at least one packet includes a plurality of fields, which include information for transmitting the first packet over a first path of the plurality of paths. The at least one packet is transmitted to the second device over the plurality of paths via an RDMA protocol. The first packet is transmitted over the first path. The multi-path RDMA transmission solution according to the subject matter described herein can efficiently utilize rich network paths while maintaining a low memory footprint in a network interface card.

Abstract: The disclosure discloses a composition containing melatonin as an effective ingredient, and its application in improving DHI production performance and improving milk quality. The composition containing melatonin as an effective ingredient according to the present disclosure can significantly reduce the somatic cell count in milk and improve milk quality. Under the conditions of different seasons, ages, and lactation periods, the administration of the composition containing melatonin as an active ingredient according to the present disclosure can significantly reduce the somatic cell score of cow milk (p<0.01), increase the protein content and lactose content in milk, and meanwhile reduce the fat content and urea nitrogen content in milk. In summary, the composition containing melatonin as an effective ingredient according to the present disclosure can improve the quality of milk and increase the efficiency of dairy cow breeding.

Abstract: The disclosure discloses a composition containing melatonin as an effective ingredient, and its application in improving DHI production performance and improving milk quality. The composition containing melatonin as an effective ingredient according to the present disclosure can significantly reduce the somatic cell count in milk and improve milk quality. Under the conditions of different seasons, ages, and lactation periods, the administration of the composition containing melatonin as an active ingredient according to the present disclosure can significantly reduce the somatic cell score of cow milk (p<0.01), increase the protein content and lactose content in milk, and meanwhile reduce the fat content and urea nitrogen content in milk. In summary, the composition containing melatonin as an effective ingredient according to the present disclosure can improve the quality of milk and increase the efficiency of dairy cow breeding.

Abstract: Disclosed is a composition for increasing pregnancy rate in ruminants exposed to ovsynch and timed artificial insemination, and a preparation method and application thereof. The effective component of the composition is melatonin with a concentration of 10-20 mg/mL. The present disclosure proves through animal experiments that the use of the composition of the present disclosure in combination with the last injection of GnRH in an ovsynch and timed artificial insemination protocol for a ruminant can regulate the secretion of reproductive hormones in an animal body, increase the levels of luteinizing hormone (LH) and progesterone in pregnant females, and improve ovum quality and facilitate ovulation, thus increasing the pregnancy rate in ruminants exposed to ovsynch and timed artificial insemination.

Abstract: The present disclosure discloses a method and an apparatus for repairing a kernel vulnerability.

Abstract: The present disclosure discloses a method and an apparatus for repairing a kernel vulnerability.

Abstract: A method of producing an extremely thick insulation coating on a surface of an electrical steel, comprises the following steps: 1) preparing a coating liquid—stirring sufficiently the coating liquid for 0.1˜4 hours, with the viscosity of the coating liquid being within 10˜80 S; 2) coating a strip steel—using a double-roller or a tri-roller coating machine, wherein the film thickness and evenness can be controlled by adjusting different parameters; 3) baking the coating—using three sections, that is, a drying section, a baking section and a cooling section, to bake the coating, wherein the temperature in the drying section is 100˜400° C., the temperature in the baking section is 200˜370° C.

Abstract: A method of producing an extremely thick insulation coating on a surface of an electrical steel, comprises the following steps: 1) preparing a coating liquid—stirring sufficiently the coating liquid for 0.1˜4 hours, with the viscosity of the coating liquid being within 10˜80 S; 2) coating a strip steel—using a double-roller or a tri-roller coating machine, wherein the film thickness and evenness can be controlled by adjusting different parameters; 3) baking the coating—using three sections, that is, a drying section, a baking section and a cooling section, to bake the coating, wherein the temperature in the drying section is 100˜400° C., the temperature in the baking section is 200˜370° C.

Abstract: A measuring method of chromium-free coating film thickness on surface of strip steel comprising selecting two water-soluble chemical substances containing elements P, Ca, Ti, Ba or Sr and not reacting with a chromium-free coating liquid; adding the chemical substances into the chromium-free coating liquid and agitating them to be homogeneous, thereafter, fabricating a reference sample of coating film; using a ray emitted by an off-line film thickness instrument to excite the two water-soluble chemical substances so as to obtain characteristic spectrums to obtain a correction function expression between the measured film thickness and the thickness correction value by fitting; adding the water-soluble chemical substance which has a weak characteristic spectrum into a chromium-free coating liquid, and using the expression to obtain the actual coating film thickness. The method is capable to monitor film thickness with no adverse effect on adhesiveness and corrosion-proof of the coating film.

Abstract: A measuring method of chromium-free coating film thickness on surface of strip steel comprising selecting two water-soluble chemical substances containing elements P, Ca, Ti, Ba or Sr and not reacting with a chromium-free coating liquid; adding the chemical substances into the chromium-free coating liquid and agitating them to be homogeneous, thereafter, fabricating a reference sample of coating film; using a ray emitted by an off-line film thickness instrument to excite the two water-soluble chemical substances so as to obtain characteristic spectrums to obtain a correction function expression between the measured film thickness and the thickness correction value by fitting; adding the water-soluble chemical substance which has a weak characteristic spectrum into a chromium-free coating liquid, and using the expression to obtain the actual coating film thickness. The method is capable to monitor film thickness with no adverse effect on adhesiveness and corrosion-proof of the coating film.

Abstract: Roughly described, a method for mask data preparation is described, for use with a preliminary mask layout that includes a starting polygon, the vertices of the starting polygon including I-points (vertices of the starting polygon having an interior angle greater than 90 degrees), including steps of developing a rectilinear partition tree on at least the I-points of the starting polygon, and using the edges of the partition tree to define the partition of the starting polygon into sub-polygons for mask writing.

Abstract: Roughly described, a method for mask data preparation is described, for use with a preliminary mask layout that includes a starting polygon, the vertices of the starting polygon including I-points (vertices of the starting polygon having an interior angle greater than 90 degrees), including steps of developing a rectilinear partition tree on at least the I-points of the starting polygon, and using the edges of the partition tree to define the partition of the starting polygon into sub-polygons for mask writing.

Abstract: In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.

Abstract: In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.

Abstract: The present invention generally provides a method and apparatus for processing a substrate in a wet processing chamber. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus comprises a gas delivery assembly disposed outside the chamber. The gas delivery assembly directs a gas flow towards areas where a substrate support contacts the substrate.

Abstract: A modified process for chemical/mechanical polishing semiconductor wafers is provided. The process includes polishing a surface of the wafer, contacting the polished surface of the wafer with a surfactant, and drying the surface of the disengaged wafer for a sufficient period of time before contacting the surface of the wafer with a rinse media or subsequent process liquid. The process reduces defects, including etching stains, on the polished surface of the wafer.