Abstract: Provided is a polymer composition applicable as a latex stabilizer of a latex composition for dip molding, a method for preparing the same, a latex composition for dip molding, including the same to have improved latex stability, and a molded article molded therefrom to have improved wearability and tensile properties.

Abstract: An acryl-based copolymer composition is provided. The acryl-based copolymer composition includes an acryl-based copolymer, an aggregation inducing agent, and an aggregating agent, wherein the acryl-based copolymer includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit. The aggregation inducing agent includes a siloxane-based monomer-derived repeating unit and an ether-based monomer-derived repeating unit, and the aggregating agent includes a monovalent ionic metal salt.

Abstract: A latex composition for dip forming, and more particularly, to a latex composition for dip forming includes carboxylic acid-modified nitrile-based copolymer latex; and a phenolic emulsifier, wherein the phenolic emulsifier is included in an amount of 0.08 parts by weight to 6 parts by weight (based on a solid content) based on 100 parts by weight of the carboxylic acid-modified nitrile-based copolymer latex. A method for preparing the latex composition and a formed article produced using the latex composition are also provided.

Abstract: Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Abstract: Provided is a latex composition for dip molding. The latex composition for dip molding includes a carboxylic acid-modified nitrile-based copolymer latex and a hydrophobically modified alkali-soluble emulsion thickener, wherein the hydrophobically modified alkali-soluble emulsion thickener includes a copolymer including an associative portion and a non-associative portion, and the associative portion includes a monomer-derived repeating unit substituted by one or more first hydrophobic groups selected from the group consisting of alkyl, alkenyl, perfluoroalkyl, and carbosilyl having 8 to 15 carbon atoms, and aryl, arylalkyl, arylalkenyl, alicyclic alkyl, and polycyclic alkyl having 6 to 15 carbon atoms. A method of preparing the latex composition for dip molding, and a molded article manufactured therefrom are also provided.

Abstract: Provided is a carboxylic acid-modified nitrile-based copolymer latex, and more particularly, provided are a carboxylic acid-modified nitrile-based copolymer latex which includes a carboxylic acid-modified nitrile-based copolymer including a monomer-derived repeating unit; and a repeating unit derived from a monomer represented by Chemical Formula 1 below, the monomer-derived repeating unit including a conjugated diene-based monomer-derived repeating unit, an ethylenically unsaturated nitrile-based monomer-derived repeating unit, and an ethylenically unsaturated acid monomer-derived repeating unit (see description of the present invention), a method for preparing a carboxylic acid-modified nitrile-based copolymer latex, a latex composition for dip-forming including the copolymer latex, and an article formed by the composition.

Abstract: An acrylic copolymer is provided. The acrylic copolymer includes: a main monomer-derived repeating unit; and a chain transfer agent-derived part, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinking monomer-derived repeating unit, the chain transfer agent-derived part is derived from a chain transfer agent having a carbonothioylthio group, and the chain transfer agent-derived part is included in an amount of 0.03 parts by weight to 0.08 parts by weight with respect to 100 parts by weight of the main monomer-derived repeating unit. A method of preparing the same, and an acrylic copolymer composition including the same is also provided.

Abstract: Provided is an acryl-based copolymer, and more particularly, an acryl-based copolymer including a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit, the polyfunctional monomer includes a vinyl group or an allyl group, and the polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit.

Abstract: An acryl-based copolymer composition is provided. The acryl-based copolymer composition includes an acryl-based copolymer, an aggregation inducing agent, and an aggregating agent, wherein the acryl-based copolymer includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit. The aggregation inducing agent includes a siloxane-based monomer-derived repeating unit and an ether-based monomer-derived repeating unit, and the aggregating agent includes a monovalent ionic metal salt.

Abstract: Provided is a latex composition for dip molding. The latex composition for dip molding includes a carboxylic acid-modified nitrile-based copolymer latex and a hydrophobically modified alkali-soluble emulsion thickener, wherein the hydrophobically modified alkali-soluble emulsion thickener includes a copolymer including an associative portion and a non-associative portion, and the associative portion includes a monomer-derived repeating unit substituted by one or more first hydrophobic groups selected from the group consisting of alkyl, alkenyl, perfluoroalkyl, and carbosilyl having 8 to 15 carbon atoms, and aryl, arylalkyl, arylalkenyl, alicyclic alkyl, and polycyclic alkyl having 6 to 15 carbon atoms. A method of preparing the latex composition for dip molding, and a molded article manufactured therefrom are also provided.

Abstract: Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Abstract: A latex composition for dip forming, and more particularly, to a latex composition for dip forming includes carboxylic acid-modified nitrile-based copolymer latex; and a phenolic emulsifier, wherein the phenolic emulsifier is included in an amount of 0.08 parts by weight to 6 parts by weight (based on a solid content) based on 100 parts by weight of the carboxylic acid-modified nitrile-based copolymer latex. A method for preparing the latex composition and a formed article produced using the latex composition are also provided.

Abstract: An acrylic copolymer is provided. The acrylic copolymer includes: a main monomer-derived repeating unit; and a chain transfer agent-derived part, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinking monomer-derived repeating unit, the chain transfer agent-derived part is derived from a chain transfer agent having a carbonothioylthio group, and the chain transfer agent-derived part is included in an amount of 0.03 parts by weight to 0.08 parts by weight with respect to 100 parts by weight of the main monomer-derived repeating unit. A method of preparing the same, and an acrylic copolymer composition including the same is also provided.

Abstract: A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.

Abstract: Provided is a carboxylic acid-modified nitrile-based copolymer latex, and more particularly, provided are a carboxylic acid-modified nitrile-based copolymer latex which includes a carboxylic acid-modified nitrile-based copolymer including a main monomer-derived repeating unit; and a repeating unit derived from a monomer represented by Chemical Formula 1 below, the main monomer-derived repeating unit including a conjugated diene-based monomer-derived repeating unit, an ethylenically unsaturated nitrile-based monomer-derived repeating unit, and an ethylenically unsaturated acid monomer-derived repeating unit (see description of the present invention), a method for preparing a carboxylic acid-modified nitrile-based copolymer latex, a latex composition for dip-forming including the copolymer latex, and an article formed by the composition.

Abstract: A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Abstract: An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Abstract: An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.