Patents by Inventor Yongshun LI

Yongshun LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250143272
    Abstract: Genetically modified non-human animals that express a human or chimeric (e.g., humanized) NKP46, and methods of use thereof.
    Type: Application
    Filed: January 19, 2023
    Publication date: May 8, 2025
    Inventors: Yongshun Li, Xiaofei Zhou, Jiawei Yao
  • Publication number: 20240304720
    Abstract: The present disclosure involves a semiconductor device and a manufacturing method thereof. A second well region is inserted between first well regions of a semiconductor device to improve the breakdown voltage of the device, and at the same time, the dimension of the upper surface of the second well region in the width direction of the device's conductive channel is set to be smaller than the dimension of the lower surface of the second well region in the width direction of the device's conductive channel to increase the dimension of the upper surface of the adjacent first well region in the width direction of the device's conductive channel. That is, the path width of the current flowing through the upper surface of the drift region is increased when the device is on, and thus the device's on-resistance is reduced.
    Type: Application
    Filed: December 14, 2022
    Publication date: September 12, 2024
    Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
    Inventors: Huajun JIN, Liang SONG, Yongshun LI, Mei YUAN, Yanan WANG, Lin LUO, Qiang ZHANG
  • Publication number: 20240006477
    Abstract: A manufacturing method for a super-? bipolar junction transistor includes providing a substrate, and forming a first conductive type isolation buried layer and a first conductive type doped layer based on the substrate. The isolation buried layer is located at a bottom of the doped layer. The method also includes forming a second conductive type base region in the doped layer and forming a second conductive type doped island on a peripheral side of the base region. A doping concentration of the doped island is greater than that of the base region. Additionally, the method includes forming a first conductive type collector region in the doped layer, and the collector region is spaced from the base region. Further, the method includes forming a first conductive type emitter region in the base region.
    Type: Application
    Filed: July 22, 2022
    Publication date: January 4, 2024
    Inventors: Yongshun LI, Huajun JIN, Liang SONG