Patents by Inventor Yongsoon Shin

Yongsoon Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060204662
    Abstract: The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
    Type: Application
    Filed: May 11, 2006
    Publication date: September 14, 2006
    Inventors: Kentin Alford, Kevin Simmons, William Samuels, Thomas Zemanian, Jun Liu, Yongsoon Shin, Glen Fryxell
  • Publication number: 20060177686
    Abstract: Disclosed herein are aluminide coatings. In one embodiment coatings are used as a barrier coating to protect a metal substrate, such as a steel or a superalloy, from various chemical environments, including oxidizing, reducing and/or sulfidizing conditions. In addition, the disclosed coatings can be used, for example, to prevent the substantial diffusion of various elements, such as chromium, at elevated service temperatures. Related methods for preparing protective coatings on metal substrates are also described.
    Type: Application
    Filed: January 24, 2006
    Publication date: August 10, 2006
    Inventors: Charles Henager, Yongsoon Shin, William Samuels
  • Publication number: 20050180916
    Abstract: The invention relates to materials for storing and releasing hydrogen and methods for preparing and using same. The materials exhibit fast release rates at low release temperatures and are suitable as fuel and/or hydrogen sources for a variety of applications such as automobile engines.
    Type: Application
    Filed: February 12, 2004
    Publication date: August 18, 2005
    Inventors: Thomas Autrey, Anna Gutowska, Yongsoon Shin, Liyu Li
  • Patent number: 6846554
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: January 25, 2005
    Assignee: Battelle Memorial Institute
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Patent number: 6753038
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: June 22, 2004
    Assignee: Battelle Memorial Institute
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Patent number: 6733835
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: May 11, 2004
    Assignee: Battelle Memorial Institute
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Publication number: 20040001943
    Abstract: The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
    Type: Application
    Filed: June 27, 2003
    Publication date: January 1, 2004
    Inventors: Kentin L. Alford, Kevin L. Simmons, William D. Samuels, Thomas S. Zemanian, Jun Liu, Yongsoon Shin, Glen E. Fryxell
  • Publication number: 20030148032
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Application
    Filed: January 17, 2003
    Publication date: August 7, 2003
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Publication number: 20030129406
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Application
    Filed: January 17, 2003
    Publication date: July 10, 2003
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Publication number: 20030129312
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Application
    Filed: January 17, 2003
    Publication date: July 10, 2003
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Patent number: 6531224
    Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: March 11, 2003
    Assignee: Battelle Memorial Institute
    Inventors: Glen E. Fryxell, Thomas S. Zemanian, Jun Liu, Yongsoon Shin
  • Patent number: 6251280
    Abstract: The present invention relates generally to mesoporous sorbent materials having high capacity, high selectivity, fast kinetics, and molecular recognition capability. The invention also relates to a process for preparing these mesoporous substrates through molecular imprinting techniques which differ from convention techniques in that a template molecule is bound to one end of bifunctional ligands to form a complex prior to binding of the bifunctional ligands to the substrate. The present invention also relates to methods of using the mesoporous sorbent materials, for example, in the separation of toxic metals from process effluents, paints, and other samples; detection of target molecules, such as amino acids, drugs, herbicides, fertilizers, and TNT, in samples; separation and/or detection of substances using chromatography; imaging agents; sensors; coatings; and composites.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: June 26, 2001
    Assignees: University of Tennessee Research Corporation, U. T. Battelle, LLC
    Inventors: Sheng Dai, Mark C. Burleigh, Yongsoon Shin