Patents by Inventor YonJong Jeon

YonJong Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20240153746
    Abstract: A substrate processing apparatus having a simplified exhaust structure includes: a substrate supporting unit configured to support a substrate; a first lid on the substrate supporting unit, the first lid including at least one processing unit; a second lid under the first lid, the second lid including a partition wall; and a support arranged under the first lid and the second lid and including an opening and a seating portion on the opening, wherein the second lid is on the seating portion of the support.
    Type: Application
    Filed: January 16, 2024
    Publication date: May 9, 2024
    Inventors: WonKi Jeong, Yonjong Jeon, DongJun Park
  • TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME
    Publication number: 20230357925
    Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.
    Type: Application
    Filed: July 14, 2023
    Publication date: November 9, 2023
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon
  • Temperature control assembly for substrate processing apparatus and method of using same
    Patent number: 11746414
    Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.
    Type: Grant
    Filed: June 8, 2022
    Date of Patent: September 5, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon
  • TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME
    Publication number: 20220298630
    Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.
    Type: Application
    Filed: June 8, 2022
    Publication date: September 22, 2022
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon
  • Temperature control assembly for substrate processing apparatus and method of using same
    Patent number: 11390945
    Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: July 19, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon
  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20220044913
    Abstract: A substrate processing apparatus having a simplified exhaust structure includes: a substrate supporting unit configured to support a substrate; a first lid on the substrate supporting unit, the first lid including at least one processing unit; a second lid under the first lid, the second lid including a partition wall; and a support arranged under the first lid and the second lid and including an opening and a seating portion on the opening, wherein the second lid is on the seating portion of the support.
    Type: Application
    Filed: August 3, 2021
    Publication date: February 10, 2022
    Inventors: WonKi Jeong, Yonjong Jeon, DongJun Park
  • GAS SUPPLY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
    Publication number: 20210319982
    Abstract: A substrate processing apparatus capable of preventing power dissipation and achieving high process reproducibility includes a partition and a processing unit below the partition, wherein the processing unit includes a conductive body and at least one conductive protrusion integrally formed with the conductive body.
    Type: Application
    Filed: April 7, 2021
    Publication date: October 14, 2021
    Inventors: JaeHyun Kim, DaeYoun Kim, JeongHo Lee, HyunSoo Jang, YonJong Jeon
  • TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME
    Publication number: 20210002762
    Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.
    Type: Application
    Filed: June 30, 2020
    Publication date: January 7, 2021
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon
  • Device for controlling a temperature of a gas supply unit
    Patent number: D922229
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: June 15, 2021
    Assignee: ASM IP Holding B.V.
    Inventors: SungHoon Jun, HeeChul Jung, YonJong Jeon