Abstract: A system of controlling a wavelength of a laser beam is provided. The system comprises a stage for supporting a wafer, an optical convergence unit for emitting the laser beam moving in an optical path toward the stage, and a specific wavelength detecting sensor. The specific wavelength detecting sensor is disposed between the optical convergence unit and the stage. It includes a laser beam absorbing structural body for absorbing a specific wavelength of the laser beam emitting toward the stage. A wavelength controlling unit for selectively controlling the wavelength of the laser beam is also provided.

Abstract: A lithography device including a first revolver, a second revolver and a driving device. The first revolver includes a transmittance control filter. The second revolver includes transmittance profile filter. The driving device is capable of rotating the second revolver. The first revolver is for positioning the at least one transmittance control filter in the light path. The second revolver is for positioning the at least one transmittance profile filters in the light path.

Abstract: Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a reticle stage on which an exposing process is carried. A method for exposing a substrate may include transferring a first reticle to a reticle container having a plurality of slots and transferring the first reticle from one of the plurality of slots to a reticle stage, and controlling temperature of one of the plurality of slots to be set to the saturation temperature of the first reticle.

Abstract: An apparatus and method to load a reticle, to check whether the reticle is loaded in a flat manner and to flatten the reticle when the reticle is not loaded in a flat manner. In one embodiment, the apparatus includes a sensor to sense the degree of flatness of the reticle, and reticle support units to support the reticle in a flat manner. The reticle support units include cylinders that are disposed under, for example, at least both sides of the reticle and may be independently moveable to vertically move the reticle according to the degree of flatness of the reticle sensed by the sensor.

Abstract: A system of controlling a wavelength of a laser beam is provided. The system comprises a stage for supporting a wafer, an optical convergence unit for emitting the laser beam moving in an optical path toward the stage, and a specific wavelength detecting sensor. The specific wavelength detecting sensor is disposed between the optical convergence unit and the stage. It includes a laser beam absorbing structural body for absorbing a specific wavelength of the laser beam emitting toward the stage. A wavelength controlling unit for selectively controlling the wavelength of the laser beam is also provided.

Abstract: There is provided a lithography device including a first revolver, a second revolver and a driving device. The first revolver includes a transmittance control filter. The second revolver includes transmittance profile filter. The driving device is capable of rotating the second revolver. According to the present invention, it is possible that a wanted transmittance and transmittance profile can be obtained by rotating a revolver, which has a plurality of transmittance control filters or transmittance profile filter. As a result, the present invention has the advantage of being able to revise variations of light intensity by changing illuminating modes and illuminating conditions.

Abstract: A facility for manufacturing semiconductor devices is provided with a diagnosis system for easily monitoring the operation states of various fabrication systems, and controlling them in case of abnormal operation states by means of a sensing signal from the fabrication systems and a control signal from a control system. The fabrication system outputs a sensing signal showing the operation states of the fabrication processes such as temperature, time, pressure, concentration, power, etc. The control system outputs a control signal to the fabrication systems for controlling their operation states via transmit lines connected thereto according to the sensing signal from the fabrication systems or an input signal from a host computer. The diagnosis system analyzes the sensing signal from the fabrication systems and the control signal from the control system so as to assess the operation states of the fabrication systems.