Abstract: According to an exemplary embodiment of the present disclosure, disclosed is an aluminum coated blank that includes a first coated steel sheet; a second coated steel sheet connected to the first coated steel sheet; and a joint portion that connects the first coated steel sheet to the second coated steel plate at a boundary between the first coated steel sheet and the second coated steel sheet.

Abstract: According to an exemplary embodiment of the present disclosure, disclosed is an aluminum coated blank that includes a first coated steel sheet; a second coated steel sheet connected to the first coated steel sheet; and a joint portion that connects the first coated steel sheet to the second coated steel plate at a boundary between the first coated steel sheet and the second coated steel sheet.

Abstract: A display device includes: active stages each include a scan output circuit outputting a scan clock signal to a first output terminal and a carry output circuit outputting a carry clock signal to a second output terminal, when a voltage of a first node is at a logic high level. The scan output circuit and carry output circuit output a scan signal of a turn-off level to the first output terminal when a voltage of a second node or a carry signal is at a logic high level. An interval between pulses of the carry clock signal generated during one frame period is the same, and at least two of intervals between pulses of the scan clock signal generated during the one frame period are different from each other.

Abstract: A display device includes: active stages each include a scan output circuit outputting a scan clock signal to a first output terminal and a carry output circuit outputting a carry clock signal to a second output terminal, when a voltage of a first node is at a logic high level. The scan output circuit and carry output circuit output a scan signal of a turn-off level to the first output terminal when a voltage of a second node or a carry signal is at a logic high level. An interval between pulses of the carry clock signal generated during one frame period is the same, and at least two of intervals between pulses of the scan clock signal generated during the one frame period are different from each other.

Abstract: A display device includes: active stages each include a scan output circuit outputting a scan clock signal to a first output terminal and a carry output circuit outputting a carry clock signal to a second output terminal, when a voltage of a first node is at a logic high level. The scan output circuit and carry output circuit output a scan signal of a turn-off level to the first output terminal when a voltage of a second node or a carry signal is at a logic high level. An interval between pulses of the carry clock signal generated during one frame period is the same, and at least two of intervals between pulses of the scan clock signal generated during the one frame period are different from each other.

Abstract: A display device is provided. A display device including a plurality of light-output areas through which incident light is emitted and a light-blocking area which blocks the incident light, the display device includes a substrate, a bank layer which is disposed in the light-blocking area on the substrate and defines a plurality of openings, each of which is disposed in one of the plurality of light-output areas, and a color control pattern disposed in the opening of the bank layer, wherein the bank layer includes a first bank area which has a first thickness and defines the plurality of openings and a second bank area which is disposed between the plurality of openings and has a second thickness smaller than the first thickness.

Abstract: An apparatus and method of forming an epitaxial layer are provided. The apparatus includes a process chamber in which an epitaxial process is performed to form epitaxial layer on a substrate. A first supplier supplies source gases for the epitaxial layer into the process chamber. A second supplier supplies dopants into the process chamber. A detector detects a composition ratio of the epitaxial layer and a concentration of the dopants in the epitaxial layer during the epitaxial growth process. And a controller controls a mass flow of at least one of the source gases and a mass flow of the dopants in-line with the epitaxial growth process. Accordingly, the layer thickness of the epitaxial layer can be accurately controlled in real time in line with the epitaxial process.

Abstract: An apparatus and method of forming an epitaxial layer are provided. The apparatus includes a process chamber in which an epitaxial process is performed to form epitaxial layer on a substrate. A first supplier supplies source gases for the epitaxial layer into the process chamber. A second supplier supplies dopants into the process chamber. A detector detects a composition ratio of the epitaxial layer and a concentration of the dopants in the epitaxial layer during the epitaxial growth process. And a controller controls a mass flow of at least one of the source gases and a mass flow of the dopants in-line with the epitaxial growth process. Accordingly, the layer thickness of the epitaxial layer can be accurately controlled in real time in line with the epitaxial process.

Abstract: A system to and method of monitoring a condition of a process tool. The system monitors a condition of a process tool to correctly detect a faulty operation or malfunction of the process tool. The system to monitor the condition of the process tool includes a first model storage unit to store one or more good models generated by data associated with the process tool, a second model storage unit to store one or more faulty models generated by the data associated with the process tool, a model selector to receive tool data from the process tool, and to select one of the good models and one of the faulty models in association with the received tool data, and an error detector to receive process data from the process tool, to compare the received process data with the good and faulty models selected by the model selector, and to estimate a condition of the process tool.

Abstract: A method of compensating sensor data and a method of evaluating an interlock of an interlock system, in which an allowable variation between sensors varying depending on a driving time for a set of equipment, an RF time, the number of wafers, etc. is minimized, thereby enhancing detection reliability of a defective wafer.

Abstract: A method of compensating sensor data used in an interlock system comprises setting a predetermined drift upper limit and a predetermined drift lower limit, creating a reference pattern information about a reference model, creating a sensor pattern information about the sensor data, determining whether the sensor pattern information satisfies the drift upper limit and the drift lower limit, calculating a drift offset according to the reference pattern information and the sensor pattern information when the sensor pattern information satisfies the drift upper limit and the drift lower limit, and compensating the sensor data according to the calculated drift offset.