Patents by Inventor Yoo-Jeong Choi

Yoo-Jeong Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Capacitor component
    Patent number: 11935701
    Abstract: A capacitor component includes a body including dielectric layers, first and second internal electrodes, laminated in a first direction, facing each other, and first and second cover portions, disposed on outermost portions of the first and second internal electrodes, and first and second external electrodes, respectively disposed on both external surfaces of the body in a second direction, perpendicular to the first direction, and respectively connected to the first and second internal electrodes. An indentation including a glass is disposed at at least one of boundaries between the first internal electrodes and the first external electrode or one of boundaries between the second internal electrodes and the second external electrode.
    Type: Grant
    Filed: April 4, 2023
    Date of Patent: March 19, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jang Yeol Lee, Ji Hong Jo, Yoo Jeong Lee, Myung Jun Park, Jong Ho Lee, Hye Young Choi, Jae Hyun Lee, Hyun Hee Gu
  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Monomer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10332751
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: June 25, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 10066057
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: September 4, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yu-Shin Park, Yun-Jun Kim, Tae-Ho Kim, You-Jung Park, Yoo-Jeong Choi, Hyo-Young Kwon, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 10018914
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B—*??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 10, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Mi-Young Kim, You-Jung Park, Yun-Jun Kim, Hea-Jung Kim, Joon-Young Moon, Hyun-Ji Song, Chung-Heon Lee, Yoo-Jeong Choi
  • Polymer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 9971243
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specification and * is a linking point.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 15, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yu-Shin Park, Tae-Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Hyo-Young Kwon, Sang-Kyun Kim, Young-Min Kim, Youn-Hee Nam, Hyun-Ji Song, Byeri Yoon, Dong-Geun Lee, Seulgi Jeong
  • MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION
    Publication number: 20170327640
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Yun-Jun KIM, Hwan-Sung CHEON, Youn-Jin CHO, Yong-Woon YOON, Chung-Heon LEE, Hyo-Young KWON, Yoo-Jeong CHOI
  • Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
    Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
    Patent number: 9671688
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A?, L, L?, X and n are the same as defined in the specification.
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 6, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Seung-Wook Shin, Yun-Jun Kim, Hea-Jung Kim, Youn-Jin Cho, Yoo-Jeong Choi
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
    Patent number: 9556094
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 31, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160363864
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 15, 2016
    Inventors: Yu-Shin PARK, Tae-Ho KIM, Yoo-Jeong CHOI, Sun-Hae KANG, Hyo-Young KWON, Sang-Kyun KIM, Young-Min KIM, Youn-Hee NAM, Hyun-Ji SONG, Byeri YOON, Dong-Geun LEE, Seulgi JEONG
  • ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160297932
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Application
    Filed: November 30, 2015
    Publication date: October 13, 2016
    Inventors: Yu-Shin PARK, Yun-Jun KIM, Tae-Ho KIM, You-Jung PARK, Yoo-Jeong CHOI, Hyo-Young KWON, Seung-Hyun KIM, Ran NAMGUNG, Dominea RATHWELL, Soo-Hyoun MUN, Hyun-Ji SONG, Hyeon-Il JUNG, Yu-Mi HEO
  • MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160237306
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Application
    Filed: December 28, 2015
    Publication date: August 18, 2016
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9371444
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: June 21, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Young-Min Kim, Joon-Young Moon, Yu-Shin Park, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
    Patent number: 9359276
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
    Type: Grant
    Filed: November 21, 2012
    Date of Patent: June 7, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yoo-Jeong Choi, Hyo-Young Kwon, Youn-Jin Cho, Yun-Jun Kim, Young-Min Kim, Yong-Woon Yoon, Chung-Heon Lee
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150329718
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Application
    Filed: January 22, 2015
    Publication date: November 19, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Young-Min KIM, Joon-Young MOON, Yu-Shin PARK, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150332931
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B-* ??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Application
    Filed: April 13, 2015
    Publication date: November 19, 2015
    Inventors: Youn-Hee NAM, Mi-Young KIM, You-Jung PARK, Yun-Jun KIM, Hea-Jung KIM, Joon-Young MOON, Hyun-Ji SONG, Chung-Heon LEE, Yoo-Jeong CHOI
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION
    Publication number: 20150301446
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A?, L, L?, X and n are the same as defined in the specification.
    Type: Application
    Filed: October 2, 2013
    Publication date: October 22, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Seung-Wook SHIN, Yun-Jun KIM, Hea-Jung KIM, Youn-Jin CHO, Yoo-Jeong CHOI
  • MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
    Publication number: 20150274622
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Application
    Filed: June 4, 2013
    Publication date: October 1, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi