Patents by Inventor Yoon-Ho Eo

Yoon-Ho Eo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposing systems providing post exposure baking and related methods
    Patent number: 7268853
    Abstract: A system for photolithography may include an exposure chamber providing a first isolated environment, an exposure stage in the exposure chamber, a radiation source, an interface chamber providing a second isolated environment, a port, a post exposure bake heater in the interface chamber, and a wafer handler. The exposure stage may be configured to receive a wafer having photoresist thereon to be exposed, and the radiation source may be configured to provide exposing radiation to the wafer being exposed. The port may be configured to allow wafer transport between the first and second isolated environments of the exposure and interface chambers, and the post exposure bake heater may be configured to bake the wafer after exposure.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: September 11, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Jae Ryu, Sang-Kap Kim, Young-Kyou Park, Yoon-Ho Eo
  • Exposing systems providing post exposure baking and related methods
    Publication number: 20050200818
    Abstract: A system for photolithography may include an exposure chamber providing a first isolated environment, an exposure stage in the exposure chamber, a radiation source, an interface chamber providing a second isolated environment, a port, a post exposure bake heater in the interface chamber, and a wafer handler. The exposure stage may be configured to receive a wafer having photoresist thereon to be exposed, and the radiation source may be configured to provide exposing radiation to the wafer being exposed. The port may be configured to allow wafer transport between the first and second isolated environments of the exposure and interface chambers, and the post exposure bake heater may be configured to bake the wafer after exposure.
    Type: Application
    Filed: November 9, 2004
    Publication date: September 15, 2005
    Inventors: Sung-Jae Ryu, Sang-Kap Kim, Young-Kyou Park, Yoon-Ho Eo