Abstract: The present invention relates to a substrate processing apparatus capable of shortening a process time, and the substrate processing apparatus according to the present invention comprises an index chamber having a transfer robot loading/unloading a substrate; a process chamber having a heating means heating the substrate and processing the substrate; a loadlock chamber disposed between the index chamber and the process chamber; and a conveying chamber having a conveying robot conveying the substrate between the process chamber and the loadlock chamber, wherein a pre-heating means is provided in the conveying robot to pre-heat the substrate in a state before processing.

Abstract: An MRAM device may include an insulating interlayer structure, a lower electrode contact structure and a variable resistance structure. The insulating interlayer may be formed on a substrate. The lower electrode contact structure may extend through the insulating interlayer. The lower electrode contact structure may include a first electrode having a pillar shape and a second electrode having a cylindrical shape on the first electrode. An upper surface of the second electrode may have a ring shape. A variable resistance structure may be formed on the second electrode. The variable resistance structure may include a lower electrode, a magnetic tunnel junction (MTJ) structure and an upper electrode sequentially stacked.

Abstract: An MRAM device may include an insulating interlayer structure, a lower electrode contact structure and a variable resistance structure. The insulating interlayer may be formed on a substrate. The lower electrode contact structure may extend through the insulating interlayer. The lower electrode contact structure may include a first electrode having a pillar shape and a second electrode having a cylindrical shape on the first electrode. An upper surface of the second electrode may have a ring shape. A variable resistance structure may be formed on the second electrode. The variable resistance structure may include a lower electrode, a magnetic tunnel junction (MTJ) structure and an upper electrode sequentially stacked.

Abstract: Disclosed are a magnetic device and a method of manufacturing the same. The magnetic device includes an insulation spacer that surrounds a portion of a wiring structure and a variable resistance structure. In order to manufacture the magnetic device, a magnetic resistance element and an electrode covering the magnetic resistance element are formed on a substrate by using a sacrificial mask pattern as an etch mask, and then, an insulation spacer that surrounds the magnetic resistance element, the electrode, and the sacrificial mask pattern and exposes the sacrificial mask pattern is formed. A contact space that is limited by the insulation spacer and exposes the electrode is provided by removing the sacrificial mask pattern. A conductive pattern contacting the electrode is formed in the contact space.

Abstract: Disclosed are a magnetic device and a method of manufacturing the same. The magnetic device includes an insulation spacer that surrounds a portion of a wiring structure and a variable resistance structure. In order to manufacture the magnetic device, a magnetic resistance element and an electrode covering the magnetic resistance element are formed on a substrate by using a sacrificial mask pattern as an etch mask, and then, an insulation spacer that surrounds the magnetic resistance element, the electrode, and the sacrificial mask pattern and exposes the sacrificial mask pattern is formed. A contact space that is limited by the insulation spacer and exposes the electrode is provided by removing the sacrificial mask pattern. A conductive pattern contacting the electrode is formed in the contact space.

Abstract: Provided is a method of improving adhesion between a polymer substrate and a metal layer formed on the substrate. The method according to present invention includes (a) performing a surface modification treatment on a polymer film, (b) forming a metal layer on the surface modification treated polymer film, and (c) performing at least one selected from an aging treatment or a current application treatment on the metal layer.

Abstract: A sidewall insert rubber composition for run-flat tire, and a tire produced using the same rubber composition are provided. The sidewall insert rubber composition for run-flat tire can realize excellent low fuel consumption performance by applying a functionalized, solution-polymerized butadiene rubber having a low glass transition temperature and thereby enhancing the interaction with fillers, and can provide a high strength sidewall insert rubber for run-flat tire with less heat generation by increasing the content of a filler.