Patents by Inventor Yoon-Mi Lee

Yoon-Mi Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250049873
    Abstract: In a method for ameliorating or treating a respiratory disease, a composition including a Lysimachia mauritiana extract as effective component is administered to a subject in need thereof. Since the Lysimachia mauritiana extract is effective in reducing the production amount of the chemokine RANTES, an inflammatory mediator, from bronchial epithelial cells, which are respiratory cells, the composition can be advantageously used as a functional health food or medicine for respiratory diseases including asthma or chronic obstructive pulmonary disease (COPD).
    Type: Application
    Filed: December 22, 2022
    Publication date: February 13, 2025
    Inventors: YOON-YOUNG SUNG, DONG-SEON KIM, EUN JUNG SON, HEUNG JOO YUK, YUN MI LEE, YOUNG SOOK KIM
  • Patent number: 12205746
    Abstract: A coil component includes a body having one surface and the other surface, opposing each other, both lateral surfaces respectively connecting the one surface and the other surface and opposing each other, and both end surfaces respectively connecting the both lateral surfaces and opposing each other; a coil unit disposed in the body; a first external electrode and a second external electrode, respectively connected to the coil unit and disposed to be spaced apart from each other on the one surface of the body; and a first insulating layer covering the other surface of the body, the both lateral surfaces of the body, and the both end surfaces of the body.
    Type: Grant
    Filed: February 1, 2021
    Date of Patent: January 21, 2025
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Ju Hwan Yang, Seung Mo Lim, Tae Jun Choi, Byung Soo Kang, Yong Hui Li, Tai Yon Cho, No Il Park, Yoon Mi Cha, Boum Seock Kim, Seung Min Lee
  • Patent number: 10790176
    Abstract: A substrate carrier may include a carrier body and a first sensor unit. The carrier body may include an internal space, an inlet port and an outlet port. The internal space may be configured to receive a substrate. A purge gas may be introduced into the internal space through the inlet port. A gas in the internal space may be exhausted through the outlet port. The first sensor unit may be at the outlet port and configured to detect environmental properties of the internal space in real time. Thus, a generation or cause of a contaminant in the carrier body may be accurately identified.
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: September 29, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Du-Sik Bae, Hang-Ryong Lim, Se-Won Ko, Yoon-Mi Lee, Jin-Ho Kim, Jung-Dae Park, Min-Seon Lee, Yeong-Cheol Lee
  • Publication number: 20190131152
    Abstract: A substrate carrier may include a carrier body and a first sensor unit. The carrier body may include an internal space, an inlet port and an outlet port. The internal space may be configured to receive a substrate. A purge gas may be introduced into the internal space through the inlet port. A gas in the internal space may be exhausted through the outlet port. The first sensor unit may be at the outlet port and configured to detect environmental properties of the internal space in real time. Thus, a generation or cause of a contaminant in the carrier body may be accurately identified.
    Type: Application
    Filed: June 19, 2018
    Publication date: May 2, 2019
    Inventors: Du-Sik Bae, Hang-Ryong Lim, Se-Won Ko, Yoon-Mi Lee, Jin-Ho Kim, Jung-Dae Park, Min-Seon Lee, Yeong-Cheol Lee
  • Publication number: 20120183696
    Abstract: A plating method includes supplying a plating solution into a plating bath, immersing a first substrate having a lower metal interconnection and a photoresist pattern in the plating solution, performing a first plating process and forming a first plating pattern on the first substrate, removing the first substrate from the plating solution, collecting a sample of the plating solution, analyzing a photoresist residue included in the sample, immersing a second substrate in the plating solution, and performing a second plating process and forming a second plating pattern on the second substrate.
    Type: Application
    Filed: October 24, 2011
    Publication date: July 19, 2012
    Inventors: Jung-Dae Park, Seung-Ki Chae, Pil-Kwon Jun, Sung-Hoon Bae, Yoon-Mi Lee, Da-Hee Lee, Min-Jung Kim