Patents by Inventor Yoon-Suk Oh
Yoon-Suk Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12237153Abstract: The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate.Type: GrantFiled: November 1, 2022Date of Patent: February 25, 2025Assignee: KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGYInventors: Sung min Lee, Yoon Suk Oh
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Patent number: 12223901Abstract: A pixel of a display device may pre-charge a light emitting element in non-emission periods immediately before emission periods by varying a voltage level of an initialization voltage. As a result, a luminance non-uniformity phenomenon that may occur as the result of a deterioration deviation of the light emitting element may be removed or reduced.Type: GrantFiled: April 17, 2023Date of Patent: February 11, 2025Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Dae Youn Cho, Jong Woo Park, Jun Seok Oh, Yoon Suk Choi, Young Tae Choi
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Publication number: 20240043338Abstract: The present invention provides a plasma-resistant ceramic substrate including a bulk of an oxide composition; and a surface layer in which an oxide composition component constituting the bulk was modified to a composition including one or more anions selected from the group consisting of F? and Cl?, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F? and Cl? is vaporized by heating and adsorbed on the surface of the ceramic substrate to be modified to a composition including one or more anions selected from the group consisting of F? and Cl?, and a method of manufacturing the same. According to the present invention, the plasma resistance and durability of the ceramic substrate can be improved at low cost.Type: ApplicationFiled: December 2, 2021Publication date: February 8, 2024Inventors: Sung Min LEE, Yoon Suk OH, Hyeong Jun KIM, Gyusang OH
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Publication number: 20230257314Abstract: The present invention provides a plasma-resistant ceramic member, which includes a substrate and a ceramic coating layer formed on the substrate, in which the ceramic coating layer includes a lower layer consisting of an oxide formed on the substrate, and a surface layer in which an oxide composition component constituting the surface of the ceramic coating layer is surface-modified with a composition containing one or more anions selected from the group consisting of F? and Cl?, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F? and Cl? is vaporized by heating and adsorbed to the surface of the ceramic coating layer, and thus modified with a composition containing one or more anions selected from the group consisting of F? and Cl?, and a method of manufacturing the same.Type: ApplicationFiled: November 3, 2022Publication date: August 17, 2023Applicant: KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGYInventors: Sung min LEE, Yoon Suk OH, Hyeong Jun KIM, Gyusang OH
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Publication number: 20230215701Abstract: The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate.Type: ApplicationFiled: November 1, 2022Publication date: July 6, 2023Inventors: Sung min LEE, Yoon Suk OH
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Publication number: 20190161843Abstract: The present disclosure relates to a method for preparing a ceramic thermal barrier coating layer including (a) preparing a first suspension in which first oxide particles for thermal barrier coating are dispersed and a second suspension in which second oxide particles for thermal barrier coating are dispersed, respectively; (b) forming a first coating layer on a base material by suspension plasma spraying (SPS) using the first suspension; (c) forming a buffer layer on the first coating layer by the suspension plasma spraying using a mixed suspension of the first suspension and the second suspension; and (d) forming a second coating layer on the buffer layer by the suspension plasma spraying using the second suspension.Type: ApplicationFiled: November 27, 2018Publication date: May 30, 2019Inventors: Seong Won KIM, Sung Min LEE, Yoon Suk OH, Hyung Tae KIM
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Patent number: 10145001Abstract: Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.Type: GrantFiled: June 6, 2016Date of Patent: December 4, 2018Assignees: Hyundai Motor Company, Hyundai Steel CompanyInventors: In Woong Lyo, Woong Pyo Hong, Kwang Hoon Choi, Hyuk Kang, Sang Jin Park, Yoon Suk Oh
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Publication number: 20170009331Abstract: Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.Type: ApplicationFiled: June 6, 2016Publication date: January 12, 2017Inventors: In Woong Lyo, Woong Pyo Hong, Kwang Hoon Choi, Hyuk Kang, Sang Jin Park, Yoon Suk Oh
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Patent number: 9422618Abstract: Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.Type: GrantFiled: June 21, 2012Date of Patent: August 23, 2016Assignees: Hyundai Motor Company, Hyundai Steel CompanyInventors: In Woong Lyo, Woong Pyo Hong, Kwang Hoon Choi, Hyuk Kang, Sang Jin Park, Yoon Suk Oh
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Patent number: 8669078Abstract: Disclosed herein are ammonia-specific 5?-XMP aminase mutants and a method for preparing the same. A mutation is introduced into the active site of glutamine-dependent catalysis in 5?-XMP aminase. The resulting 5?-XMP aminase mutant is devoid of the glutamine-dependent activity and specifically reacts with external ammonia in converting 5?-XMP into 5?-GMP. Thus, the ammonia-specific 5?-XMP aminase mutant is stabler within cells compared to the wild type, and can be useful in the industrial conversion of 5?-XMP into 5?-GMP.Type: GrantFiled: December 14, 2006Date of Patent: March 11, 2014Assignee: CJ Cheiljedang CorporationInventors: Jae-Gu Pan, Heung-Chae Jung, Eui-Joong Kim, Han-Seung Lee, Young Hoon Park, Hyoung Suk Kim, Jong-Kwon Han, Jin Nam Lee, Ki-Hoon Oh, Jeong Hwan Kim, Yoon-Suk Oh, Jae Ick Sim, Kuk-Ki Hong, Kyung Oh Choi, Hyun Soo Kim, Min-Ji Baek, Tae Sun Kang
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Publication number: 20130134033Abstract: Disclosed is a method and apparatus for forming a coating layer using a physical vapor deposition apparatus equipped with a sputtering apparatus and an arc ion plating apparatus, comprising: a first coating step of forming a Mo coating layer on a base material using a the sputtering apparatus and a Mo target and Ar gas; a nitrating step of forming a nitride film forming condition using an arc ion plating apparatus and Ar gas and N2 gas; a second coating step of forming a nano composite coating layer of Cr—Mo—N using the Mo target and Ar gas of the sputtering apparatus and the Ar gas, N2 gas and a Cr source of the arc ion plating apparatus at the same time; and a multi-coating step of forming a multi-layer having alternating Cr—Mo—N nano composite coating layers and Mo coating layers by revolving the base material around a central pivot.Type: ApplicationFiled: June 21, 2012Publication date: May 30, 2013Applicants: HYUNDAI HYSCO, HYUNDAI MOTOR COMPANYInventors: In Woong Lyo, Woong Pyo Hong, Kwang Hoon Choi, Hyuk Kang, Sang Jin Park, Yoon Suk Oh
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Patent number: 7741101Abstract: Provided are mutant strains derived from Escherichia sp. GPU1114 (Accession No. KCCM-10536), having cumulative inactivation of deoD, aphA, appA, and hprt genes, and methods of using the same.Type: GrantFiled: January 20, 2006Date of Patent: June 22, 2010Assignee: CJ Cheiljedang CorporationInventors: Young-hoon Park, Hyoung-suk Kim, Jin-nam Lee, Ko-hoon Oh, Jeong-hwan Kim, Yoon-suk Oh, Jae-ick Sim, Kyung-oh Choi
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Patent number: 7608435Abstract: The invention relates to a microorganism, obtained by treating Corynebacterium ammoniagenes KCCM 10488 producing 5?-Xanthylic acid as parent strain with UV radiation and mutation Derivatives such as N-methyl-N?nitro-N-nitrosoguanidine (NTG), Having a resistance to 5-fluorotryptophan which enhances Biosynthesis of N5-N10-tetrahydrofolate used for transferring Two formyl group during the process of puring biosynthesis, making It possible to accumulate 5?xanthylic acid in culture medium at a high Yield and high concentration rate same period of fermentation.Type: GrantFiled: November 18, 2004Date of Patent: October 27, 2009Assignee: CJ Cheiljedang Corp.Inventors: Young-Hoon Park, Jea-Young Chang, Jin-Nam Lee, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim
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Publication number: 20080318278Abstract: Disclosed herein are ammonia-specific 5?-XMP aminase mutants and a method for preparing the same. A mutation is introduced into the active site of glutamine-dependent catalysis in 5?-XMP aminase. The resulting 5?-XMP aminase mutant is devoid of the glutamine-dependent activity and specifically reacts with external ammonia in converting 5?-XMP into 5?-GMP. Thus, the ammonia-specific 5?-XMP aminase mutant is stabler within cells compared to the wild type, and can be useful in the industrial conversion of 5?-XMP into 5?-GMP.Type: ApplicationFiled: December 14, 2006Publication date: December 25, 2008Applicant: CJ CHEILJEDANG CORPORATIONInventors: Jae-Gu Pan, Heung-Chae Jung, Eui-Joong Kim, Han-Seung Lee, Young Hoon Park, Hyoung Suk Kim, Jong-Kwon Han, Jin Nam Lee, Ki-Hoon Oh, Jeong Hwan Kim, Yoon-Suk Oh, Jae Ick Sim, Kuk-Ki Hong, Kyung Oh Choi, Hyun Soo Kim, Min-Ji Baek, Tae Sun Kang
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Publication number: 20080299620Abstract: Provided are mutant strains derived from Escherichia sp. GPU1114 (Accession No. KCCM-10536), having cumulative inactivation of deoD, aphA, appA, and hprt genes, and methods of using the same.Type: ApplicationFiled: January 20, 2006Publication date: December 4, 2008Applicant: CJ CORP.Inventors: Young-hoon Park, Hyoung-suk Kim, Jin-nam Lee, Ki-hoon Oh, Jeong-hwan Kim, Yoon-suk Oh, Jae-ick Sim, Kyung-oh Choi
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Patent number: 7456010Abstract: The invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 producing 5?-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to osmotic pressure. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N?-nitro-n-nitrosoguanidine (NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 of the present invention makes it possible to overcome growth-standing phase rapidly on early culture and for same period of fermentation, can accumulate 5?-xanthylic acid in culture medium at a high yield and concentration rate.Type: GrantFiled: December 10, 2003Date of Patent: November 25, 2008Assignee: CJ Cheiljedang Corp.Inventors: Young-Hyeon Kwag, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim, Young-Hoon Park, Jea-Young Chang
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Publication number: 20070141682Abstract: The invention relates to a microorganism, obtained by treating Corynebacterium ammoniagenes KCCM 10488 producing 5?-Xanthylic acid as parent strain with UV radiation and mutation Derivatives such as N-methyl-N?nitro-N-nitrosoguanidine (NTG), Having a resistance to 5-fluorotryptophan which enhances Biosynthesis of N5-N10-tetrahydrofolate used for transferring Two formyl group during the process of puring biosynthesis, making It possible to accumulate 5?xanthylic acid in culture medium at a high Yield and high concentration rate same period of fermentation.Type: ApplicationFiled: November 18, 2004Publication date: June 21, 2007Inventors: Young-Hoon Park, Jea-Young Chang, Jin-Nam Lee, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim
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Patent number: 7217558Abstract: The invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 producing 5?-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to oligomycin. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N?-nitro-n-nitrosoguanidine(NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 of the present invention makes it possible to increase ATP reproducing activity for same period of fermentation and can accumulate 5?xanthylic acid in culture medium at a high yield and concentration rate.Type: GrantFiled: December 10, 2003Date of Patent: May 15, 2007Assignee: CJ CorporationInventors: Young-Hyeon Kwag, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim, Young-Hoon Park, Jea-Young Chang
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Publication number: 20060154346Abstract: The invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 producing 5?-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to oligomycin. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N?-nitro-n-nitrosoguanidine(NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXOL 0201 KCCM 10447 of the present invention makes it possible to increase ATP reproducing activity for same period of fermentation and can accumulate 5?xanthylic acid in culture medium at a high yield and concentration rate.Type: ApplicationFiled: December 10, 2003Publication date: July 13, 2006Inventors: Young-Hyeon Kwag, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim, Young-Hoon Park, Jea-Young Chang
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Publication number: 20060094084Abstract: The invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 producing 5?-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to osmotic pressure. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N?-nitro-n-nitrosoguanidine (NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 of the present invention makes it possible to overcome growth-standing phase rapidly on early culture and for same period of fermentation, can accumulate 5?-xanthylic acid in culture medium at a high yield and concentration rate.Type: ApplicationFiled: December 10, 2003Publication date: May 4, 2006Inventors: Young-Hyeon Kwag, Ki-Hoon Oh, Jeong-Hwan Kim, Yoon-Suk Oh, Jae-Ick Sim, Young-Hoon Park, Jea-Young Chang