Patents by Inventor Yoonyoung Jin

Yoonyoung Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10511073
    Abstract: Devices and methods for manufacturing RF circuits and systems in both passive and active forms are contemplated herein. Exemplary devices include 3D electrical and mechanical structures which are created from individual slices which may be assembled to create a final functional block such as a circuit, component or a system. The slices may fabricated by a variety of manufacturing techniques, such as micromachined layer-by-layer metal batch processing.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: December 17, 2019
    Assignee: CUBIC CORPORATION
    Inventors: David Anthony Miller, Hooman Kazemi, Ankush Mohan, Yoonyoung Jin
  • Publication number: 20180026324
    Abstract: Devices and methods for manufacturing RF circuits and systems in both passive and active forms are contemplated herein. Exemplary devices include 3D electrical and mechanical structures which are created from individual slices which may be assembled to create a final functional block such as a circuit, component or a system. The slices may fabricated by a variety of manufacturing techniques, such as micromachined layer-by-layer metal batch processing.
    Type: Application
    Filed: December 1, 2015
    Publication date: January 25, 2018
    Inventors: David Anthony Miller, Hooman Kazemi, Ankush Mohan, Yoonyoung Jin
  • Publication number: 20130273363
    Abstract: The present invention relates to a freestanding network of carbon nanofibers. The present invention further relates to a method of fabricating a freestanding network of carbon nanofibers. Carbon nanofibers are synthesized glass microballoons that are self-assembled on a silicon wafer.
    Type: Application
    Filed: April 12, 2012
    Publication date: October 17, 2013
    Inventors: Eyassu Woldensenbet, Ephraim Zegeye, Yoonyoung Jin
  • Publication number: 20020106460
    Abstract: Fluorocarbonated silicon films having very low dielectric constants, and a method for fabricating those films are disclosed. The low dielectric constants of the novel films make them suitable for use in ULSI fabrication techniques. The novel films may be prepared using a SiH4 or Si2H6 precursor as a silicon source, and CF4, C2F6, or C4F8 as a source of carbon and fluorine. The films not only have low dielectric constants (typically, k=1.9 to 2.3), they also exhibit high dielectric breakdown voltages. The process may be carried out at relatively low temperatures. The novel films may readily be used with conventional etching techniques, and they adhere well.
    Type: Application
    Filed: February 7, 2001
    Publication date: August 8, 2002
    Inventors: Gil Sik Lee, Yoonyoung Jin, Kihong Kim