Abstract: An imprint method according to this embodiment includes preparing a mold having a recessed portion, filling the recessed portion with a mold non-reactive material, pressing the mold against a resist which is applied on a base material, curing the resist in a state that the mold is pressed, and separating the mold from the base material. The mold non-reactive material is a material which does not chemically react with a material of the mold. By curing of the resist, the resist and the mold non-reactive material are coupled. When the mold is separated from the base material, the resist and the mold non-reactive material are left on the base material.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: An imprint method according to this embodiment includes preparing a mold having a recessed portion, filling the recessed portion with a mold non-reactive material, pressing the mold against a resist which is applied on a base material, curing the resist in a state that the mold is pressed, and separating the mold from the base material. The mold non-reactive material is a material which does not chemically react with a material of the mold. By curing of the resist, the resist and the mold non-reactive material are coupled. When the mold is separated from the base material, the resist and the mold non-reactive material are left on the base material.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: A hologram-recording medium containing: a recording layer containing a polymerizable monomer containing a structural framework represented by the following general formula (1). In general formula (1), X and Y are not the same, and X and Y are selected from hydrogen, iodine, bromine, and chlorine atoms and from methyl, ethyl, isopropyl, tert-butyl, phenyl, naphthyl, hydroxyl, methoxy, ethoxy, isopropoxy, tert-butoxy, phenoxy, naphthoxy, acetyl, carboxyl, acetoxy, thiophenyl, thionaphthyl, thiomethyl, thioethyl, thioisopropyl, thio-tert-butyl, and thiol groups; and W is selected from the group consisting of benzylvinyl, styryl, acryloyl, and methacryloyl groups.

Abstract: A holographic recording method includes the following steps: irradiating an optical recording medium with a coherent reference beam and a coherent information beam to produce a hologram in the optical recording medium while irradiating the optical recording medium with an incoherent pretreatment beam to consume a polymerization inhibitor; irradiating the hologram with the reference beam to extract a reproduction beam while stopping irradiating the optical recording medium with the reference beam; sensing the signal beam with an image pick-up unit to detect an intensity of the signal beam; and calculating a bit error rate with a control unit to irradiate the hologram with the information beam if the bit error rate is larger than a prescribed value, or to stop irradiating the optical recording medium with the reference beam, the information beam and the pretreatment beam if the bit error rate is smaller than the prescribed value.

Abstract: According to a first aspect of the invention, an optical information recording apparatus includes a spatial beam modulator, an optical component, a drive unit, and a control unit. The apparatus performs angle-multiplex recording of the information so that an absolute value of a bisector angle ?x for n-th recording (1?n?rN) is smaller than an absolute value of a bisector angle ?x for m-th recording (m>n and rN<m?N). Here, N is the number of pages to be defined as the total number of recording times performed on a recording spot of an optical information recording medium. The n-th recording is performed on the recording spot with the reference beam and the information beam. r is a rate to be determined by a volumetric shrinkage of the optical information recording medium. The volumetric shrinkage increases with irradiating the optical information recording medium with the reference beam and the information beam.

Abstract: A holographic recording medium includes a recording layer. The recording layer includes a framework being expressed with the following general formula (1), In the above formula (1), Ar represents a substituted or unsubstituted group selected from benzothiophene group, naphthothiophene group, dibenzothiophene group, thienothiophene group, dithienobenzene group, benzothiazole group, naphthothiazole group, benzoisothiazole group, naphthoisothiazole group, phenothiazine group, phenoxathiin group, dithianaphthalene group, thianthrene group, thioxanthene group, and bithiophene group. In addition, n is an integer from 1 to 4.

Abstract: Several novel polyimide materials are disclosed. One example is a polyimide material comprising heterocyclic polyimide having an unit represented by the following general formula (1): (wherein ?1s may be the same or different and are individually a quadrivalent organic group, the ?1s including at least 0.2 molar equivalent of a quadrivalent hetrocyclic group selected from the following Group (a), ?1s may be the same or different and are individually a bivalent organic group, and n is a positive integer).

Abstract: A refractive index variable device has a structure including quantum dots dispersed in a solid matrix, each of the quantum dots comprising a combination of a negatively charged accepter and a positively charged atom, where the outermost electron shell of the positively charged atom is fully filled with electrons so that an additional electron occupies an upper different shell orbital when receives an electron; and an electron injector injecting an electron into the quantum dots through the solid matrix.

Abstract: Several novel polyimide materials are disclosed. One example is apolyimide material comprising heterocyclic polyimide having an unit represented by the following general formula (1): (wherein ?1s may be the same or different and are individually a quadrivalent organic group, the ?1s including at least 0.2 molar equivalent of a quadrivalent hetrocyclic group selected from the following Group (a), ?1s may be the same or different and are individually a bivalent organic group, and n is a positive integer).

Abstract: Several novel polyimide materials are disclosed. One example is a polyimide material comprising heterocyclic polyimide having an unit represented by the following general formula (1): (wherein ?1s may be the same or different and are individually a quadrivalent organic group, the ?1s including at least 0.2 molar equivalent of a quadrivalent hetrocyclic group selected from the following Group (a), ?1s may be the same or different and are individually a bivalent organic group, and n is a positive integer).

Abstract: Several novel polyimide materials are disclosed.

Abstract: Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10−14] of 5 to 8 within an aqueous solution of 25° C.

Abstract: Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10−14] of 5 to 8 within an aqueous solution of 25° C.

Abstract: A negative photosensitive resin composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator. This photosensitive heat cure accelerator may be, a compound having a protective substituent group which can be eliminated upon irradiation of light, an N-oxide compound which is capable of exhibiting a heat cure accelerating property through a transition of an oxide group thereof upon irradiation of light, or a compound which is capable of exhibiting a heat cure accelerating property through generation of an acid upon irradiation of light. Further, this photosensitive heat cure accelerator may be formed of a combination of a latent heat cure accelerator which is capable of changing into a compound exhibiting a heat cure accelerating property through a reaction with an acid and a photo-acid generating agent which is capable of generating an acid upon irradiation of light.

Abstract: A negative photosensitive polymer composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator which is capable of accelerating a curing upon irradiation of light (cyclodehydration accelerating property). This photosensitive heat cure accelerator may be a compound which is capable of increasing molecular weight and raising volatilization temperature upon irradiation of light, or a compound which is capable of generating a carboxyl group upon irradiation of light thereby exhibiting a heat cure-accelerating property, and is formed of an aromatic hydrocarbon or aromatic heterocyclic compound having at least one hydroxyl group, substituted or unsubstituted amino group or mercapto group.

Abstract: A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.