Patent number: 11964950
Abstract: The present disclosure provides, for example, a compound represented by the general formula below or a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable solvate of the compound or salt: wherein X1, X2, X3 and X4 are each independently —CR2? or N?, R2 is, for example, a halogen atom, R1 is, for example, —S(?O)2—NH—R8, R8 is, for example, a C1-6 alkyl group, R3 is, for example, a hydrogen atom, R5 is, for example, a halogen atom, R6 is, for example, a hydrogen atom, and R4 is, for example, a cyclopropyl group. The compounds, salts or solvates provided by the present disclosure exhibit high RAF/MEK complex-stabilizing activity and can be used for the treatment or prevention of cell proliferative disorders, particularly cancers.
Type:
Grant
Filed:
July 20, 2022
Date of Patent:
April 23, 2024
Assignee:
Chugai Seiyaku Kabushiki Kaisha
Inventors:
Yoshiaki Isshiki, Fumio Watanabe, Masaki Tomizawa, Kihito Hada, Kazuo Hattori, Kenichi Kawasaki, Ikumi Hyodo, Toshihiro Aoki