Patents by Inventor Yoshiaki Kohama
Yoshiaki Kohama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7439502Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: GrantFiled: June 11, 2007Date of Patent: October 21, 2008Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Publication number: 20080173815Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: ApplicationFiled: February 8, 2008Publication date: July 24, 2008Applicant: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Publication number: 20070272859Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc.. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: ApplicationFiled: June 11, 2007Publication date: November 29, 2007Applicant: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Patent number: 7244932Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: GrantFiled: November 2, 2001Date of Patent: July 17, 2007Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Publication number: 20070034797Abstract: A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs an electric signal of the specimen image from the secondary beam, an image processor generates image information of the specimen by processing the electric signal output by the sensor, and a host computer generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate.Type: ApplicationFiled: September 28, 2006Publication date: February 15, 2007Applicant: NIKON CORPORATIONInventor: Yoshiaki Kohama
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Publication number: 20060022138Abstract: A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs an electric signal of the specimen image from the secondary beam, an image processor generates image information of the specimen by processing the electric signal output by the sensor, and a host computer generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate.Type: ApplicationFiled: September 7, 2005Publication date: February 2, 2006Applicant: NIKON CORPORATIONInventor: Yoshiaki Kohama
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Patent number: 6958477Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of election beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.Type: GrantFiled: October 30, 2003Date of Patent: October 25, 2005Assignee: Nikon CorporationInventor: Yoshiaki Kohama
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Patent number: 6953944Abstract: A scanning device and method includes a movable stage on which a specimen is positioned, an irradiating device for electron beam irradiation of the specimen, a detection device for generating a picture of the irradiation region by detecting a secondary beam including secondary or reflected electrons from the irradiation region, and imaging electron optical system for imaging the secondary beam on a detection surface. A secondary beam detector including a fluorescent unit arranged on the detection surface to convert the secondary beam into light, one-dimensional line sensors for forming electric charge by photoelectric conversion, an array imaging element for accumulating the electric charge in a predetermined line of the line sensors, and a two-dimensional imaging element which emits electric charge by means of photoelectric conversion. A corresponding method is also disclosed.Type: GrantFiled: November 12, 2003Date of Patent: October 11, 2005Assignee: Nikon CorporationInventors: Yoshiaki Kohama, Akihiro Goto, Muneki Hamashima, Yukiharu Okubo
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Publication number: 20040238740Abstract: New and improved scanning device and corresponding method that include and involve a movable stage on which a specimen is positioned, irradiation means which irradiates an electron beam onto an irradiation region of the specimen, secondary beam detection means used in generating a picture of the irradiation region by detecting a secondary beam which consists of at least one of secondary electrons or reflected electrons from the irradiation region of the electron beam, an imaging electron optical system which causes imaging of the secondary beam on a detection surface of the secondary beam detection means, and which is arranged between the specimen and the secondary beam detection means.Type: ApplicationFiled: November 12, 2003Publication date: December 2, 2004Applicant: Nikon CorporationInventors: Yoshiaki Kohama, Akihiro Goto, Muneki Hamashima, Yukiharu Okubo
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Publication number: 20040106862Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of election beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.Type: ApplicationFiled: October 30, 2003Publication date: June 3, 2004Applicant: NIKON CORPORATIONInventor: Yoshiaki Kohama
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Patent number: 6677587Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.Type: GrantFiled: December 27, 2002Date of Patent: January 13, 2004Assignee: Nikon CorporationInventor: Yoshiaki Kohama
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Patent number: 6670602Abstract: New and improved scanning device and corresponding method that include and involve a movable stage on which a specimen is positioned, irradiation means which irradiates an electron beam onto an irradiation region of the specimen, secondary beam detection means used in generating a picture of the irradiation region by detecting a secondary beam which consists of at least one of secondary electrons or reflected electrons from the irradiation region of the electron beam, an imaging electron optical system which causes imaging of the secondary beam on a detection surface of the secondary beam detection means, and which is arranged between the specimen and the secondary beam detection means.Type: GrantFiled: June 3, 1999Date of Patent: December 30, 2003Assignee: Nikon CorporationInventors: Yoshiaki Kohama, Akihiro Goto, Muneki Hamashima, Yukiharu Okubo
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Publication number: 20030085355Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.Type: ApplicationFiled: December 27, 2002Publication date: May 8, 2003Applicant: NIKON CORPORATIONInventor: Yoshiaki Kohama
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Patent number: 6518582Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.Type: GrantFiled: September 19, 2000Date of Patent: February 11, 2003Assignee: Nikon CorporationInventor: Yoshiaki Kohama
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Patent number: 6479819Abstract: This invention relates to an object observation apparatus and observation method.Type: GrantFiled: February 16, 2000Date of Patent: November 12, 2002Assignee: Nikon CorporationInventors: Muneki Hamashima, Yoichi Watanabe, Yoshiaki Kohama
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Publication number: 20020158198Abstract: It is an object of the present invention to provide a charged particle beam apparatus which can avoid charge-up without reducing the dose to a sample. For achieving such an object, the charged particle beam apparatus of the present invention is a charged particle beam apparatus comprising irradiating means for irradiating a sample with a charged particle beam, and imaging means for capturing a two-dimensional image of a secondary beam generated from the sample upon irradiation with the charged particle beam; wherein the irradiating means is means for irradiating a partial region within an imaging field of view of the imaging means with the charged particle beam by shaping a cross section of the charged particle beam; the apparatus further comprising moving means for moving the partial region such that the partial region scans the imaging field of view as a whole at least once.Type: ApplicationFiled: March 8, 2001Publication date: October 31, 2002Applicant: NIKON CORPORATIONInventors: Yoshiaki Kohama, Yukiharu Okubo
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Publication number: 20020148961Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: ApplicationFiled: November 2, 2001Publication date: October 17, 2002Inventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Patent number: 6184526Abstract: This invention concerns an apparatus and a method for observing and inspecting a predetermined area in a surface of a sample by use of an electron beam. The apparatus according to this invention comprises an MCP for multiplying a secondary beam emerging from the surface of the sample. The apparatus and method employ a CCD TDI array in order to increase the lifetime of the MCP, and special scan control is carried out in the observation and inspection operation. In addition, the apparatus according to this invention has various structures for enabling correction for positional deviation of the sample and high-speed processing.Type: GrantFiled: July 28, 1999Date of Patent: February 6, 2001Assignee: Nikon CorporationInventors: Yoshiaki Kohama, Muneki Hamashima, Shigeru Takemoto
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Patent number: RE40221Abstract: This invention relates to an object observation apparatus and observation method.Type: GrantFiled: November 12, 2004Date of Patent: April 8, 2008Assignee: Nikon CorporationInventors: Muneki Hamashima, Yoichi Watanabe, Yoshiaki Kohama
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Patent number: RE41665Abstract: This invention relates to an object observation apparatus and observation method.Type: GrantFiled: June 13, 2007Date of Patent: September 14, 2010Assignee: Nikon CorporationInventors: Muneki Hamashima, Yoichi Watanabe, Yoshiaki Kohama