Abstract: Provided is a work vehicle that can easily reduce the manufacturing cost by downsizing and simplifying a case support body and can easily simplify a support structure for a second case. The work vehicle includes an operation unit for an operator to get in, a first case for removing particulate matter in exhaust gas from the engine, and the second case for removing nitrogen oxides in the exhaust gas from the engine. In addition, the work vehicle includes a traveling machine body frame on which the operation unit is mounted, and the case support body for supporting the second case. The case support body is disposed on the traveling machine body frame, and the second case is attached to the traveling machine body frame via the case support body.

Abstract: [Problem] To provide a substrate treatment device which can more efficiently heat and more efficiently use a treatment solution to treat the surface of a plate-shaped substrate.

Abstract: A vehicle is provided with a clutch pedal which, when depressed, interrupts the transmission of drive power from the engine to the drive wheels. The clutch pedal is constituted by a pedal section and an arm having the pedal section attached to the lower part thereof. The arm can swing about the upper part thereof and is connected to a clutch disk within a transmission through a link mechanism. An elastic member is provided between the arm and a machine body. The vehicle is configured in such a manner that when the clutch pedal is depressed, the elastic member acts in a pressing-back direction until the clutch pedal reaches a first predetermined position, the pressing-back direction being the direction in which the elastic member presses back the arm; when the clutch pedal is depressed beyond the first predetermined position, the elastic member acts in the direction in which the arm is pressed in; and when the clutch pedal is depressed up to a second predetermined position, the clutch disk is separated.

Abstract: A substrate treatment apparatus which can more efficiently regenerate phosphoric acid which is able to be returned to etching treatment along with such etching treatment as much as possible without using a large facility, that is a substrate treatment apparatus which treats a silicon substrate W on which a nitride film is formed by a liquid etchant which contains phosphoric acid, which comprises an etching treatment unit (the spin treatment unit 30) which gives a suitable quantity of liquid, etchant to each substrate which is fed one at a time so as to etch the substrate and remove the nitride film, a phosphoric acid regenerating unit (the spin treatment unit 30) which mixes liquid etchant used for treatment of one substrate and a suitable quantity of liquid hydrofluoric acid for the amount of the used liquid etchant under a predetermined temperature environment to regenerate the phosphoric acid, and a phosphoric acid recovery unit (the pump 38, phosphoric acid recovery tank 50, and pump 52) which returns the

Abstract: A wet etching apparatus comprises a reservoir unit for storing aqueous solution of phosphoric acid, an additive reservoir unit for storing a silica additive; a concentration detecting unit configured to detect the silica concentration in the aqueous solution of phosphoric acid stored in the reservoir unit; a control unit configured to supply the silica additive from the additive reservoir unit to the reservoir unit if the silica concentration in the aqueous solution of phosphoric acid, detected by the concentration detecting unit, is lower than a prescribed value; and a processing unit configured to process the substrate with the aqueous solution of phosphoric acid stored in the reservoir unit.

Abstract: [Problem] To provide a substrate treatment device which can more efficiently heat and more efficiently use a treatment solution to treat the surface of a plate-shaped substrate.

Abstract: Sulfuric acid electrolysis process wherein; a temperature of electrolyte containing sulfuric acid to be supplied to an anode compartment and a cathode compartment is controlled to 30 degree Celsius or more; a flow rate F1 (L/min.) of the electrolyte containing sulfuric acid to be supplied to said anode compartment is controlled to 1.5 times or more (F1/Fa?1.5) a flow rate Fa (L/min.) of gas formed on an anode side as calculated from Equation (1) shown below and a flow rate F2(L/min.) of said electrolyte containing sulfuric acid to be supplied to said cathode compartment is controlled to 1.5 times or more (F2/Fc?1.5) a flow rate Fe (L/min.) of gas formed on a cathode side as calculated from Equation (2) shown below. Fa=(I×S×R×T)/(4×Faraday constant)??Equation (1) Fe=(I×S×R×T)/(2×Faraday constant)??Equation (2) I: Electrolytic current (A) S: Time: 60 second (Fixed) R: Gas constant (0.082 1·atm/K/mol) K: Absolute temperature (273.

Abstract: The cleaning method by electrolytic sulfuric acid and the manufacturing method of semiconductor device comprising: the process in which the first sulfuric acid solution is supplied from outside to the sulfuric acid electrolytic cell to form the first electrolytic sulfuric acid containing oxidizing agent in the sulfuric acid electrolytic cell; the process in which the second sulfuric acid solution, which is higher in concentration than said the first sulfuric acid solution previously supplied, is supplied from outside to said sulfuric acid electrolytic cell; said the second sulfuric acid solution and the first electrolytic sulfuric acid are mixed in said sulfuric acid electrolytic cell; and electrolysis is performed to form the cleaning solution comprising the second electrolytic sulfuric acid containing sulfuric acid and oxidation agent in said sulfuric acid electrolytic cell and the process in which cleaning treatment is performed for the cleaning object with said cleaning solution.

Abstract: In a sulfuric acid electrolytic cell to electrolyze sulfuric acid supplied to an anode compartment and a cathode compartment comprising a diaphragm, said anode compartment and said cathode compartment separated by said diaphragm, a cathode provided in said cathode compartment and a conductive diamond anode provided in said anode compartment, as said conductive diamond anode, a conductive diamond film is formed on the surface of said conductive substrate, the rear face of said conductive substrate is pasted, with conductive paste, on an current collector comprising a rigid body with size equal to, or larger than, said conductive substrate, an anode compartment frame constituting said anode compartment is contacted via gasket with the periphery on the side of the conductive diamond film of said diamond anode, said diaphragm is contacted with the front face of said anode compartment, further, with the front face of said diaphragm, the cathode compartment frame constituting said cathode compartment, a gasket, and

Abstract: In one embodiment, an etching method is disclosed. The method can include producing an oxidizing substance by electrolyzing a sulfuric acid solution, and producing an etching solution having a prescribed oxidizing species concentration by controlling a produced amount of the produced oxidizing substance. The method can include supplying the produced etching solution to a surface of a workpiece.

Abstract: According to embodiments, a cleaning liquid includes an oxidizing substance and hydrofluoric acid and exhibiting acidity. A cleaning method is disclosed. The method includes producing an oxidizing solution including an oxidizing substance by one selected from electrolyzing a sulfuric acid solution, electrolyzing hydrofluoric acid added to a sulfuric acid solution, and mixing a sulfuric acid solution with aqueous hydrogen peroxide. The method includes supplying the oxidizing solution and hydrofluoric acid to a surface of an object to be cleaned.

Abstract: According to one embodiment, a cleaning method is disclosed. The method can produce an oxidizing solution including an oxidizing substance by electrolyzing a dilute sulfuric acid solution. In addition, the method can supply a highly concentrated inorganic acid solution individually, sequentially, or substantially simultaneously with the oxidizing solution to a surface of an object to be cleaned.

Abstract: A substrate treatment apparatus, which treats a substrate with a treatment liquid that is ultrasonically vibrated, includes an oscillator body which is rectangular-parallelepiped and has a treatment liquid supply path having an opening on a lower surface thereof in a first end portion in a longitudinal direction thereof and inclining to a second end portion in the longitudinal direction thereof, a vibrator which is provided on an upper surface of the oscillator body and ultrasonically vibrates the oscillator, and a heat exchanger which cools the treatment liquid supplied to the treatment liquid supply path.

Abstract: The cleaning method by electrolytic sulfuric acid and the manufacturing method of semiconductor device comprising: the process in which the first sulfuric acid solution is supplied from outside to the sulfuric acid electrolytic cell to form the first electrolytic sulfuric acid containing oxidizing agent in the sulfuric acid electrolytic cell; the process in which the second sulfuric acid solution, which is higher in concentration than said the first sulfuric acid solution previously supplied, is supplied from outside to said sulfuric acid electrolytic cell; said the second sulfuric acid solution and the first electrolytic sulfuric acid are mixed in said sulfuric acid electrolytic cell; and electrolysis is performed to form the cleaning solution comprising the second electrolytic sulfuric acid containing sulfuric acid and oxidation agent in said sulfuric acid electrolytic cell and the process in which cleaning treatment is performed for the cleaning object with said cleaning solution.

Abstract: In a sulfuric acid electrolytic cell to electrolyze sulfuric acid supplied to an anode compartment and a cathode compartment comprising a diaphragm, said anode compartment and said cathode compartment separated by said diaphragm, a cathode provided in said cathode compartment and a conductive diamond anode provided in said anode compartment, as said conductive diamond anode, a conductive diamond film is formed on the surface of said conductive substrate, the rear face of said conductive substrate is pasted, with conductive paste, on an current collector comprising a rigid body with size equal to, or larger than, said conductive substrate, an anode compartment frame constituting said anode compartment is contacted via gasket with the periphery on the side of the conductive diamond film of said diamond anode, said diaphragm is contacted with the front face of said anode compartment, further, with the front face of said diaphragm, the cathode compartment frame constituting said cathode compartment, a gasket, and

Abstract: Sulfuric acid electrolysis process wherein; a temperature of electrolyte containing sulfuric acid to be supplied to an anode compartment and a cathode compartment is controlled to 30 degree Celsius or more; a flow rate F1 (L/min.) of the electrolyte containing sulfuric acid to be supplied to said anode compartment is controlled to 1.5 times or more (F1/Fa?1.5) a flow rate Fa (L/min.) of gas formed on an anode side as calculated from Equation (1) shown below and a flow rate F2(L/min.) of said electrolyte containing sulfuric acid to be supplied to said cathode compartment is controlled to 1.5 times or more (F2/Fc?1.5) a flow rate Fe (L/min.) of gas formed on a cathode side as calculated from Equation (2) shown below. Fa=(I×S×R×T)/(4×Faraday constant) ??Equation (I) Fe=(I×S×R×T)/(2×Faraday constant) ??Equation (2) I: Electrolytic current (A) S: Time: 60 second (Fixed) R: Gas constant (0.082 1·atm/K/mol) K: Absolute temperature (273.

Abstract: A substrate treatment apparatus, which treats a substrate with a treatment liquid that is ultrasonically vibrated, includes an oscillator body which is rectangular-parallelepiped and has a treatment liquid supply path having an opening on a lower surface thereof in a first end portion in a longitudinal direction thereof and inclining to a second end portion in the longitudinal direction thereof, a vibrator which is provided on an upper surface of the oscillator body and ultrasonically vibrates the oscillator, and a heat exchanger which cools the treatment liquid supplied to the treatment liquid supply path.

Abstract: An optical memory medium (2) has cores (21) each constituting a planar optical waveguide and clads (22) sandwiching each core, and has a data image (203) in which data is recorded as a scattering factor and a pair of positioning marks (201, 202) which are scattering factors required for positioning at an interface between a core (21) and a clad (22) or in the core (21). A read light (103) travels while spreading in the core (21) and scatters and interferes by the data image (203), and data is reproduced from a data reproduction light (1031) generated by this scattering and interference. A pair of positioning lights (101, 102) are caused to enter the core (21) with offsets with respect to the read light (103) in opposite directions along a thickness direction of the core (21), and scatter and interfere at the pair of positioning marks (201, 202).

Abstract: An information coding apparatus, an information decoding apparatus, and a method and a program therefor are provided, which can represent a large amount of information with a small number of pixels. Information bits which are inputted are coded as a block of a two-dimensional image made up from m (where m is a natural number)×n (where n is a natural number) pixels. Specifically, pixels which represent the information bits are arranged in a code area, which is an area of (m?o)×(n?p) pixels within a code block of m×n pixels (where o and p are natural numbers which satisfy 0<o<m and 0<p<n); and, no pixels which represent the information bits are arranged in a guide area, which is an area of the other pixels within the code block of m×n pixels.

Abstract: An optical memory medium (2) has cores (21) each constituting a planar optical waveguide and clads (22) sandwiching each core, and has a data image (203) in which data is recorded as a scattering factor and a pair of positioning marks (201, 202) which are scattering factors required for positioning at an interface between a core (21) and a clad (22) or in the core (21). A read light (103) travels while spreading in the core (21) and scatters and interferes by the data image (203), and data is reproduced from a data reproduction light (1031) generated by this scattering and interference. A pair of positioning lights (101, 102) are caused to enter the core (21) with offsets with respect to the read light (103) in opposite directions along a thickness direction of the core (21), and scatter and interfere at the pair of positioning marks (201, 202).