Patents by Inventor Yoshiaki Matsui
Yoshiaki Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9492371Abstract: A cosmetic composition, comprising the following components (A), (B), (C), and (D): (A) from 0.01 to 48 % by mass of a fluorine-modified silicone having a polysiloxane unit represented by the following formulae (1) and (2): wherein, Rf represents a linear or branched perfluoroalkyl group having 6 carbon atoms; R1, R2, and R3 are the same or different and each represent a linear or branched hydrocarbon group having 1 to 6 carbon atoms; m represents a number of 2 to 6; n represents a number of 1 to 6; p represents a number of 3 to 50; s represents a number of 1 to 5; and a ratio between p and s satisfies 0.66?p/(p+s)?0.9, (B) from 0.01 to 40 % by mass of a powder having been subjected to a surface treatment with tridecafluoro octyltriethoxysilane, (C) from 0.Type: GrantFiled: February 25, 2013Date of Patent: November 15, 2016Assignee: KAO CORPORATIONInventors: Hirohisa Suzuki, Yoshiaki Matsui, Takashi Kodate
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Patent number: 9408800Abstract: A cosmetic composition, comprising the following components (A), (B), (C), and (D): (A) from 0.01 to 50% by mass of a fluorine-modified silicone having a polysiloxane unit represented by the following formulae (1) and (2): wherein, Rf represents a perfluoroalkyl group having 6 carbon atoms; R1, R2, and R3 each represent a hydrocarbon group having 1 to 6 carbon atoms; m represents a number of from 2 to 6; n represents a number of from 1 to 6; p represents a number of from 3 to 50; s represents a number of from 1 to 5; and a ratio between p and s satisfies 0.66?p/(p+s)?0.9, (B) from 0.01 to 40% by mass of a powder having been subjected to a surface treatment with tridecafluoro octyltriethoxysilane, (C) from 0.01 to 20% by mass of a fine zinc oxide particle having a specific surface area of from 10 to 100 m2/g, with the proviso that the component (B) is excluded from the component (C), and (D) from 0.Type: GrantFiled: February 25, 2013Date of Patent: August 9, 2016Assignee: KAO CORPORATIONInventors: Hirohisa Suzuki, Yoshiaki Matsui, Takashi Kodate
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Publication number: 20150111383Abstract: A polishing liquid composition for a silicon wafer, wherein the composition comprises silica particles (component A), at least one kind of nitrogen-containing basic compound (component B) selected from an amine compound and an ammonium compound, and a water-soluble macromolecular compound (component C) that contains 10 wt % or more of a constitutional unit I represented by a general formula (1) below and has a weight average molecular weight of 50,000 or more and 1,500,000 or less; and the pH at 25° C. is 8.0 to 12.0. In the general formula (1), R1 and R2 each independently represents a hydrogen, a C1 to C8 alkyl group, or a C1 to C2 hydroxyalkyl group, and R1 and R2 are never both hydrogens.Type: ApplicationFiled: April 16, 2013Publication date: April 23, 2015Applicant: KAO CORPORATIONInventors: Joji Miura, Yoshiaki Matsui, Yuki Kato, Yuki Kotaka
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Publication number: 20150037418Abstract: A cosmetic composition, comprising the following components (A), (B), (C), and (D): (A) from 0.01 to 50% by mass of a fluorine-modified silicone having a polysiloxane unit represented by the following formulae (1) and (2): wherein, Rf represents a perfluoroalkyl group having 6 carbon atoms; R1, R2, and R3 each represent a hydrocarbon group having 1 to 6 carbon atoms; m represents a number of from 2 to 6; n represents a number of from 1 to 6; p represents a number of from 3 to 50; s represents a number of from 1 to 5; and a ratio between p and s satisfies 0.66?p/(p+s)?0.9, (B) from 0.01 to 40% by mass of a powder having been subjected to a surface treatment with tridecafluoro octyltriethoxysilane, (C) from 0.01 to 20% by mass of a fine zinc oxide particle having a specific surface area of from 10 to 100 m2/g, with the proviso that the component (B) is excluded from the component (C), and (D) from 0.Type: ApplicationFiled: February 25, 2013Publication date: February 5, 2015Applicant: KAO CORPORATIONInventors: Hirohisa Suzuki, Yoshiaki Matsui, Takashi Kodate
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Publication number: 20150030647Abstract: A cosmetic composition, comprising the following components (A), (B), (C), and (D): (A) from 0.01 to 48% by mass of a fluorine-modified silicone having a polysiloxane unit represented by the following formulae (1) and (2): wherein, Rf represents a linear or branched perfluoroalkyl group having 6 carbon atoms; R1, R2, and R3 are the same or different and each represent a linear or branched hydrocarbon group having 1 to 6 carbon atoms; m represents a number of 2 to 6; n represents a number of 1 to 6; p represents a number of 3 to 50; s represents a number of 1 to 5; and a ratio between p and s satisfies 0.66?p/(p+s)?0.9, (B) from 0.01 to 40% by mass of a powder having been subjected to a surface treatment with tridecafluoro octyltriethoxysilane, (C) from 0.Type: ApplicationFiled: February 25, 2013Publication date: January 29, 2015Applicant: KAO CORPORATIONInventors: Hirohisa Suzuki, Yoshiaki Matsui, Takashi Kodate
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Patent number: 7740026Abstract: A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device.Type: GrantFiled: June 28, 2005Date of Patent: June 22, 2010Assignee: Taikisha Ltd.Inventors: Yoshiaki Matsui, Yuji Nagata, Satoshi Horisawa, Tomotaka Miwa
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Publication number: 20080029001Abstract: A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device.Type: ApplicationFiled: June 28, 2005Publication date: February 7, 2008Applicant: Taikisha LtdInventors: Yoshiaki Matsui, Yuji Nagata, Satoshi Horisawa, Tomotaka Miwa
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Patent number: 5699219Abstract: A ground fault current limiter, in which reactors are connected in series to a neutral point for compensating for capacitances to ground of a power switches capable of turning ON/OFF at a high speed are connected in parallel with respective reactors, occurrence of a ground fault is detected from a phase difference between a zero-phase sequence current and a zero-phase sequence voltage at time of sampling, an optimal compensation quantity of capacitances to ground is computed based on the zero-phase sequence current and the zero-phase sequence voltage at time of occurrence of a ground fault, and ON/OFF of the switches are controlled thereby to alter the reactor quantity so as to correspond to the compensation quantity.Type: GrantFiled: May 16, 1995Date of Patent: December 16, 1997Assignees: Hitachi, Ltd, Chubu Electric Power Co., Inc.Inventors: Hiroshi Arita, Junzo Kida, Yoshiaki Matsui, Tokio Yamagiwa, Shigeyuki Sugimoto, Sadanori Neo
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Patent number: 5371302Abstract: The invention relates to a process for preparing prilled bisphenol A by granulation which comprises adding compounds soluble in molten bisphenol A, not affecting adversely the melt color of bisphenol A to any significant extent, and have a melting point of 60.degree. C. or more to bisphenol A and granulating and also to a process which comprises adding the reaction mother liquor or cyrstallization mother liquor produced in the manufacturing step of bisphenol A to bisphenol A or the adduct of bispheol A and phenol or a mixture of bispheol A and phenol, removing the phenol, and granulating. The processes yield prilled bispheol A which have high strength and resist powdering.Type: GrantFiled: April 13, 1993Date of Patent: December 6, 1994Assignees: Nippon Steel Chemical Co., Ltd., Chiyoda Corp.Inventors: Hiroshi Yanai, Tadayoshi Matsuo, Masanori Nagase, Tsohikazu Maruyama, Toshihiko Furukawa, Katsuhiko Sakura, Yoshiaki Matsui, Takamasa Minami, Nobuo Moriya, Sachio Asaoka, Kouji Sakashita, Nobuyuki Suda, Keiji Shimoda, Susumu Yamamoto, Makoto Nomura
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Patent number: 5356335Abstract: A pressure gradient control system includes a ventilated area divided into a plurality of intercommunicating zones, a zone-to-zone pressure gradient detecting device for detecting pressure gradients between adjacent zones, a control unit for adjusting quantities of air supply or exhaust to/from the zones based on detection information received from the zone-to-zone pressure gradient detecting device to establish a predetermined pressure gradient between adjacent zones, and an interior-ambient pressure gradient detecting device for detecting pressure gradients between an ambient area and those of the zones communicating with the ambient area.Type: GrantFiled: June 29, 1992Date of Patent: October 18, 1994Assignee: Taikisha, Ltd.Inventors: Yoshiaki Matsui, Mutsumi Moriwaki
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Patent number: 5327355Abstract: In order to control a voltage using e.g. a tap transformer, the difference .DELTA.V between the actual voltage and a reference voltage is obtained and integrated over time. That integral is then modified by at least one parameter generated by fuzzy logic from control conditions of the voltage. In this way the fuzzy logic may find the optimum control strategy which keeps the actual voltage closest to the reference voltage without an excessive number of tap position changes. The reference voltage may vary with time, and therefore the control of the voltage with time may be evaluated, and the control conditions varied accordingly, e.g. by fuzzy logic, so that the control arrangement can exhibit learning. Normally, the integral is modified such that.intg..DELTA.Vdt.gtoreq.Bwhen B is the parameter determined by the fuzzy logic, but other control strategies may be used. The present invention is also applicable to control of reactive power.Type: GrantFiled: January 17, 1992Date of Patent: July 5, 1994Assignee: Hitachi, Ltd.Inventors: Tomio Chiba, Mitsuyasu Kido, Junzo Kawakami, Kunio Hirasawa, Yoshiaki Matsui
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Patent number: 5170308Abstract: A method and system of transformer protection in which parallel admittance currents indicative of the apparent excitation state of a transformer to be protected are evaluated from the transformer terminal voltages and currents sampled at a proper interval, and discrimination between an internal defect and excitation inrush is made in response to a magnitude of the parallel admittance current, and a breaker opening command is issued in response to a judgement of internal defect. The method and system enables high-accuracy and high-sensitivity fault detection through a simple computation.Type: GrantFiled: January 18, 1990Date of Patent: December 8, 1992Assignees: Hitachi, Ltd., The Tokyo Electric Power Co., Inc.Inventors: Keizo Inagaki, Yoshihiro Sano, Yoshiaki Matsui, Takafumi Maeda
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Patent number: 4689944Abstract: A flat yarn wherein fibers composing a yarn are bonded to each other substantially in a side-by-side manner to form a tape-like flat body and the flat body has a plurality of gear-crimped portions across a width thereof. There may be a plurality of reverse points at which front and back surfaces of the yarn replace each other. The points are twisted in the same direction and positioned at random intervals from each other. The gear-crimped portions are arranged randomly in the lengthwise direction of the yarn. The fibers composing the yarn are bonded to each other in an intermittent manner in the lengthwise direction of the yarn. A fabric made from the flat yarn has an aesthetic appearance and soft touch as well as good crease resistance. A method of production for the same is also provided.Type: GrantFiled: August 26, 1986Date of Patent: September 1, 1987Assignee: Mitsubishi Rayon Company Ltd.Inventors: Masahisa Toki, Seiji Satoh, Yoshiaki Matsui, Kunio Morihata, Toyoji Murata
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Patent number: 4633662Abstract: A flat yarn wherein fibers composing a yarn are bonded to each other substantially in a side-by-side manner to form a tape-like flat body and the flat body has a plurality of gear-crimped portions across a width thereof. There may be a plurality of reverse points at which front and back surfaces of the yarn replace each other. The points are twisted in the same direction and positioned at random intervals from each other. The gear-crimped portions are arranged randomly in the lengthwise direction of the yarn. The fibers composing the yarn are bonded to each other in an intermittent manner in the lengthwise direction of the yarn. A fabric made from the flat yarn has an aesthetic appearance and soft touch as well as good crease resistance. A method of production for the same is also provided.Type: GrantFiled: September 23, 1985Date of Patent: January 6, 1987Assignee: Mitsubishi Rayon Company Ltd.Inventors: Masahisa Toki, Seiji Satoh, Yoshiaki Matsui, Kunio Morihata, Toyoji Murata