Patents by Inventor Yoshiaki Okabe

Yoshiaki Okabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11959851
    Abstract: An absolute thickness distribution cannot be accurately calculated with a conventional technique. A sensor device is provided that includes a plurality of magnetic sensors arranged to face an outer circumference surface of a pipeline and ultrasonic sensors arranged to face the outer circumference surface and measure a thickness of the pipeline in a measurement region in which the plurality of magnetic sensors measure a magnetic field, the ultrasonic sensors being less than the plurality of magnetic sensors.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: April 16, 2024
    Assignee: Yokogawa Electric Corporation
    Inventors: Nobuo Okabe, Satoshi Yoshitake, Kazuma Takenaka, Yoshiaki Tanaka, Shumpei Ito
  • Publication number: 20180048205
    Abstract: An insulation wire 10 according to the invention includes: a conductor 11 of any shape; an insulation film 12 made of a first thermoplastic resin that is formed around the conductor 11; and a self-bonding layer 13 made of a second thermoplastic resin that is formed around the insulation film 12 and has a self-bonding property, wherein the first thermoplastic resin contains at least one of polyphenylene sulfide and polyether ether ketone, and wherein the second thermoplastic resin contains a thermosetting resin and an inorganic filler.
    Type: Application
    Filed: August 8, 2017
    Publication date: February 15, 2018
    Applicant: HITACHI METALS, LTD.
    Inventors: Shintaro TAKEDA, Yoshiaki OKABE
  • Publication number: 20170316849
    Abstract: An insulation wire includes a conductor, a first insulating layer formed in an outer surface of the conductor, and a second insulating layer formed in an outer surface of the first insulating layer. In the insulation wire, the first insulating layer is a thermoplastic resin layer that is made of polyphenylene sulfide or polyether ether ketone, and the second insulating layer is a thermosetting resin layer.
    Type: Application
    Filed: March 15, 2017
    Publication date: November 2, 2017
    Applicant: HITACHI METALS, LTD.
    Inventors: Yoshiaki OKABE, Shintaro TAKEDA
  • Patent number: 9441292
    Abstract: Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: September 13, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ayuta Suzuki, Songyun Kang, Tsuyoshi Moriya, Nobutoshi Terasawa, Yoshiaki Okabe
  • Publication number: 20160042836
    Abstract: Provided are an insulated wire which is excellent in heat resistance and pressure resistance, and a rotary electric machine which uses the same. An insulated wire includes an insulating resin layer that is formed on an outer periphery of a conductor, in which the insulating resin layer has a thermoplastic phenoxy resin, an epoxy resin, a cross-linking agent, an inorganic filler, and fine rubber particles.
    Type: Application
    Filed: July 30, 2015
    Publication date: February 11, 2016
    Inventors: Yoshiaki OKABE, Kotaro ARAYA, Takahito MURAKI, Satoru AMOU, Tadashi ARAI
  • Publication number: 20150206763
    Abstract: Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed.
    Type: Application
    Filed: January 14, 2015
    Publication date: July 23, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Ayuta Suzuki, Songyun Kang, Tsuyoshi Moriya, Nobutoshi Terasawa, Yoshiaki Okabe
  • Patent number: 8945413
    Abstract: Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed.
    Type: Grant
    Filed: July 20, 2012
    Date of Patent: February 3, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Ayuta Suzuki, Songyun Kang, Tsuyoshi Moriya, Nobutoshi Terasawa, Yoshiaki Okabe
  • Publication number: 20130186858
    Abstract: Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed.
    Type: Application
    Filed: July 20, 2012
    Publication date: July 25, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Ayuta SUZUKI, Songyun Kang, Tsuyoshi Moriya, Nobutoshi Terasawa, Yoshiaki Okabe
  • Patent number: 8420766
    Abstract: A recyclable epoxy resin composition using a plant biomass in a resin skeleton and a cured material of the epoxy resin composition, and various types of products using them are provided. The epoxy resin composition comprises an epoxy resin; and a curing agent, wherein the curing agent is a biomass-derived acid anhydride having an acid anhydride bonded via an ester linkage to a biomass with a weight-average molecular weight of 300 to 5000.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: April 16, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Okabe, Hiroyuki Kagawa
  • Patent number: 8232365
    Abstract: There is disclosed a biomass-derived epoxy compound as an epoxidized product of a raw-material biomass-derived compound having a weight-average molecular weight of 300 to 10000. The biomass-derived epoxy compound has a weight-average molecular weight of 600 to 20000 and is soluble in an organic solvent for the preparation of a varnish. The epoxy compound is prepared by dissolving the raw-material biomass-derived compound in an aqueous alkali solution; adding epichlorohydrin to the solution and heating the mixture; and evaporating epichlorohydrin from the heated mixture and precipitating a biomass-derived epoxy compound, in which the aqueous alkali solution has a pH of 13.5 to 11.0. The biomass-derived epoxy compound has both high solubility in organic solvents and satisfactory heat resistance and can be manufactured in a high yield on the basis of the raw material through a less number of processes.
    Type: Grant
    Filed: December 23, 2009
    Date of Patent: July 31, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Okabe, Hiroyuki Kagawa
  • Publication number: 20120190812
    Abstract: Provided is an environmentally friendly novel plant-based polycarbonate resin. Specifically, disclosed are: a plant-based polycarbonate resin which is a polymer derived from a plant-based material having a plurality of hydroxyl groups, in which molecules of the plant-based material are linked to each other through carbonate groups to form the polymer; and a production method of the polycarbonate resin.
    Type: Application
    Filed: January 26, 2012
    Publication date: July 26, 2012
    Inventors: Yoshiaki OKABE, Hiroyuki KAGAWA, Fusao HOJO
  • Publication number: 20110024168
    Abstract: A recyclable epoxy resin composition using a plant biomass in a resin skeleton and a cured material of the epoxy resin composition, and various types of products using them are provided. The epoxy resin composition comprises an epoxy resin; and a curing agent, wherein the curing agent is a biomass-derived acid anhydride having an acid anhydride bonded via an ester linkage to a biomass with a weight-average molecular weight of 300 to 5000.
    Type: Application
    Filed: July 27, 2010
    Publication date: February 3, 2011
    Inventors: Yoshiaki Okabe, Hiroyuki Kagawa
  • Publication number: 20100255315
    Abstract: Provided is an epoxy resin composition which excels in heat resistance properties and electrical properties, and is easily decomposable for the recycling of resources. The epoxy resin composition includes an epoxy compound and a curing agent, in which at least one of the epoxy compound and the curing agent contains a hydrolyzable tannin having a weight-average molecular weight (Mw) of 500 to 5000.
    Type: Application
    Filed: March 31, 2010
    Publication date: October 7, 2010
    Inventors: Yoshiaki Okabe, Hiroyuki Kagawa
  • Publication number: 20100155122
    Abstract: There is disclosed a biomass-derived epoxy compound as an epoxidized product of a raw-material biomass-derived compound having a weight-average molecular weight of 300 to 10000. The biomass-derived epoxy compound has a weight-average molecular weight of 600 to 20000 and is soluble in an organic solvent for the preparation of a varnish. The epoxy compound is prepared by dissolving the raw-material biomass-derived compound in an aqueous alkali solution; adding epichlorohydrin to the solution and heating the mixture; and evaporating epichlorohydrin from the heated mixture and precipitating a biomass-derived epoxy compound, in which the aqueous alkali solution has a pH of 13.5 to 11.0. The biomass-derived epoxy compound has both high solubility in organic solvents and satisfactory heat resistance and can be manufactured in a high yield on the basis of the raw material through a less number of processes.
    Type: Application
    Filed: December 23, 2009
    Publication date: June 24, 2010
    Inventors: Yoshiaki Okabe, Hiroyuki Kagawa
  • Patent number: 6291619
    Abstract: A photosensitive composition comprising a polyimide precursor, a photosensitive material having a structure represented by the following formula wherein A1 is an atom belonging to Group VI of the periodic table, in the molecule thereof and/or a photosensitive material having a structure represented by the following formula: wherein A2 is O, S or N atom, in the molecule thereof is suitable for formation of a positive tone pattern excellent in heat resistance, and applicable to electronic devices.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: September 18, 2001
    Assignee: Hitachi Chemical Co., LTD
    Inventors: Yasunari Maekawa, Takao Miwa, Takumi Ueno, Yoshiaki Okabe
  • Patent number: 5858584
    Abstract: A highly reliable positive type photosensitive resin composition composed of diamine having a carboxyl group as a structural unit, which can be developed with an alkaline aqueous solution, comprising polyamic acid ester having hydrophobic group, o-quinonediazidesulfonyl amide compound, and/or o-quinonediazidesulfonyl amide sulfonic ester compound, and electronic devices using the same. A polyamide film having preferable positive type relief patterns, of which the unexposed portion is not corroded, can be obtained.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: January 12, 1999
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Yoshiaki Okabe, Takao Miwa, Yasunari Maekawa, Takumi Ueno, Geraldine Rames-Langlade, Mina Ishida
  • Patent number: 5686191
    Abstract: A thermosetting resin composition comprising (A) a thermosetting polyimide and (B) a bismaleimide and showing a modulus of elasticity of 10.sup.7 to 10.sup.2 dyne/cm.sup.2 during heat curing thereof is suitable for forming an adhesive film used in a thin film wiring board having excellent heat resistance and high reliability.
    Type: Grant
    Filed: November 7, 1995
    Date of Patent: November 11, 1997
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Takao Miwa, Masahiro Suzuki, Akio Takahashi, Yoshiaki Okabe, Yuichi Satsu, Shin Nishimura
  • Patent number: 5633112
    Abstract: A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.
    Type: Grant
    Filed: October 7, 1994
    Date of Patent: May 27, 1997
    Assignees: Hitachi, Ltd., Hitachi Chemical Company, Ltd.
    Inventors: Takao Miwa, Yoshiaki Okabe, Mina Ishida, Akio Takahashi, Shunichi Numata
  • Patent number: 5570506
    Abstract: Low-thermal-expansivity polyimides have a linear rigid skeleton, so that adhesion between perfectly cured low-thermal-expansivity polyimide films is very low. On the other hand, a film of a polyimide having a flexible skeleton shows high adhesiveness even after perfect curing, so that it is possible to enhance adhesion between the low-thermal-expansivity polyimide films by interposing a polyimide having a flexible skeleton. A flexible polyimide thin film is formed as a highly adhesive film on a low-thermal-expansivity polyimide film in a half-cured state, then metallic wiring is applied thereon, followed by formation of another highly adhesive thin film in a half-cured state, and then a low-thermal-expansivity polyimide film is further formed thereon. It is possible to provide a multilayer wiring structure which has improved adhesion between the low-thermal-expansivity polyimide film and the wiring pattern layer or the substrate.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: November 5, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Rie Tawata, Shunichi Numata, Takao Miwa, Koji Fujisaki, Takayoshi Ikeda, Yoshiaki Okabe, Hisae Shimanoki
  • Patent number: 5113477
    Abstract: A plastic optical fiber comprising a core and a clad, said core being formed by an amorphous and optically transparent polymer and said clad being formed by a polymer having a refractive index lower than that of the core by at least 0.3%, at least one of the core and the clad being formed by an amorphous and optically transparent polymer containing metal elements and halogen atoms, is low in light loss and excellent in heat resistance.
    Type: Grant
    Filed: February 20, 1990
    Date of Patent: May 12, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Eguchi, Noriaki Taketani, Seikichi Tanno, Yoshiaki Okabe, Hiromu Terao, Hideki Asano, Motoyo Wajima, Tomiya Abe