Patents by Inventor Yoshiaki Tachibana

Yoshiaki Tachibana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210138410
    Abstract: Provided are: a microbubble generation device utilizing a swirling flow generated by injecting of a pressurized liquid; a microbubble generation method capable of generating a large amount of bubbles; and a shower apparatus and an oil-water separation apparatus having said microbubble generation device. This microbubble generation device comprises: a cylindrical or conical cylinder with a gas-liquid swirling chamber therein; a gas-liquid discharge inlet provided on one end of the cylindrical or conical cylinder; and a liquid supply cylinder and a gas supply cylinder for introducing a liquid and a gas into the gas-liquid swirling chamber.
    Type: Application
    Filed: August 2, 2017
    Publication date: May 13, 2021
    Inventors: Yoshiaki TACHIBANA, Kousuke TACHIBANA, Souzou SASAJIMA, Kyoko HONMA
  • Publication number: 20200338000
    Abstract: Provided is a method for manufacturing an administrable aqueous solution to a living body, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.
    Type: Application
    Filed: July 7, 2020
    Publication date: October 29, 2020
    Applicants: SIGMA-TECHNOLOGY INC.
    Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
  • Publication number: 20200238654
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: July 12, 2019
    Publication date: July 30, 2020
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA
  • Patent number: 10632506
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: April 28, 2020
    Assignee: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki Tachibana
  • Publication number: 20190329520
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: July 12, 2019
    Publication date: October 31, 2019
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA
  • Publication number: 20190298653
    Abstract: Provided are an administrable aqueous solution to a living body and a method for manufacturing the same, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.
    Type: Application
    Filed: May 11, 2017
    Publication date: October 3, 2019
    Applicants: SIGMA-TECHNOLOGY INC.
    Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
  • Patent number: 10293309
    Abstract: A new method for generating micro-nano bubbles that uses water hammering, a bubble generating nozzle, and an apparatus for generating micro-nano bubbles are provided to construct a system. The system is for generating micro-nano bubbles in a large amount using only pure water, which does not include any nucleating agents, and for performing not only a clean washing and sterilization but also the generation of uncontaminated micro-nano bubbles. The method defined in the present invention uses water hammering power produced by a mutual collision of jets of dissolved-gas-including solution squirted from two or more spouts.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: May 21, 2019
    Assignee: SIGMA-TECHNOLOGY INC.
    Inventors: Yoshiaki Tachibana, Kousuke Tachibana, Kaoru Harada, Souzou Sasajima, Kunihiro Tamahashi, Kyoko Honma, Yuuki Matsumoto
  • Publication number: 20180161737
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: December 1, 2015
    Publication date: June 14, 2018
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA
  • Publication number: 20150273408
    Abstract: A new method for generating micro-nano bubbles that uses water hammering, a bubble generating nozzle, and an apparatus for generating micro-nano bubbles are provided to construct a system. The system is for generating micro-nano bubbles in a large amount using only pure water, which does not include any nucleating agents, and for performing not only a clean washing and sterilization but also generation of uncontaminated micro-nano bubbles. The method defined in the present invention uses water hammering power produced by a mutual collision of jets of dissolved-gas-including solution squirted from two or more spouts.
    Type: Application
    Filed: June 13, 2013
    Publication date: October 1, 2015
    Inventors: Yoshiaki Tachibana, Kousuke Tachibana, Kaoru Harada, Souzou Sasajima, Kunihiro Tamahashi, Kyoko Honma, Yuuki Matsumoto
  • Patent number: 6786577
    Abstract: An inkjet print head with an ink channel unit (and a method therefore) includes a plurality of plates adhered together to form an inkjet head. An adhesive sheet for adhering together the plurality of plates, includes an adhesive element dispersed in a polymer matrix having an average molecular weight of 50,000 or more. The polymer matrix includes a resin.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: September 7, 2004
    Assignee: Hitachi Printing Solutions, Ltd.
    Inventors: Kunihiro Tamahashi, Yoshiaki Tachibana, Jun Nagata
  • Patent number: 6595629
    Abstract: Ink particles that start flying toward the printing medium P earlier than or later than the ink particles for the line central area are used as ink particles for the line ends. Accordingly, it is possible to compensate for the affects of electrical charges onto the flying path of the ink particles for the line end portions, reducing the amount of bending at the ends of the printed line such that the bend is not noticeable, thereby improving the quality of printing to satisfy consumer demands.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: July 22, 2003
    Assignee: Hitachi Koki Co., Ltd.
    Inventors: Yoshiaki Tachibana, Takashi Shibaishi
  • Publication number: 20030076386
    Abstract: An inkjet print head with an ink channel unit (and a method therefore) includes a plurality of plates adhered together to form an inkjet head. An adhesive sheet for adhering together the plurality of plates, includes an adhesive element dispersed in a polymer matrix having an average molecular weight of 50,000 or more. The polymer matrix includes a resin.
    Type: Application
    Filed: October 15, 2002
    Publication date: April 24, 2003
    Applicant: Hitachi Koki Co., Ltd.
    Inventors: Kunihiro Tamahashi, Yoshiaki Tachibana, Jun Nagata
  • Publication number: 20020071010
    Abstract: Ink particles that start flying toward the printing medium P earlier than or later than the ink particles for the line central area are used as ink particles for the line ends. Accordingly, it is possible to compensate for the affects of electrical charges onto the flying path of the ink particles for the line end portions, reducing the amount of bending at the ends of the printed line such that the bend is not noticeable, thereby improving the quality of printing to satisfy consumer demands.
    Type: Application
    Filed: December 7, 2001
    Publication date: June 13, 2002
    Inventors: Yoshiaki Tachibana, Takashi Shibaishi
  • Patent number: 6074510
    Abstract: The same material as the molded members is dissolved in solvent. The solvent is evaporated to form an adhesive layer. The molded members are adhered together via the adhesive layer. The molded members and the adhesive layer are heated and fused together to produce an ink jet head having a monocoque structure formed from a single material including the adhesive layer.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: June 13, 2000
    Assignee: Hitachi Koki Co., Ltd.
    Inventors: Yoshiaki Tachibana, Masanobu Deguchi, Kunihiro Tamahashi, Jun Nagata
  • Patent number: 5358167
    Abstract: A soldering apparatus is disclosed which includes a longitudinally extending, air-tight housing having four contiguous, first through fourth zones and and inlet and outlet openings at both longitudinal ends thereof, a conveyer for conveying an article to be soldered along a predetermined path extending through the inlet opening, the first to fourth zones and the outlet opening, a soldering device provided in the second zone for applying a molten solder to the article traveling through the second zone, a plurality of upper and lower partition plates disposed in each of the first, third and fourth zones to partition each zone into a plurality of open ended chambers, an inert gas diffuser provided within at least one of the chambers of the third zone, and an air diffuser provided within at least one of the chambers of the fourth zone, so that the diffusion of air from the fourth zone to the third zone is substantially prevented while the diffusion of the inert gas from the third zone to the outlet opening throug
    Type: Grant
    Filed: November 29, 1993
    Date of Patent: October 25, 1994
    Assignees: Nihon Den-Netsu Keiki Co., Ltd., Oki Electric Industry Co., Ltd.
    Inventors: Yoshiaki Tachibana, Kimihiko Nakamura, Masahito Nozue, Toshikazu Yasuoka, Masaru Kanazawa
  • Patent number: 5301064
    Abstract: A rear focusing type zoom lens system which comprises, as arrayed sequentially when viewed from the object side, a first lens group having a positive refracting power, second and third lens groups having negative refracting powers, respectively, and serving for zooming function when moved along an optical axis, a fourth lens group having a positive refracting power and constantly fixed stationarily, and a fifth lens group having a positive refracting power and serving for image formation function, wherein focusing is performed by moving a single lens element of the fifth lens group along the optical axis. Due to this arrangement, the number of the lens elements required to move for focusing can be reduced while assuring a high variable magnification power and a smaller F-value.
    Type: Grant
    Filed: April 4, 1991
    Date of Patent: April 5, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Yasuyuki Sugi, Yoshiaki Tachibana
  • Patent number: 5052788
    Abstract: A microscope telescope comprises a base, (3) an arm (1) rotatably attached to the base, a microscope barrel (49) attached to the arm, an objective-holding tube (55) and a telescope tube, (65) removably attachable to the microscope barrel for alternative use. The instrument functions as a microscope by attaching the objective-holding tube to the microscope barrel and also functions as a telescope, when desired, by attaching the telescope tube to the microscope barrel, from which the objective-holding tube is removed, and by rotating the arm at a desired angle with respect to the base.
    Type: Grant
    Filed: May 24, 1990
    Date of Patent: October 1, 1991
    Inventor: Yoshiaki Tachibana