Patents by Inventor Yoshiaki Takezawa
Yoshiaki Takezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20080139725Abstract: The present invention is a heat radiating silicone composition containing (A) a perfluoroalkyl group-containing silicone oil expressed by the following formula (1), (B) a silicone oil, and (C) a heat radiating filler: where R1 is a C1 to C12 saturated hydrocarbon group, R2 is a hydrogen or a C1 to C12 saturated or unsaturated hydrocarbon group, R3 is an aryl group, Rf is a C1 to C12 perfluoroalkyl group, R4 is a group selected from among R1, R2, R3, Rf and OH, l and m are values of 1 or more on the average, and l+m+n is a number of 2 or more.Type: ApplicationFiled: October 18, 2004Publication date: June 12, 2008Inventors: Kunio Takemura, Yasuhiro Kimura, Jun Araki, Hiroshi Nishimura, Yoshiaki Takezawa, Chisato Hoshino, Nobuyuki Nishiwaki
-
Patent number: 6451906Abstract: The object of the present invention is to provide a flame-retardant resin composition which has a high heat resistance, superior impact resistance and superior flame-retarding properties. The present invention provides a flame-retardant resin composition which is characterized by the fact that said composition contains (A) a polycarbonate type resin, (B) a silicone resin constructed from siloxane units expressed by the formula RSiO1.5 (T units) and siloxane units expressed by the formula R3SiO0.5 (M units), or a silicone resin constructed from T units, M units and siloxane units expressed by the formula SiO2.0 (Q units) (R indicates an unsubstituted or substituted monovalent hydrocarbon group with 1 to 10 carbon atoms), and (C) an anti-drip agent, and the aforementioned composition contains 0.1 to 9 parts by weight of the abovementioned silicone resin (B), and 0.01 to 10 parts by weight of the abovementioned anti-drip agent, per 100 parts by weight of the abovementioned polycarbonate resin (A).Type: GrantFiled: November 21, 2000Date of Patent: September 17, 2002Assignee: General Electric CompanyInventors: Akihiro Saito, Takuro Kitamura, Hiromi Ishida, Yoshiaki Takezawa, Yutaka Horie, Michio Zenbayashi
-
Publication number: 20020013412Abstract: To provide a flame-retardant resin molding that has high heat resistance and excellent impact resistance and flame retardancy.Type: ApplicationFiled: March 26, 2001Publication date: January 31, 2002Inventors: Akihiro Saito, Hiromi Ishida, Yoshiaki Takezawa, Yutaka Horie
-
Patent number: 6136766Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: October 24, 2000Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5985810Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 16, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5977040Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 2, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5741367Abstract: A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: June 7, 1995Date of Patent: April 21, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5741365Abstract: A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: May 5, 1995Date of Patent: April 21, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5728228Abstract: A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.Type: GrantFiled: May 5, 1995Date of Patent: March 17, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5716456Abstract: A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.Type: GrantFiled: June 7, 1995Date of Patent: February 10, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 5443747Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: February 28, 1991Date of Patent: August 22, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
-
Patent number: 4985286Abstract: An abrasion-concealing agent for glass containers, which comprises (A) a polyorganosiloxane and (B) a volatile polydimethylsiloxane, a glass container in which abrasions on the surface thereof have been concealed by the abrasion-concealing agent, and a method for concealing abrasions on a glass container by using the abrasion-concealing agent. The abrasion-concealing agent has excellent abrasion-concealing properites, film strength, water resistance, safety, workability and resistance to an aqueous alkaline solution washing, and does not cause any damage to labels on glass containers in the coating process.Type: GrantFiled: April 27, 1990Date of Patent: January 15, 1991Assignees: Toshiba Silicone Co. Ltd., Asahi Breweries, Ltd.Inventors: Akitsugu Kurita, Yoshiaki Takezawa, Nobuhiro Saitoh, Takehisa Shimada, Hideaki Takemoto